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141results about How to "Increase parasitic capacitance" patented technology

Method of manufacturing a short-channel FET with Schottky-barrier source and drain contacts

InactiveUS6303479B1Without add parasitic capacitanceReduce manufacturingTransistorSolid-state devicesEngineeringDopant
The present invention Is a fabrication method for a short-channel Schottky-barrier field-effect transistor device. The method of the present invention includes introducing channel dopants into a semiconductor substrate such that the dopant concentration varies in the vertical direction and is generally constant in the lateral direction. A gate electrode is formed on the semiconductor substrate, and source and drain electrodes are formed on the substrate to form a Schottky or Schottky-like contact to the substrate.
Owner:AVOLARE 2 LLC

Fin-type field effect transistor structure with merged source/drain silicide and method of forming the structure

Disclosed herein are embodiments of a multiple fin fin-type field effect transistor (i.e., a multiple fin dual-gate or tri-gate field effect transistor) in which the multiple fins are partially or completely merged by a highly conductive material (e.g., a metal silicide). Merging the fins in this manner allow series resistance to be minimized with little, if any, increase in the parasitic capacitance between the gate and source / drain regions. Merging the semiconductor fins in this manner also allows each of the source / drain regions to be contacted by a single contact via as well as more flexible placement of that contact via.
Owner:GLOBALFOUNDRIES US INC

Ultra-thin Si MOSFET device structure and method of manufacture

InactiveUS20050118826A1Slow circuit performanceIncrease parasitic capacitanceTransistorSolid-state devicesMOSFETOxide
The present invention comprises a method for forming an ultra-thin channel MOSFET and the ultra-thin channel MOSFET produced therefrom. Specifically, the method comprises providing an SOI substrate having a buried insulating layer underlying an SOI layer; forming a pad stack atop the SOI layer; forming a block mask having a channel via atop the pad stack; providing a localized oxide region in the SOI layer on top of the buried insulating layer thereby thinning a portion of the SOI layer, the localized oxide region being self-aligned with the channel via; forming a gate in the channel via; removing at least the block mask; and forming source / drain extensions in the SOI layer abutting the thinned portion of the SOI layer. Providing the localized oxide region further comprises implanting oxygen dopant through the channel via into a portion of the SOI layer; and annealing the dopant to create the localized oxide region.
Owner:GLOBALFOUNDRIES INC

Array substrate, display screen and display device

ActiveCN108417172AIncrease parasitic capacitanceSolve the technical problem of uneven image brightnessStatic indicating devicesDisplay deviceComputer science
The invention relates to an array substrate, a display screen and a display device. The array substrate comprises a substrate body, at least one first switch transistor and at least one second switchtransistor, a corresponding display area on the substrate body comprises pixels in array distribution and is divided into a special-shaped display area and a non-special-shaped display area, the number of the pixels in each row of the special-shaped display area is smaller than that in any row of the non-special-shaped display area, the first switch transistors are positioned in the special-shapeddisplay area and correspond to the pin the special-shaped display area, and the second switch transistors are positioned in the non-special-shaped display area and correspond to the pixels in the non-special-shaped display area; width-length ratio of the first switch transistors is equal to that of the second switch transistor, and grid area of the first switch transistors is greater than that ofthe second switch transistors. The technical problem that displayed images are nonuniform in brightness caused by load difference in the special-shaped display area and the non-special-shaped displayarea is solved, and display effect is improved.
Owner:KUNSHAN GO VISIONOX OPTO ELECTRONICS CO LTD

Active matrix substrate, liquid crystal display panel, liquid crystal display element, liquid crystal display device, and substrate for liquid crystal display panels

The present invention has an object to provide an active matrix substrate, a liquid crystal display panel, a liquid crystal display element, a liquid crystal display device, and a substrate for liquid crystal display panel, each capable of suppressing generation of uneven cell gap without increase in a parasitic capacitance of a wiring. The active matrix substrate of the present invention is an active matrix substrate including a spacer on a substrate, wherein the spacer includes a base layer and a covering layer, the base layer being buried in the covering layer.
Owner:SHARP KK

Display panel and display device

The invention discloses a display panel and a display device, and belongs to the technical field of display. The display panel comprises a display area, wherein the display area includes a plurality of data lines and a plurality of pixel electrode; first sub-pixels and second sub-pixels in the display area are alternately arranged to form pixel rows, one pixel row is driven by a first scanning line and a second scanning line together, and the time when a scanning signal is inputted into the first scanning line and the time when a scanning signal is inputted into the second scanning line are overlapped when the first scanning line and the second scanning line drive the same pixel row; each sub-pixel includes a pixel electrode; each first sub-pixel includes a first transistor, and each second sub-pixel includes a second transistor; the parasitic capacitance between a source electrode and a grid electrode in the first transistor is the first parasitic capacitance, the parasitic capacitance between a source electrode and a grid electrode in the second transistor is the second parasitic capacitance, and the second parasitic capacitance is greater than the first parasitic capacitance. The display panel can ensure that the brightness of the second sub-pixels and the brightness of the first sub-pixels tend to be the same and improve the display uniformity.
Owner:SHANGHAI AVIC OPTOELECTRONICS

Interconnection line structure and forming method thereof

The invention provides an interconnection line structure and a forming method of the interconnection line structure. The forming method of the interconnection line structure comprises the following steps of: providing a semiconductor substrate, wherein a semiconductor device is formed in the semiconductor substrate; forming an interlayer medium layer on the semiconductor substrate; forming a conductive layer on the interlayer medium layer; after the conductive layer is formed, forming grooves in the conductive layer and the interlayer medium layer, wherein the depth of the grooves is less than a thickness sum of the conductive layer and the interlayer medium layer, and a depth-to-width ratio of the grooves is more than 0.8; after the grooves are formed, depositing intermetallic medium layers, covering the conductive layer and filling the grooves through the intermetallic medium layers, and forming air gaps in the intermetallic medium layers. Compared with the prior art, the height of the grooves comprises the height of the conductive layer and a part of the height of the intermetallic medium layers, so that the depth-to-width ratio of the grooves between the adjacent interconnection lines is increased, the air gaps formed in the intermetallic medium layers inside the grooves are larger, stray capacitance is reduced and even removed, and the properties of the semiconductor device can be improved.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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