32results about How to "Requirements for maintaining vacuum" patented technology

A liner structure of vacuum electric heating vessel includes an internal container (1), an external casing (2), a vacuum connecting layer (3) and an electric heating device (4). The internal container (1) and the external casing (2) are seal welded at the openings of the containers. The said vacuum connecting layer (3) is set between the bottom of the internal container (1) and the bottom of the external casing (2) and its edge is seal welded to the bottom of the internal container (1). The said electric heating device (4) is located between the internal container (1) and the vacuum connecting layer (3) and welded covering the bottom of the internal container (1). Two through holes (5) for passing of power cords or signal lines are on the bottoms of the vacuum connecting layer (3) and the external casing (2). The two through holes (5) are seal welded at corresponding edges.

The invention relates to a system for vacuum pouring of insulation resin used for a motor rotor. The system comprises a vacuum glue filling tank, a vacuum pump, a high-pressure inert gas transmitting device, a vacuum emulsion machine and a glue transmitting pipe, wherein the vacuum pump and the high-pressure inert gas transmitting device are respectively connected with the vacuum glue filling tank by virtue of a pipeline; the vacuum emulsion machine is connected with the vacuum glue filling tank by virtue of the glue transmitting pipe; a stirring device is arranged in the vacuum emulsion machine; the vacuum emulsion machine is provided with a device which is connected with the vacuum pump; the resin to be filled with glue is mixed in the vacuum emulsion machine. According to the system, the vacuum emulsion machine is additionally arranged, the vacuum degree requirement during mixing of the resin is ensured; the discharge of the gas in the resin is facilitated. The invention also relates to a method for vacuum pouring of the insulation resin for the motor rotor.

The invention provides a flat plate micro heat pipe vacuumizing and liquid injection device and a use method thereof. The flat plate micro heat pipe vacuumizing and liquid injection device is composed of a vacuumizing part and a liquid injection part. The vacuumizing part is composed of a vacuum pump, a vacuum meter, an air collection bottle and a capillary tube. The vacuum pump is used for vacuumizing a flat plate micro heat pipe and the air collection bottle. The vacuum meter is used for observation of the vacuum degree. The liquid injection part is composed of an injector and a capillary tube. Liquid is injected into the flat plate micro heat pipe through the injector. In the vacuumizing and liquid injection processes, connection of the flat plate micro heat pipe and all parts is controlled by a manual valve. The flat plate micro heat pipe vacuumizing and liquid injection device is simple in structure, low in cost, high in precision of the vacuum degree and liquid injection volume, easy to operate and reliable in operation.

The invention discloses a micro-fiber high-energy implantation facility for manufacturing a three-dimensional reinforced carbon fiber composite material. The facility comprises a micro reinforced fiber feeding module, a micro reinforced fiber directional arrangement module, a micro reinforced fiber electrification module, a micro reinforced fiber accelerator injection module, a vacuum generation device module, a high-voltage electrostatic acceleration module, an accelerator bunching module and a micro reinforced fiber leading-out control module. According to the micro-fiber high-energy implantation facility, large-scale micro reinforced fibers which are subjected to charging treatment and meet the target charge-to-mass ratio magnitude requirement serve as a high-energy implanted fiber source, a high-voltage electrostatic acceleration electric field is adopted to accelerate and energize the array type large-scale micro reinforced fibers which are uniformly and directionally arranged, and therefore the speed and the energy of the array type large-scale micro reinforced fibers can meet the implantation requirements; and the micro reinforced fibers are injected into a two-dimensional laminated structure prepreg target reinforced area through the output kinetic energy of the micro reinforced fibers, and manufacturing of the three-dimensional reinforced carbon fiber composite material is achieved.

Disclosed is a cavity heating device. The cavity heating device comprises a cavity wall heating structure and / or a slide holder heating structure. The cavity wall heating structure is arranged on the inner wall of a reaction cavity. The slide holder heating structure is arranged at the bottom of a slide holder. The cavity heating device can reduce or avoid nonuniformity caused by the fact that plasma starting is unsymmetrical in structure in the plasma etching process. An electrode fixing structure is free of air discharge under the plasma starting condition and can meet requirement of a vacuum cavity for vacuum degree.

