The invention discloses a method for manufacturing a micro
cantilever probe based on
monocrystalline silicon (110), which belongs to the technical fields of micro-electro-mechanical systems (MEMS) and tests and is characterized by using a process of manufacturing the pinpoint of a
silicon nitride micro
cantilever probe based on the
monocrystalline silicon (110). In the manufacturing process, the anisotropic
corrosion self-stopping method of the
monocrystalline silicon (110) is used. The method for manufacturing the micro
cantilever probe based on the monocrystalline
silicon (110) has the advantages that: a complete process flow can be accomplished by an MEMS
processing technique, the influence of the anisotropic
corrosion solution of the common monocrystalline
silicon on the
surface roughness of the monocrystalline silicon (110) is eliminated, the requirement on
process equipment is low, and the micro cantilever probe can be produced in batches, so that product cost is lowered. The pinpoint of the
silicon nitride nano-probe manufactured by the method has the advantages of very normative shape, high
hardness, high
abrasive resistance and the like. The cantilever probe manufactured by the method can be applied to an atomic force
microscope (AFM) probe, a high-density memory device probe and a
micro nano-
processing device.