The invention discloses a method for preparing an ultra-thick hard thin film based on an
energy regulation principle. The method comprises the following steps of 1, cleaning a substrate and then
drying to obtain a clean substrate; 2, loading an arc target and the clean substrate into multi-arc
ion plating equipment, vacuumizing a
vacuum chamber and then heating; 3, performing
sputtering cleaning and activation on the clean substrate to obtain an activated substrate; 4, plating a
metal priming coat on the activated substrate; 5, depositing a
transition layer on the surface of the plated
metal priming layer; and 6, preparing an energy adjusting layer on the
transition layer through an energy adjusting process, and performing annealing to obtain the ultra-thick hard thin film on the surface of the substrate after cooling. Based on the
energy regulation principle, the ultra-thick hard thin film composed of the
metal priming layer, the
transition layer and the energy adjusting layer is prepared, the
internal stress is reduced by adjusting the energy input in the growth process of the energy adjusting layer, the thin film
cracking and peeling are avoided, the film layer tissue structureis optimized, and the ultra-thick hard thin film with the thickness greater than 20 microns is obtained.