A continuous strip is electrochemically processed in an electrolytic
processing bath using either a thin flexible or resilient
dielectric wiping blade or an open web, plastic mesh to wipe bubbles of gas from the surface, sever dendritic material, if such is present, and to remove a
surface layer of partially depleted electrolytic solution in the form of a barrier or depletion layer including a heat zone, replacing with fresh cooler solution and to stabilize strip portions extending between support rolls. The resilient
dielectric wiper blade is preferably used with perforated anodes which allow fresh electrolytic solution to flow into the space between the anodes and the strip surface after being expelled by passage of the strip past the wiping blade. It may also be used with
electrode baskets in
electroplating, however. The open web, plastic mesh wiper is particularly effective as a separator to provide the best spacing between the strip and the electrodes to prevent arcing and also prevents any filter cloth used over the electrodes in
electroplating from catching upon the strip. The resilient wiper blade and open web, plastic mesh are preferably used in combination, but may also be used separately in
electroplating,
anodizing or electrolytic cleaning.