The invention provides a
wafer detecting method and a
wafer detecting device. The
wafer detecting method provided by the invention comprises the following steps: measuring light is produced; a detecting
light spot is formed by the measuring light on a wafer to be detected; the wafer to be detected is scanned by the detecting
light spot; the measuring light is scattered by particles positioned within the range of the detecting
light spot, so as to form
scattered light; the
scattered light is detected, and a corresponding time-related
scattered light signal is formed; and distribution information of the particles on the wafer to be detected is obtained on the basis of the time-related scattered
light signal. The wafer detecting device comprises a
light source for providing the measuring light, a moving and rotating platform for bearing the wafer to be detected and enabling the wafer to move or rotate, a photoelectric
detector for detecting the scattered light at a certain frequency, and a
data processing unit for obtaining the distribution information of the particles on the wafer to be detected according to the time-related scattered
light signal detected by the photoelectric
detector. The wafer detecting method provided by the invention has the
advantage of relatively high efficiency, and the wafer detecting device provided by the invention has the
advantage of relatively low design difficulty.