63results about How to "Less hazardous" patented technology

A process for cleaning semiconductor fabrication equipment parts includes determining a definition for a clean part including multiple maximum acceptable impurity levels; determining an initial multiple impurity levels of a part prior to its cleaning; determining a cleaning process to apply to the part; applying the cleaning process to the part, wherein the cleaning process creates reduced multiple impurity levels for the part below that of the initial multiple impurity levels; determining the reduced multiple impurity levels; comparing the reduced multiple impurity levels against the multiple maximum acceptable impurities levels of the definition; and repeating the application of the cleaning process to the part if the reduced multiple impurity levels do not meet the definition of a clean part. A dilute aqueous cleaning solution for cleaning parts includes 0.5-1.5% wt. HF; 0.1-0.5% wt. HNO3; and 1-10% wt H2O2. A method for reducing sub-surface damage to a part includes determining how deep is the sub-surface damage beneath a surface of a part; chemically etching said surface of said part; and stopping said chemical etching of said surface at about said depth of said sub-surface damage.

Provided herein is an improved, convenient, commercially viable and environmentally friendly process for the preparation of varenicline or a pharmaceutically acceptable salt thereof comprising reacting 1-(4,5-diamino-10-aza-tricyclo[6.3.1.02 7]dodeca-2(7),3,5-trien-10-yl)-2,2,2-trifluoro-ethanone with chloroacetaldehyde in the presence of an oxygen source. Provided further herein is an improved and industrially advantageous process for the preparation of 1-(4,5-diamino-10-aza-tricyclo[6.3.1.02 7]dodeca-2(7),3,5-trien-10-yl)-2,2,2-trifluoro-ethanone.

Provided are various methods, systems and reactors for producing peroxycarboxylic acid compositions, such as non-equilibrium compositions of peracetic acid, for example. The methods and systems relate to electrolytic generation of hydrogen peroxide or peroxide ions in a reactor, wherein the generated materials are reacted with an acetyl donor to form peracetic acid. In an embodiment, a source of alkali metal ions is provided to an anode chamber such that the ratio of concentrations of the alkali metal ions to protons in the anode chamber of a reactor is greater than 1.

A carted hay rake is disclosed for raking cut crops into a windrow. The hay rake can include a wheeled cart, rake arms, and tine rake wheels. The rake arms are attached to a rake arm pivot, and can be extendable to a horizontal working position and retractable to a transport position. A positioning arm is utilized to change the angle of the rake arm between the working and transport position. An assist spring can help neutralize the weight of the rake arm while in the working position. The assist spring can be positioned horizontally.

Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material that smoothly replicates the surface microstructure of the substrate material. The coating material is uniformly deposited on the substrate material to form optical interference pigment particles. The thin film enhances the hiding power and color gamut of the substrate material. Physical vapor deposition process are used for depositing the film on the substrate material. The apparatus and systems employed in forming the coated particles utilize vibrating bed coaters, vibrating conveyor coaters, or coating towers. These allow the powdered substrate material to be uniformly exposed to the coating material vapor during the coating process.

A curable resin composition containing as the binder a fumarate copolymer which is excellent in thermal discoloration resistance and capable of forming details of a color filter, namely, a photocurable resin composition useful in forming overcoats, RGB pixels, black matrixes or spacers in the production of color filters, which contains as the binder a fumarate copolymer having a molecular structure comprising constituent units represented by the general formula (1) and constituent units having acidic functional groups, and preferably further containing constituent units having ethylenically unsaturated bonds: (1) wherein R1 and R2 are each independently branched C3-8 alkyl which may be substituted, or C4-8 cycloalkyl which may be substituted.

The invention relates to a composition and method for effectively increasing the hardness of a concrete surface and other cementeous materials. More specifically, increasing hardness of concrete by applying a strontium based solution to its surface, and the structure made by the method. The invention also relates to application of surfactants and / or other additives in order to improve the penetration of the hardening agent into the concrete surface and other cementeous materials, improve the water and / or oil repellant properties of the concrete, and / or improve its stain resistance.

A process for cleaning semiconductor fabrication equipment parts includes determining a definition for a clean part including multiple maximum acceptable impurity levels; determining an initial multiple impurity levels of a part prior to its cleaning; determining a cleaning process to apply to the part; applying the cleaning process to the part, wherein the cleaning process creates reduced multiple impurity levels for the part below that of the initial multiple impurity levels; determining the reduced multiple impurity levels; comparing the reduced multiple impurity levels against the multiple maximum acceptable impurities levels of the definition; and repeating the application of the cleaning process to the part if the reduced multiple impurity levels do not meet the definition of a clean part. A dilute aqueous cleaning solution for cleaning parts includes 0.5-1.5% wt. HF; 0.1-0.5% wt. HNO3; and 1-10% wt H2O2. A method for reducing sub-surface damage to a part includes determining how deep is the sub-surface damage beneath a surface of a part; chemically etching said surface of said part; and stopping said chemical etching of said surface at about said depth of said sub-surface damage.

A process for extracting polyester from an article using a solvent system using a compound according to Formula I is described, wherewherein R1 and R2 are each independently selected from: hydrogen, alkyl, alkenyl, alkynyl, aryl or alkoxy groups; R3 to R12 are each independently selected from: hydrogen, alkyl, alkenyl, alkynyl, aryl or alkoxy groups; and each of “a” to “e” is a carbon atom, wherein the total linear chain length of a-b-c-d-e is in the range of 2 to 5 carbons.

The present invention provides compositions that are intimate mixtures of hydrogen fluoride and a polyacrylate-polyacrylamide cross-linked copolymer. The compositions of the invention are less hazardous and, therefore, more conveniently stored, transported, and handled in comparison to pure hydrogen fluoride. Further, the hydrogen fluoride may be readily recovered from the compositions of the invention for use.

Composition and method for production of peroxycarboxylic acid solutions for various disinfection and cleaning compositions that utilizes non-equilibrium peroxycarboxylic acid. More specifically compositions comprise peracetic acid (PAA) and methods for making non-equilibrium PAA are provided. Frozen compositions useful as antimicrobial ice are provided.