870 results about "Wire grid" patented technology

Apparatus and methods for a nano-patterning process to fabricate nanostructures. A roller type mold is used to continuously imprint nanostructures onto a flexible web or a rigid substrate. The process includes a coating and an imprinting module, which rotate the web synchronously. Liquid resist materials are used for imprinting and the patterns are set by thermal or UV curing. The process is used to produce bilayer metal wire-grid polarizers, organic solar cells, and organic light emitting diodes.

An eyepiece for a HMD includes a waveguide, an ambient light polarizer, and a wire grid polarizer with a diffraction lens having a lens function patterned into the wire grid polarizer. Polarized image light is guided between eye-ward and ambient sides of the waveguide from a display source to a viewing region of the waveguide where the polarized image light is directed out of the waveguide through the eye-ward side. The viewing region passes ambient light incident on the ambient side through to the eye-ward side. The ambient light polarizer is disposed adjacent to the ambient side to polarize the ambient light into polarized ambient light having a second polarization orthogonal to the first polarization. The wire grid polarizer is disposed adjacent to the eye-ward side along the viewing region. The wire grid polarizer is oriented to applying the lens function to the polarized image light via diffraction.

Reflective polarization valve engine and projection display are disclosed. Instead of prism PBS, the projector applies wire-grid polarizers with advantages of higher heat-resistance, no limitation of the incident angle and no birefringence effects, to provide excellent contrast luminance. The light source in the projector utilizes an elliptical lamp under a telecentric optical system to achieve higher efficiency and avoid color gradient. In addition, the light paths are in special arrangement. The original beam is first splitted into RGB, and then proceeding with color-recombining right after being polarized via wire-grid polarizers and analyzed by reflective polarization valves. Hence, the analyzed beams finally are recombined images with superior performances.

A device structure for single cell gap reflective and transflective liquid crystal displays (TF-LCDs). For an entirely reflective LCD, the imbedded wire-grid polarizer (WGP) serves as a polarization-dependent for the ambient light. For a transflective TF-LCD, the WGP only covers the reflective pixels. The disclosure also includes a method of using single cell gap liquid crystal displays (LCDs) without phase retardation films by providing a single cell gap LCD having reflective pixels and transmissive pixels, covering solely the reflective pixels, with at least one of: a wire grid polarizer and a broadband cholesteric reflector (BCR), reflecting ambient light off the reflective pixels; and passing back light through the transmissive pixels whereby the cell gap LCD obtains high contrast ratios without using phase retardation films.

An image is displayed by modulating TM-polarized light between the polarizer 2 and the wire grid polarizer 18 through the variation of the optical characteristic of the liquid crystal layer 12 interposed between the transparent plate 4 and the transparent plate 26. Degradation of contrast in the bright ambience is avoided by providing an absorption layer for absorbing TE-polarized light on that surface of the wire grid polarizer 18 which faces the liquid crystal layer 12.

In an example embodiment, a wire grid polarizer includes a plurality of parallel conductors having a pitch (P), a width (W), and a height (H). In example embodiments, a fill-factor (W / P) is greater than approximately 0.18 and less than approximately 0.25. In another example embodiment, a display system includes a light source and a light-valve. The display system also includes a wire grid polarizer that includes a plurality of parallel conductors having a pitch (P), a width (W), and a height (H). In example embodiments, a fill-factor (W / P) is greater than approximately 0.18 and less than approximately 0.25.

A wire grid polarizer with double metal layers for the visible spectrum. Parallel dielectric layers having a period (p) of 10˜250 nm and a trench between adjacent dielectric layers overlie a transparent substrate. A first metal layer having a first thickness (d1) of 30˜150 nm is disposed in the trench. A second metal layer having a second thickness (d2) of 30˜150 nm and a width (w) overlies on the top surface of each dielectric layer. The first and second metal layers are separated by a vertical distance (l) of 10˜100 nm. The first thickness (d1) is the same as the second thickness (d2). A ratio of the width (w) to the period (p) is 25˜75%.

