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86 results about "Reflection illumination" patented technology

Improving method for dark spot in accident at exit ramp of expressway based on retro-reflection illumination

InactiveCN102912700AFacilitate early decelerationAchieve a reasonable transitionClimate change adaptationTraffic signalsReflection illuminationSimulation
The invention relates to an improving method for a dark spot in an accident at an exit ramp of an expressway based on retro-reflection illumination, wherein ramp grading speed-limit signs are arranged at sight through places in front of the starting point and the nose end of a transition section of a deceleration lane of the exit ramp; a main line single-layer linear induction sign and a ramp double-layer linear induction sign are arranged behind the nose end of the exit ramp; a lane edge line of the exit ramp deviates towards the inner side and reduces the width of a traffic lane, an edge line of a lane at the outer side is set to be a vibration edge line; raised road signs are arranged at the outer sides of a main line and a road edge line of the exit ramp from the end point of the deceleration lane, and a single-side anti-collision bucket is arranged at a guardrail next to the outer side of the ramp from the nose end of the exit ramp, so as to form a high-frequency vision information stream commonly; road-surface lateral deceleration marked lines are arranged in the heading direction of the exit ramp at an interval of 8-12m, so as to form an intermediate-frequency vision information stream commonly with road side linear induction signs; and road side vibration marked lines, anti-collision buckets and the guardrail form road side multi-level protection, and all safety facilities are made of high-strength reflecting materials. The improving method is suitable for realizing the speed limit for a downgrade ramp at an exit of the expressway (40-60km/h).
Owner:WUHAN UNIV OF TECH

Prism for projection optical system and optical system having same

A prism for a projection optical system included in a projector including an illumination light source, an illumination optical system, and a projection optical system, includes: a first surface that totally reflects a beam of one of the illumination light and the projection light and transmits a beam of the other; and a second surface that is opposed to the first surface with an air gap therebetween and transmits a beam passing through the first surface, wherein the first surface has an antireflective film having an average reflectivity of a s-polarized reflectivity and a p-polarized reflectivity at a center angle of a transmitted beam of 2% or lower in three wavelength ranges including a first wavelength range of blue, a second wavelength range of green, and a third wavelength range of red.
Owner:KONICA MINOLTA INC

Active reflection illumination and projection

InactiveUS20030193726A1Solar heating energyMirrorsGyriconGraphics
This invention deals with the broad general concept for active reflection or projection illumination and image formation. A mini-optics reflection and focussing system is presented that ranges from interior illumination, to exterior illumination, to large scale space based illumination, to ordinary and to telescopic image formation. It can be used both as a source of illumination, and to project images, figures, and the written word. This novel system is uniquely distinct and different from prior art direct viewing gyricon displays, allowing it to be more versatile, economical, and practical with broader applications such as dynamic full color displays. In most cases it can operate with greater simplicity and efficiency. Furthermore in its capacity as a high altitude active reflector of solar radiation, it can be utilized to supply illumination, energy, and provide climate control.
Owner:DAVIDSON MARK PETER +1

Rotating total internal reflection microscopy method and device with feedback function

ActiveCN106226895AAutomatic adjustment of total reflection angleHigh angle control resolutionMicroscopesBeam splitterLight spot
The invention discloses a rotating total internal reflection microscopy device with a feedback function. The device comprises a laser device, a two-dimensional scanning galvanometer, a scanning lens, a collimating lens, a dichroic mirror, a beam splitter, a dichroic mirror, a microscopic field lens, a total reflection microobjective and a sample which are arranged in sequence along an optical path, a light intensity position detector located on the reflection optical path of the beam splitter, a computer and a CCD used for acquiring the sample and emitting fluorescent light, wherein the light intensity position detector is used for collecting illuminating light which is emitted by the laser device and reflected by the beam splitter to obtain a first light spot and collecting sample light formed after total reflection of the position of the sample to obtain a second light spot, and the computer is used for obtaining total reflection illumination angle and evanescent wave penetration depth through feedback according to the position information of the first light spot and the second light spot. The invention further discloses a rotating total internal reflection microscopy method with the feedback function. Through synchronous feedback control of the sample and the microobjective, it can be guaranteed that the sample is located on the optimal illumination face and the optimal imaging face, and illumination uniformity and imaging resolution are higher.
Owner:ZHEJIANG UNIV

Large-format high-speed high-precision automatic optical detector

The invention relates to a large-format high-speed high-precision automatic optical detector, belongs to the field of automatic optical detection, and solves the problem that the detection precision tends to be influenced by different errors when a mobile small-view-field lens is moved in a present automatic optical detector. The detector comprises a support platform, damping supports, a translation guide rail pair, a workbench on the translation guide rail pair, a transmission illumination light source, a precise driver, a control system, a grating ruler, a lens support, a reflection illumination light source, a reflector, a precise focusing platform, a large-view-field high-precision lens and a splicing detector focal plane assembly. The imaging view field of the large-view-field high-precision lens is greater than 750mm, an imaging focal plane is composed of a triangularly spliced detector array, and part or all spliced detectors are controlled to work in different frame frequencies to match the movement speeds of different workpieces. The large-view-field high-precision lens is combined with the multi-detector spliced focal plane, the problem that a single lens cannot realize large-view-field imaging but multiple lenses are inconsistent in imaging is overcome, and the detection precision and efficiency are improved.
Owner:CHANGCHUN YITIAN TECH CO LTD

