The invention relates to a double-sided sputtering silvered device of a barrel-type quartz crystal, comprising a vacuum cavity, a vacuum exhaust unit, a work rest, magnetron sputtering targets, a radio frequency plasma cleaner and an inert gas aerator. The vacuum exhaust unit and the inert gas aerator are respectively connected with the vacuum cavity. The double-sided sputtering silvered device is characterized in that the vacuum cavity is provided with the rotatable work rest which is provided with a turnable substrate frame; the substrate frame is provided with a carrier disc which is provided with a quartz crystal sheet and a mask sheet; and at least two magnetron sputtering targets with film shielding covers are arranged at one side of the work rest, and the radio frequency plasma on-line cleaner is arranged at the other side thereof, wherein one magnetron sputtering target is a transition layer sputtering target and others are electrode layer sputtering targets. As multiple targets for magnetron sputtering, work rest with rotation and revolution and on-line radio frequency plasma cleaner structures are adopted, the quartz substrate can be cleaned in real time and coated with electrode films of multi-layer film structures with chromium and silver on both sides. The invention has good evenness and consistency of the coating film layer, strong bonding force between the film layer and the quartz substrate, large throughput, high production efficiency, compact structure and small volume of the device, and is an ideal quartz crystal silvered device.