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223 results about "Neutral particle" patented technology

In physics, a neutral particle is a particle with no electric charge. This is not to be confused with a truly neutral particle, a neutral particle that is also identical to its own antiparticle.

Apparatus for treating the surface with neutral particle beams

The present invention relates to an apparatus for treating the surface with neutral particle beams comprising an antenna container, a plasma generating part, a neutral particle beam generating part and a treating part, wherein the antenna container comprises antennas connected to high frequency electric power supply through which high frequency electric power supplies, the plasma generating part transfers gases from a gas injector into plasmas with the supplied power, the neutral particle beam generating part reverts the obtained plasmas to neutral particle beams via the collision thereof with metal plates, and the treating part treats the surface of a target with the neutral particle beams.
Owner:SEM TECH CO LTD +1

Ion implanter having two-stage deceleration beamline

An ion implanter includes an ion source for generating an ion beam, an analyzer for separating unwanted components from the ion beam, a first beam transport device for transporting the ion beam through the analyzer at a first transport energy, a first deceleration stage positioned downstream of the analyzer for decelerating the ion beam from the first transport energy to a second transport energy, a beam filter positioned downstream of the first deceleration stage for separating neutral particles from the ion beam, a second beam transport device for transporting the ion beam through the beam filter at the second transport energy, a second deceleration stage positioned downstream of the beam filter for decelerating the ion beam from the second transport energy to a final energy, and a target site for supporting a target for ion implantation. The ion beam is delivered to the target site at the final energy. In a double deceleration mode, the second transport energy is greater than the final energy for highest current at low energy. In an enhanced drift mode, the second transport energy is equal to the final energy for highest beam purity at low energy.
Owner:VARIAN SEMICON EQUIP ASSOC INC

Crosslinked hyperbranched polyalcohol composite nano filter membrance and method of preparing the same

The invention discloses a crosslinking hyper branched polymer composite nanofiltration membrane as well as the preparation method thereof. The crosslinking hyper branched polymer composite nanofiltration membrane is prepared by taking an ultrafiltration membrane as a basement membrane and crosslinking hyper branched polymer as a selecting layer through hyper branched polymer and the interfacial polymerization of polybasic acid, polybasic acyl chloride, polybasic anhydride and polybasic amine; and the interfacial polymerization takes the mixed solution of water and ethanol as the water phase and n-hexane, n-heptane or n-octane as the organic phase. As the hyper branched polymer has the spheroidal structure, a plurality of nano-voids exist in the interior of the molecule, so as to enable the selecting layer of the crosslinking hyper branched polymer composite nanofiltration membrane to be looser, and leads the nanofiltration membrane to maintain high flux and retention rate under the lower operating pressure. The nanofiltration membrane can be used in the fields of medicament, foodstuff, environmental protection, etc. The composite nanofiltration membrane is applicable to the separation and the condensation of high valence ions, low valence ions, neutral particles, drugs, food additives, etc.
Owner:ZHEJIANG UNIV

Fast recovery electron multiplier

An improved electron multiplier bias network that limits the response of the multiplier when the multiplier is faced with very large input signals, but then permits the multiplier to recover quickly following the large input signal. In one aspect, this invention provides an electron multiplier, having a cathode that emits electrons in response to receiving a particle, wherein the particle is one of a charged particle, a neutral particle, or a photon; an ordered chain of dynodes wherein each dynode receives electrons from a preceding dynode and emits a larger number of electrons to be received by the next dynode in the chain, wherein the first dynode of the ordered chain of dynodes receives electrons emitted by the cathode; an anode that collects the electrons emitted by the last dynode of the ordered chain of dynodes; a biasing system that biases each dynode of the ordered chain of dynodes to a specific potential; a set of charge reservoirs, wherein each charge reservoir of the set of charge reservoirs is connected with one of the dynodes of the ordered chain of dynodes; and an isolating element placed between one of the dynodes and its corresponding charge reservoir, where the isolating element is configured to control the response of the electron multiplier when the multiplier receives a large input signal, so as to permit the multiplier to enter into and exit from saturation in a controlled and rapid manner.
Owner:BIO RAD LAB INC

System for molecular imaging

Charged and neutral particles, photons (13), photonic optics, detectors (15) and sensor arrays are used for application to molecular imaging, communication with biological organisms and monitoring and learning biological activity inside living organisms. The living organisms include among others living tissue, biological organs, cells (10), eukaryotes, prokaryotes, viruses and phages. Molecular imaging can be an effective new tool to understand the mechanisms of life and communicate, modify and control it. Techniques, methods and devices are described to achieve these aims. The probes used in molecular imaging described above will include the full spectrum of photons; charged and uncharged particles (13); chemicals; and biological probes.
Owner:TUMER TUMAY O