Self-adaption harmonic wave confocal microscopic measurement method for illumination of ellipsoidal reflector

InactiveCN108982428AHigh measurement resolutionScattering properties have little effectAnalysis by material excitationLight spotOptical measurements
The invention relates to a self-adaption harmonic wave confocal microscopic measurement method for the illumination of an ellipsoidal reflector, belonging to the non-linear optical measurement. According to the method, an ellipsoidal reflection illumination system, a confocal microscopic measurement method, a self-adaption optical aberration correction method and a harmonic wave microscopic methodare organically combined, so that the harmonic wave microscopic measurement resolving power can be improved. A femtosecond laser pulse is subjected to beam shaping and scanning galvanometer reflection, enters the self-adaption optical aberration correction method and is subjected to phase modulation and aberration correction to generate illumination beams, and the illumination beams enter an ellipsoidal reflection mirror system and are assembled into a sample so as to generate stimulation focus light spots required by the generation of harmonic signals. The sample is stimulated by stimulationlight to simultaneously generate second and third harmonic signal, and the second and third harmonic signals are collected and analyzed by a double-path composited confocal microscopic measurement system on the right side. After being collected by a large-numerical aperture objective lens, the harmonic signals are separated into two wavelength signals by a bidirectional color selective mirror, are focused by a narrow band pass filter and an imaging objective lens, are transmitted through a needle hole and are received by a photomultiplier (PMT). An adopted harmonic wave collection module adopts a confocal collection mode. By virtue of an apodization effect of a confocal needle hole, the interference caused by aliasing signal noise to the analysis of the harmonic signals can be effectivelyinhibited, and the measurement resolving power of the microscopic system can be greatly improved.
Owner:HARBIN INST OF TECH

Device and method for inspecting unevenness of film thickness

InactiveCN102967266AAutomatic inspection of film thickness unevennessAccurate inspection results of uneven film thicknessMaterial analysis by optical meansSemiconductor/solid-state device manufacturingTransmission illuminationReflection illumination
The present invention provides a film thickness unevenness inspection device and method capable of acquiring an image with brightness and contrast suitable for inspection, so as to obtain an accurate inspection result. The present invention discloses a film thickness unevenness inspection device and method, characterized in moving a substrate with a surface formed thereon a coating film along a direction and, at the same time, inspecting film thickness unevenness of the coating film formed on the substrate. A film thickness inspection portion is provided for inspecting a thickness of the coating film. A light source portion comprises a reflection illumination portion installed in one side of an image capturing portion, and a transmission illumination portion installed in a location opposite to the image capturing portion with the substrate installed in-between. The image capturing portion comprises an image capturing portion angle adjustment mechanism for adjusting a relative angle with respect to the substrate. The reflection illumination portion comprises a reflection illumination angle adjustment mechanism for adjusting a relative angle between the reflection illumination portion and the substrate. The transmission illumination portion comprises a transmission illumination angle adjustment mechanism for adjusting a relative angle between the transmission illumination portion and the substrate. The film thickness unevenness inspection device comprises a control portion. According to film thickness information from the film thickness inspection portion, the control portion controls the reflection illumination angle adjustment mechanism and the transmission illumination angle adjustment mechanism to regulate a light quantity of reflection illumination and a light quantity of transmission illumination.
Owner:TORAY ENG CO LTD

Focusing apparatus, focusing method, and pattern inspection method

A focusing apparatus includes a first reticle, arranged at the front side of a conjugate position of a TDI sensor; a second reticle, arranged at the back side of the conjugate position; an equalizing circuit to perform gray scale value equalization by using a gray scale value output by the TDI sensor which received the pattern image by illumination light not passing through the first and second reticles; and a distance change / move amount calculation circuit to calculate, in a state where the gray scale value equalization has been performed, a distance change / move amount of a relative distance, for focusing the pattern image of the substrate, between the substrate and the conjugate position of the TDI sensor by using a first derivative value of a gray scale value output by the TDI sensor which received the pattern image by the reflection illumination light having passed through the first and second reticles.
Owner:NUFLARE TECH INC

Reflective illuminating optical system

A reflective illuminating optical system on silicon, more particularly, to an illuminating optical system is provided, in which R, G, and B signals reflected from a LCoS panel (Liquid Crystal on Silicon panel) in a projection system do not pass through wire grid type PBSs (Polarized Beam Splitters) but are reflected by the wire grid type PBSs (Polarized Beam Splitters) so that astigmatism is suppressed and illuminating efficiency is improved.
Owner:LG ELECTRONICS INC

Drawing method for full-frequency mutual reflection illumination effects in scene

ActiveCN103489215AThe results drawn are accurateQuick draw3D-image renderingDirect illuminationReflection illumination
The invention discloses a drawing method for full-frequency mutual reflection illumination effects in a scene. The drawing method includes the steps that a preset scene is read in, a scene model of the preset scene is generated and comprises multiple submodels, and as for each submodel, the direct illumination effect of each submodel and the mutual reflection illumination effect of each rendering point of each submodel in the preset scene are calculated; the final rendering result is obtained through addition of the direct illumination effects and the mutual reflection illumination effects.
Owner:TSINGHUA UNIV
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