The invention provides a limiting block sealing device and a vacuumizing tire mold. The limiting block sealing device comprises a bottom plate, a tire side plate and an upper cover, wherein the uppercover is arranged above the bottom plate in parallel; the tire side plate is fixedly between the bottom plate and the upper cover in a sealing and fitting mode; a pattern mold is correspondingly arranged on one side of the tire side plate, and the pattern mold is fixedly connected with the bottom plate and the upper cover; and an inner mold plate is mounted on the outer wall of the pattern mold ina fitting mode. The limiting block sealing device of the vacuumizing tire mold is extruded and limited through a double-layer installed sealing ring, and the sealing ring is used as a transition, sothat the sealing between steel parts is achieved, the air flow of an outer cavity of the mold and an inner cavity of the mold is effectively blocked, the good sealing effect of the bolt hole connection part of the vacuumizing mold is achieved, and the vacuum degree requirement of the inner cavity of the mold is ensured; and the structure adopts a static sealing mode, so that the sealing effect ofthe bolt hole part is achieved, and the phenomenon that the sealing ring can fail due to deformation after long-term use is avoided.

The invention relates to a fastening and sealing device for a high-temperature ball mill tank and an assembly and disassembly method. It has a ball mill cylinder with one end open and an end cover fixedly connected to the open end of the ball mill cylinder through bolt sealing. The end is connected with an exhaust pipe for extracting the vacuum in the ball mill cylinder, and a lock clamp mechanism is provided between the ball mill cylinder body and the end cover. The clip hasp and the lock angle seat are fixed on the end cover. One end of the lock clip hasp is connected with the lock clip closing rod, and the other end of the lock clip hasp is turned over and folded on the lock angle seat. The present invention adopts the combination of bolts and locking mechanism before ball milling, which ensures the requirements of the ball mill cylinder for vacuum degree during vacuuming, and then removes the bolts for locking, and only retains the locking mechanism for locking during high-temperature ball milling, realizing The function of quick disassembly of the end cover of the ball mill tank at high temperature after operation is realized, which further meets the operation requirements of special materials.

The invention discloses a chip carrier and belongs to the technical field of plasma body processes. The chip carrier comprises a cavity, a cavity upper cover, an electrode, a chip fixing disc, a fixing disc supporting ring and a supporting disc. A chip fixing structure of the chip carrier comprises the chip fixing disc and the fixing disc supporting ring. An unevenness phenomenon caused by an asymmetric structure when a plasma body is started can be reduced or avoided, and a gas homogenizing structure is simplified. Under the starting condition of the plasma body, the chip carrier does not cause a gas escape phenomenon, so that the requirement of a chip for the cavity vacuum degree can be kept.

The invention relates to an electron beam exposure machine film clip library system with encoding identification, which is composed of a Z-direction motion stage, a film frame which is used for placing film clips, a gear box, an ascending and descending stage and a computer control system, a drive motor drives a gear in the gear box to rotate under the control of the computer control system, thusdriving the Z-direction motion stage to do the Z-direction motion and allowing the film frame to do the Z-direction motion, the film clips on the film frame are driven to move upward or downward to the film receiving position of a valve port, the film clips are selectively sent to a film carrying stage for carrying out the exposure, at this time, the valve port and a door of the film clip libraryare closed simultaneously, the valve port is opened after the completion of the exposure of one film clip, then the film clip is retaken to the film clip library for preservation, and the exposure valve port is immediately closed; the computer control system further controls the Z-direction motion stage to move upward or downward to the position of the next film clip which needs to be exposed, then the valve port is opened again to carry out the exposure of the next film clip, and the process revolves like this till the film clips are completely exposed. The electron beam exposure machine film clip library system shortens the time of sending and taking the films, improves the positioning precision of sending and taking the films and ensures the exposure quality of the film clips.

The invention discloses a vacuuming control method and a system of ITO-PVD equipment, wherein the method comprises the following steps: a transmission cavity in the ITO-PVD equipment is set as a default cavity of a system dry pump, and is not allocated with a cold pump, and a cold pump is allocated for an ITO process cavity; for the default cavity, when other cavities besides the default cavity do not occupy the system dry pump, the system dry pump continuously vacuums the default cavity; and in the processing procedure, when the cavity in the ITO-PVD equipment requests for vacuuming, the vacuuming is performed according to the cold pump allocating condition of the cavity. The method saves the equipment cost and can effectively prevent the collision between hardware equipment when guaranteeing the vacuum degree requirement in the equipment processing.

The invention discloses a vacuum electrostatic spraying control system comprising an electrostatic spraying system control circuit and an infrared roaster. The vacuum electrostatic spraying control system further comprises a controller, a control panel circuit, a vacuum pump control circuit, an air exhausting system circuit, an air feeding system circuit, a vacuum degree collecting circuit of a vacuum cylinder, a roasting temperature collecting circuit of the vacuum cylinder and a main shaft rotating frequency-conversion driving circuit of the vacuum cylinder. The vacuum electrostatic spraying control system integrates a series of processes such as pre-treatment before surface spraying of a part, vacuum electrostatic spraying, paint curing, waste paint and solution recycling, and can be used for improving the spraying effect, ensuring the product quality, realizing the environmental friendliness and emission reduction, and reducing the production cost.

