44results about How to "Increase exposure area" patented technology

The invention relates to an automatic grain tedder which comprises a rack (2), and reversing driving mechanisms (1) arranged at four corners of the rack (2). The automatic grain tedder is characterized in that a power supply (4) and a motor (10) which is used for driving a grain turning device (7) arranged in the middle of the rack (2) are arranged on the rack (2); and the power supply (4) supplies power to the reversing driving mechanisms (1) and the motor (10). With the adoption of the technical scheme, the automatic grain tedder disclosed by the invention has the technical effects that the grain basking area is increased, the grain turning effect is good, the grain turning labor amount of peasant households is greatly reduced, the cost is low, and the market prospects are wide.

An exposure apparatus includes an exposure unit for exposing a wafer. The exposure unit includes an illumination system and masks. The illumination system includes a light-homogenizing unit. The light-homogenizing unit includes a light-homogenizing quartz rod having a regular hexagonal cross section. Each of the masks has a regular hexagonal shape matching with the cross section of the light-homogenizing quartz rod. A field of exposure resulting from this arrangement is less affected by objective field of view distortion and allows a higher useful depth of focus (UDoF) when compared to other fields of exposure of the same size. In addition, with the same projection objective DoF, a greater field of exposure can be obtained.

The invention discloses an exposure device. The exposure device comprises an exposure unit used for preforming exposure on a wafer, wherein the exposure unit comprises an illuminating system and masks, and the illuminating system comprises a dodging unit. The exposure device is characterized in that the dodging unit comprises orthohexagonal dodging quartz rods; and each mask is in an orthohexagonal shape matched with that of each orthohexagonal dodging quartz rod. Through the adoption of the exposure device disclosed by the invention, under the situation of the same exposure field of view, the influence of field curvature of an objective lens on depth of focus is reduced, and the depth of focus, which can be used in practice, is increased; and under the situation of the same depth of focus of projection objective lenses, the exposure area of the exposure field of view is expanded.

The invention discloses a rotary jig for exposure. The rotary jig comprises a support frame and an accommodating assembly, wherein the support frame is provided with two opposite positioning plates; the accommodating assembly is rotationally arranged on the inner sides of the two positioning plates and comprises two inner frame plates, a ratchet mechanism, two rotating shafts, a plurality of fixedshafts and a plurality of clamping strips; the two inner frame plates are located on the inner sides of the two positioning plates; the ratchet mechanism is located between one of the two inner frameplates and one of the two positioning plates. The rotating shafts penetrate through the two inner frame plates and the two positioning plates, and one of the two rotating shafts penetrates through the ratchet mechanism; two ends of each fixed shaft are fixed at corners of the two inner frame plates respectively. Each clamping strip is detachably bridged on the two inner frame plates. The ratchetmechanism can allow the accommodating assembly to rotate on the support frame at multiple positioning angles, and therefore, multiple parts of a substrate can be exposed on the premise that the substrate is not taken down in the exposure process. The rotary jig for exposure can increase the output efficiency and the cost of the jig can be reduced.