An improved method and system for attaching a welded wire grid-work panel to a plurality of face panels of a retaining wall. The method first begins by providing a plurality of stackable face panels, each face panel having a plurality of anchor links fixed within a back portion of the face panels. Each of the anchor links forms a vertical loop extending outwardly generally perpendicular to the back portion of the face panels. Additionally, each anchor link includes two legs extending laterally from each anchor link within the face panel. Next, a first tier of the face panels is disposed at the bottom of the embankment being erected. Soil is then back-filled behind the first tier of panels to a level of the anchor links disposed within the first tier of face panels. A welded wire grid-work panel, which extends perpendicularly from the back portion of the face panels into a soil embankment, is positioned so that a plurality of wire loops at the edge of the grid-work panel aligns with the vertical loops. A connector rod is extended through the vertical loops of the anchor links and the wire loops of the grid-work panel. Next, additional soil is back-filled behind the first tier of face panels and over the anchor links, vertical loops, wire loops, and grid-work panel to a level at a top edge of the first tier of face panels. The method is repeated until the desired height of the embankment is attained.

While gold wire grids have been used to polarize infrared wavelengths for over a hundred years, they are not appropriate for shorter wavelengths due to their large period. With embodiments of the present invention, grids with periods a few tens of nanometers can be fabricated. Among other things, such grids can be used to polarize visible and even ultraviolet light. As a result, such wire grid polarizers have a wide variety of applications and uses, such as, e.g., in the fabrication of semiconductors, nanolithography, and more.

A reflection repressed wire-grid polarizer device for polarizing incident visible or infrared light and selectively repressing a reflected polarization includes at least three layers disposed on a substrate. A polarizing wire-grid layer has an array of parallel metal wires with a period less than half the wavelength of the incident light. A reflection-repressing layer or grid includes an inorganic and non-dielectric material which is optically absorptive of visible or infrared light. A dielectric layer or grid includes an inorganic and dielectric material.

Wire-grid polarizers (WGPs) and their use in transmissive displays are disclosed. The displays containing these WGPs possess high contrast and brightness characteristics in comparison to prior art displays.

There are provided a thin wire grid polarizer having a high transmittance, a high quenching ratio and a high degree of polarization, and a method for producing the same at low costs. A fluoridated polyimide thin film 12, a hydrophilic thin film 13 and a hydrophobic thin film 14 are sequentially stacked on a glass substrate 11 to be pressed by a die 1 from the side of the hydrophobic thin film 14 to transfer the fine pattern of groove forming protrusions 3 of the die 1 to the hydrophobic thin film 14 and hydrophilic thin film 13 by the nano-imprinted lithography technique, and then, metal fine wires are caused to grow by plating.

A projection design configured for use with a projector having a projector lens is provided. The device includes at least one pi-cell or pi-cell electro-optical modulator in combination with a wire grid polarizer mounted proximate the pi-cell(s). The design may include a cleanup polarizer between the pi-cell(s) and the wire grid polarizer and optionally a protective window between the wire grid projector and projection lens. The device may be oriented at an angle substantially differing from the axis of the projector lens. The resultant device includes spacing for airflow and can offer improved performance, particularly in heating, over designs previously available.

The invention relates to an optical element comprising a substrate, a wire grid on one side of said substrate, and prismatic light collimating features on the other side of said substrate

A wire grid polarizer includes a substrate adapted to transmit predetermined wavelengths of light, a plurality of dielectric wires extending parallel to one another along a first direction on the substrate, the dielectric wires including a dielectric material adapted to transmit the predetermined wavelengths of light, and a plurality of metal wires extending along the first direction between the dielectric wires, wherein sidewalls of the metal wires include portions in contact with sidewalls of the dielectric wires and portions not in contact with the sidewalls of the dielectric wires.