The invention discloses a polypropylene composition which comprises, by weight parts, 100 parts of polypropylene, 10-30 parts of basic magnesium sulfate whisker, 0.1-1.0 part of foaming agent, 0.5-1.5 parts of smell adsorbent and 10-30 parts of flexibilizer. By simultaneously adding basic magnesium sulfate whisker and foaming agent of a specific content, compared with the situation that only basic magnesium sulfate whisker is added, the weight of a workpiece can be greatly reduced while the comprehensive mechanical property is not reduced, and thus the lightweight requirements of an automobile are met. By adding the smell adsorbent of a specific content and adopting single vacuum design of a twin-screw extruder, it is guaranteed that the vacuum degree requirements are not larger than -0.08 bar, micromolecular volatile matter can be pumped away, and the devolatilization effect is improved obviously. The prepared polypropylene composition is low in smell and emission characteristics, the lightweight requirements of the automobile and low-smell low-emission performances of automobile interior part materials can be met, and the application prospect is wide.

The invention provides a nitrogen sources ionizing method applied to a gas phase deposition growth system of semiconductor materials. In a growth system of semiconductor materials such as CVD, MOCVD, HVPE and MBE, etc., an external radio frequency field is applied to ionize nitrogen sources. The high frequency electric current is applied to electrodes of capacitances or inductance coils, and the high frequency electric field is applied by a gas path arranged between the capacitance plates or circling the inductance coils to speed up electrons and ionize gas molecules to generate plasmas. The device consists of a metallic flange(1), a cooling water pipeline(2), a quartz outer cover(3), a quartz fairing(5), a metal cover(6), a parallel plate capacitor(7), a thermoelectric couple(8), graphite(9), a bleeder hole(10), a radio frequency adapter(11), a radio frequency power source(12) and an air inlet(13), wherein the metallic flange(1) and the metal cover(6) are arranged on both ends of thequartz outer cover(3), and the gas path circling the air inlet(13) or the gas path of a growth platform is provided with capacitances or inductance coupling elements.

The present invention provides a vacuum sealing device and a vacuum tire mould. The vacuum sealing device includes an adjusting part, an elastic device and a first sealing element. A base has a circular slot disposed in the circumferential direction. The adjusting part is disposed in the circular slot through the elastic device. The elastic device is configured to provide an elastic force to enable the adjusting part to approach a middle mould sleeve. The first sealing element is embedded in the end of the adjusting part close to the middle mould sleeve. The first sealing element is configuredto realize sealing between the middle mould sleeve and the base. The vacuum sealing device further includes a second sealing element disposed between the adjusting part and the side wall of the circular slot. Such a vacuum sealing device improves insufficient vacuum degree in the prior art during mould closing and excessive wear to the seal ring.

The invention discloses a plate electrode fixing structure, belonging to the technical field of plasma etching. The plate electrode fixing structure comprises an insulating support, the insulating support is provided with a plurality of air inlets, and upper electrodes and lower electrodes are arranged around the air inlets. The insulating support is 5-1,000mm thick and is made of an insulating material such as ceramic, quartz, polytetrafluoroethylene or polycarbonate. The frequency of a radio-frequency power supply applied between the upper electrodes and the lower electrodes is 0-10GHz. Thedistance between the upper electrodes and the lower electrodes is 2-1,000mm. the area diameter of the upper electrodes and the lower electrodes is 20-3,000mm. By adopting the plate electrode fixing structure, the scope of uniform distribution of a plasma starter can be widened, and particularly good edge uniformity can be achieved. When the plasma starter is used, no air discharging can be causedby the plate electrode fixing structure, and a vacuum chamber can meet vacuum requirements.

The invention discloses a method for testing the multi-field coupling performance of a tritium-blocking coating based on accelerator ion irradiation and a testing device thereof. The method is to use the accelerator to generate energy-carrying ions to irradiate the tritium-resistant coating sample; the gas injection system injects the gas medium into the flange to infiltrate the tritium-resistant coating sample; the temperature control system controls the heating table to irradiate the tritium-resistant coating. The samples are thermally cycled; then processed by the computer program control system. The device includes an electrostatic tandem accelerator, a vacuum chamber, an infrared thermometer, a sample stage, a gas injection system, a temperature control system, a computer program control system and various signal transmission lines; it realizes the multi-field coupling performance test of the anti-tritium coating. The test method and test device of the present invention can realize the multi-field coupling performance test of ion irradiation, thermal cycle and gas permeation on the fusion reactor tritium-resistant coating sample; thus more reliable and accurate evaluation of the tritium-resistant coating in service under actual working conditions Performance, with research and practical application value.