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618 results about "Ion current" patented technology

An ion current is the influx and/or efflux of ions through an ion channel.

Miniature support for thin films containing single channels or nanopores and methods for using same

Single-channel thin film devices and methods for using the same are provided. The subject devices comprise cis and trans chambers connected by an electrical communication means. At the cis end of the electrical communication means is a horizontal conical aperture sealed with a thin film that includes a single nanopore or channel. The devices further include a means for applying an electric field between the cis and trans chambers. The subject devices find use in applications in which the ionic current through a nanopore or channel is monitored where such applications include the characterization of naturally occurring ion channels, the characterization of polymeric compounds, and the like.
Owner:PRESIDENT & FELLOWS OF HARVARD COLLEGE +1

Method and apparatus for electroplating

An apparatus for electroplating a layer of metal onto the surface of a wafer includes an ionically resistive ionically permeable element located in close proximity of the wafer and an auxiliary cathode located between the anode and the ionically resistive ionically permeable element. The ionically resistive ionically permeable element serves to modulate ionic current at the wafer surface. The auxiliary cathode is configured to shape the current distribution from the anode. The provided configuration effectively redistributes ionic current in the plating system allowing plating of uniform metal layers and mitigating the terminal effect.
Owner:NOVELLUS SYSTEMS

Methods and apparatus for self-optimization of electrospray ionization devices

An automated electrospray ionization (ESI) device and related methods to optimize electrospray interface conditions for mass spectrometric analysis. The optimization process can be performed with calibration or optimization solutions that produce expected ESI parameters such as an ESI signal or an ion current. The ESI device may include an input / output (I / O) controller that is coupled to an electrospray assembly including an XYZ stage for positioning an electrospray emitter relative to a mass spectrometer orifice. The I / O controller may be connected to a power supply for applying an adjustable electrospray ionization voltage, and an adjustable flow regulator that alters the flow of solution by modifying applied voltage and / or pressure. A central processing unit instructs the I / O controller to control selectively the electrospray assembly based on the resultant signals from the mass spectrometer or the ion currents within the mass spectrometer in accordance with a predetermined optimization algorithm. The resulting ESI signal or ion currents are monitored and provide feedback to the I / O controller which can automatically instruct selected system components to make adjustments as needed to attain optimal settings that produce expected ESI signals or ion currents in the mass spectrometer for selected solutions.
Owner:NORVIEL VERN

Gas field ion source, charged particle microscope, and apparatus

A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.
Owner:HITACHI HIGH-TECH CORP

Control system for static neutralizer

The present invention pertains to various embodiments for managing ion current balance by independently controlling positive ion current and negative ion current generated during static neutralization. In another embodiment, E-Field compensation may be provided. These embodiments disclose both method and apparatus implementations.
Owner:MKS INSTR INC

Quadrupole Mass Spectrometer With Enhanced Sensitivity And Mass Resolving Power

A novel method and mass spectrometer apparatus is introduced to spatially and temporally resolve images of one or more ion exit patterns of a multipole instrument. In particular, the methods and structures of the present invention measures the ion current as a function of time and spatial displacement in the beam cross-section of a quadrupole mass filter via an arrayed detector. The linearity of the detected quadrupole ion current in combination with it reproducible spatial-temporal structure enables the deconvolution of the contributions of signals from individual ion species in complex mixtures where both sensitivity and mass resolving power are essential.
Owner:THERMO FINNIGAN

Dosimetry using optical emission spectroscopy/residual gas analyzer in conjuntion with ion current

The present invention generally provides methods and apparatus for controlling ion dosage in real time during plasma processes. In one embodiment, ion dosages may be controlled using in-situ measurement of the plasma from a mass distribution sensor combined with in-situ measurement from an RF probe.
Owner:APPLIED MATERIALS INC

Near-field plume mass-spectroscopic diagnostic E*B probe based on Faraday cup

The invention discloses a near-field plume mass-spectroscopic diagnostic E*B probe based on the Faraday cup and belongs to the technical field of plasma mass-spectroscopic diagnosis. The probe mainly applied to measuring near-field plumes of an ion thruster and of a Hall thruster comprises a central frame, ferrite permanent magnets, a flat electrode plate, an electrode plate holder, a collimator tube, a drift tube, a Faraday cup, six carbon steel shells and an anti-sputtering heat-insulating layer. According to the connectional relation, the central frame is used as a core part, the ferrite permanent magnets are distributed on upper and lower surfaces of the central frame, the electrode plate is fixed in the central frame, and an orthogonal electromagnetic field area is formed. The six carbon steel shells are used for packaging, and the front ends of the shells are coated with an anti-sputtering heat-insulating layer. The collimator tube of stainless steel and the drift tube are fitly fixed to the centers of two ends of the central frame through shaft holes. Ions different in valence are screened by adjusting voltage among the electrode plates, univalent and bivalent ion currents are acquired with the Faraday cup of aluminum, and the ratio of near-field plum bivalent ions is acquired by analytical computing.
Owner:BEIHANG UNIV

Two-grid ion energy analyzer and methods of manufacturing and operating

An ion energy analyzer is described for use in diagnosing the ion energy distribution (IED) of ions incident on a radio frequency (RF) biased substrate immersed in plasma. The ion energy analyzer comprises an entrance grid exposed to the plasma, an electron rejection grid disposed proximate to the entrance grid, and an ion current collector disposed proximate to the electron rejection grid. The ion current collector is coupled to an ion selection voltage source configured to positively bias the ion current collector by an ion selection voltage, and the electron rejection grid is coupled to an electron rejection voltage source configured to negatively bias the electron rejection grid by an electron rejection voltage. Furthermore, an ion current meter is coupled to the ion current collector to measure the ion current.
Owner:TOKYO ELECTRON LTD

Dose cup located near bend in final energy filter of serial implanter for closed loop dose control

An ion implantation system having a dose cup located near a final energy bend of a scanned or ribbon-like ion beam of a serial ion implanter for providing an accurate ion current measurement associated with the dose of a workpiece or wafer. The system comprises an ion implanter having an ion beam source for producing a ribbon-like ion beam. The system further comprises an AEF system configured to filter an energy of the ribbon-like ion beam by bending the beam at a final energy bend. The AEF system further comprises an AEF dose cup associated with the AEF system and configured to measure ion beam current, the cup located substantially immediately following the final energy bend. An end station downstream of the AEF system is defined by a chamber wherein a workpiece is secured in place for movement relative to the ribbon-like ion beam for implantation of ions therein. The AEF dose cup is beneficially located up stream of the end station near the final energy bend mitigating pressure variations due to outgassing from implantation operations at the workpiece. Thus, the system provides accurate ion current measurement before such gases can produce substantial quantities of neutral particles in the ion beam, generally without the need for pressure compensation. Such dosimetry measurements may also be used to affect scan velocity to ensure uniform closed loop dose control in the presence of beam current changes from the ion source and outgassing from the workpiece.
Owner:AXCELIS TECHNOLOGIES
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