Apparatus and methods for a nano-patterning process to fabricate nanostructures. A roller type mold is used to continuously imprint nanostructures onto a flexible web or a rigid substrate. The process includes a coating and an imprinting module, which rotate the web synchronously. Liquid resist materials are used for imprinting and the patterns are set by thermal or UV curing. The process is used to produce bilayer metal wire-grid polarizers, organic solar cells, and organic light emitting diodes.

The present invention relates to a liquid crystal display (LCD) and a method of manufacturing the same. In the present invention, a wire grid polarizing pattern is formed on at least one of thin film transistor and color filter substrates in a manufacturing process thereof. According to the present invention, the thickness of an LCD panel can be reduced as compared with a method of attaching an existing polarizer to an LCD panel, and the wire grid polarizing pattern can be built in an LCD panel without increasing the number of masking processes.

The present invention provides a wire-grid polarizer showing high polarization separation ability in the visible light region and is excellent in heat resistance and durability; and a process for producing such a wire-grid polarizer with high productivity, which enables to produce a polarizer of large area.A process for producing a wire-grid polarizer, comprising a step of coating a supporting substrate with a photocurable composition, a step of pressing a mold having a plurality of parallel grooves at a constant pitch against the photocurable composition so that the grooves contact with the photocurable composition, a step of curing the photocurable composition in a state that the mold is pressed against the photocurable composition, to form a light-transmitting substrate having a plurality of ridges corresponding to the grooves of the mold, a step of separating the mold from the light-transmitting substrate, and a step of forming fine metalic wires on the ridges of the light-transmitting substrate.

The mechanical behavior of wires subjected to axial loading and experiencing bending deformation is used to ensure effective control of the contact pressure in mechanical and / or heat removing devices, and similar structures and systems. An apparatus for taking advantage of the characteristics of wires in packaging of a device, such as a semiconductor device, is disclosed, as well as a test device for identifying the accurate contact pressure required in same. Methods for the prediction of such a behavior for pre-buckling, buckling, and post-buckling conditions in wires, carbon nanotubes (CNTs), and similar wire-grid-array (WGA) structures, for example are also disclosed.

A high-transparency, low-emissivity window film or coating is designed to maximize so-called greenhouse heating. This effect is achieved through the use of conductive grids and / or gratings whose width and spacing has been selected such that the grid appears as a uniform conductive film to long-wavelength infrared (blackbody) radiation. The conductive grid film reflects the blackbody radiation strongly, and such that the grid appears highly transparent to visible and near-infrared light, and therefore transmits it.

A cube wire-grid polarizing beam splitter includes a pair of prisms secured together to form a cube. An array of parallel conductive wires is disposed between the pair of prisms. A pair of continuous film layers is disposed on one side of the wires between the wires and one of the pair of prisms with an intermediate film layer adjacent the prism having a refractive index greater than both i) a refractive index of a rear film layer adjacent the plate wire grid polarizer, and ii) a refractive index of an adjacent prism. A layer of ribs is disposed on another side of the wires between the wires and another of the pair of prisms, the ribs being aligned with and supporting the array of parallel conductive wires.

A liquid crystal display (LCD) device, with an organic electroluminescent display (OLED) element serving as a light source, a common electrode, and a polarizer which is a wire grid polarizer or a thin film polarizer are formed on a lower substrate. A pixel electrode is formed on an upper substrate. According to the invention, a thinner integrated LCD device with improved light utilization efficiency is obtained.

A wire grid polarizer may be fabricated by forming plurality of substantially-straight metallic lines of predetermined periodicity Λ on a thin film substrate A plurality of substantially straight nanometer-scale periodic surface relief structures is created on a surface of the substrate. The periodic surface relief structures cover a region greater than about 4 centimeters in length and greater than about 4 centimeters in width, wherein the periodicity Λ is between about 10 nanometers and about 500 nanometers. One or more layers of material are formed on the periodic relief structures. The one or more layers include one or more conductor materials that form the plurality of substantially straight metallic lines over a region of the substrate greater than about 4 centimeters in length and greater than about 4 centimeters in width.