The invention relates to a multiple-source vacuum coating device of a multiple-layer radiating type evaporator source distribution structure, and an operating mode of a substrate during the filming process. The system takes a medial axle of a filming vacuum chamber as a center, and effectively arranges more evaporator sources by adopting a two-layer or multiple-layer outward radiating evaporator source distribution method on the identical horizontal plane, to satisfy the requirements of the multiple-source in the multiple-layer part structure; simultaneously, the metal evaporator source is positioned at the position approximately vertical to a coating specimen stage, to remove the shadow effect generated during the metal costing process; the rotation of the substrate during the evaporating process, and the use of an independent small baffle plate and an masking plate of each sample in the sample base frame are matched, the uniform film manufacture of the larger-sized substrate not only can be realized, the preparation of a plurality of samples and a plurality of structures in the identical vacuum process but also can be realized, and the efficiency and the comparability of the result is improved; further, the multiple-layer distributing source structure can effectively utilize the space, the volume of the volume chamber body is greatly reduced under the condition of identical evaporating amount.