Plasma Ion Source Mass Spectrometer

Provided is a plasma ion source mass spectrometer with an ion deflector lens having an improved removal ratio of photons and neutral particles as compared with the conventional art while an ion transmittance is maintained. The ion deflector includes an input side plate-like electrode, an output side plate-like electrode, and a tubular electrode disposed between the input side plate-like electrode and the output side plate-like electrode. The tubular electrode is of a point asymmetrical configuration. The tubular electrode is arranged so that a center axis of the tubular electrode is closer to an axis of travel of ions upstream of the input side plate-like electrode than an axis of travel of ions downstream of the output side plate-like electrode.
Owner:AGILENT TECH INC

Dose cup located near bend in final energy filter of serial implanter for closed loop dose control

An ion implantation system having a dose cup located near a final energy bend of a scanned or ribbon-like ion beam of a serial ion implanter for providing an accurate ion current measurement associated with the dose of a workpiece or wafer. The system comprises an ion implanter having an ion beam source for producing a ribbon-like ion beam. The system further comprises an AEF system configured to filter an energy of the ribbon-like ion beam by bending the beam at a final energy bend. The AEF system further comprises an AEF dose cup associated with the AEF system and configured to measure ion beam current, the cup located substantially immediately following the final energy bend. An end station downstream of the AEF system is defined by a chamber wherein a workpiece is secured in place for movement relative to the ribbon-like ion beam for implantation of ions therein. The AEF dose cup is beneficially located up stream of the end station near the final energy bend mitigating pressure variations due to outgassing from implantation operations at the workpiece. Thus, the system provides accurate ion current measurement before such gases can produce substantial quantities of neutral particles in the ion beam, generally without the need for pressure compensation. Such dosimetry measurements may also be used to affect scan velocity to ensure uniform closed loop dose control in the presence of beam current changes from the ion source and outgassing from the workpiece.
Owner:AXCELIS TECHNOLOGIES

Time-of-flight mass spectrometry of surfaces

The present invent provides a particle detector for counting and measuring the flight time of secondary electrons and scattered ions and neutrals and to correlate coincidences between these and backscattered ions / and neutrals while maintaining a continuous unpulsed microfocused primary ion beam for impinging a surface. Intensities of the primary particle scattering and secondary particle emissions are correlated with the position of impact of the focused beam onto a materials surface so that a spatially resolved surface elemental and electronic structural mapping is obtained by scanning the focused beam across the surface.
Owner:IONWERKS

Novel gas-homogenizing structure

The invention relates to the technical field of plasma etching, deposition, and neutral particle etching equipment, and particularly relates to a gas-homogenizing structure applicable to plasma or neutral particle etching systems. The gas-homogenizing structure is disposed at the lower part of a gas inlet pipe of a vacuum cavity; the gas-homogenizing structure comprises a gas-homogenizing cylinder; the gas-homogenizing cylinder adopts a double-layer cylindric structure of an inner gas-homogenizing cylinder and an outer gas-homogenizing cylinder which have coaxial centers and rotate mutually; the bottom of the gas-homogenizing cylinder is closed; gas-homogenizing holes are disposed on the inner gas-homogenizing cylinder and the outer gas-homogenizing cylinder. Under a plasma striking condition, the gas-homogenizing cylinder and a gas-homogenizing disc of the invention are in a sealed state; the increase of the gas density facilitates gas ionization and gas striking, can increase the striking speed; after striking, by rotating the upper and lower layers of the inner and the outer gas-homogenizing cylinders of the gas-homogenizing cylinder and the gas-homogenizing disc, the gas-homogenizing holes are exposed; plasma passes through the gas-homogenizing holes with gas flow and etches a chip; and the uniformity of the gas on the chip surface is improved.
Owner:INST OF MICROELECTRONICS CHINESE ACAD OF SCI

Technique for improved ion beam transport

A technique for improved ion implantation is provided. The technique is embodied as an electrostatic filter for an ion implantation device. The electrostatic filter is located just prior to deceleration and may be integrated with a decelerator. Electrodes are used to generate an electric field to separate neutrals from ions. Also, the filter may include active cooling to reduce background gas pressure, a precursor to neutral particle formation. Electrode geometry may also inhibit high energy neutrals from contaminating the target substrate.
Owner:VARIAN SEMICON EQUIP ASSOC INC

Aberration-corrected wien ExB mass filter with removal of neutrals from the Beam

A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.
Owner:FEI CO
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