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48results about How to "High plating rate" patented technology

Electrolytic copper plating solutions

The present invention provides inter alia copper electroplating compositions, methods for use of the compositions and products formed by the compositions. Electroplating compositions of the invention contain an increased brightener concentration that can provide effective copper plate on difficult-to-plate aperture walls, including high aspect ratio, small diameter microvias.
Owner:BARSTAD LEON R +6

Electrolytic copper plating solutions

InactiveUS20060183328A1Effective platingEnhanced brightener concentrationSemiconductor/solid-state device manufacturingPrinted circuit manufactureCopper platingElectrolysis
The present invention provides inter alia copper electroplating compositions, methods for use of the compositions and products formed by the compositions. Electroplating compositions of the invention contain an increased brightener concentration that can provide effective copper plate on difficult-to-plate aperture walls, including high aspect ratio, small diameter microvias.
Owner:BARSTAD LEON R +6

Stable electroless copper plating compositions and methods for electroless plating copper on substrates

Select carboxymethyl-thio compounds are added to electroless copper plating compositions to improve the stability of the electroless copper plating compositions such that the plating activity of the electroless plating copper compositions is not compromised even when electroless plating at low plating temperatures and high stabilizer and high leached catalyst concentrations.
Owner:ROHM & HAAS ELECTRONICS MATERIALS LLC

Electroless copper plating compositions and methods for electroless plating copper on substrates

InactiveUS20190382900A1Increased electroless copper plating rateGood through-hole wall coverageLiquid/solution decomposition chemical coatingCopper platingElectroless plating
Stable electroless copper plating baths include imidazolium compounds to improve rate of copper deposition on substrates. The copper from the electroless plating baths can be plated at low temperatures and at high plating rates.
Owner:ROHM & HAAS ELECTRONICS MATERIALS LLC

Activator, preparation method and preparation method of carbon fiber composite material

The invention relates to the technical field of chemical plating, in particular to an activator, a preparation method and a preparation method of carbon fiber composite material. The activator is prepared from the following components of a dispersing agent, sodium citrate, nickel salt and a boron-containing compound, wherein the boron-containing compound is potassium borohydride or sodium borohydride, and the PH value of the activator is 9-11. The dispersing agent in the activator can prevent aggregation of carbon fibers in water solution and re-aggregation after the carbon fibers are activated and washed, the activator has a procedure integrated function, the carbon fibers are only needed to be placed in the activator, the procedures of dispersing, sensitizing and activating of the carbonfibers can be completed, so that traditional complicated steps of dispersion, sensitization and activation are simplified. The activator exists in an alkaline condition and is relatively high in stability, so that the activating effect is good, the chemical plating rate is high, and the practicability is good. In addition, the activator uses cheap and easily available nickel instead of noble metal palladium or silver, so that the activation cost is saved.
Owner:GUANGDONG UNIV OF TECH

Method and regeneration apparatus for regenerating a plating composition

A method and apparatus for regenerating a plating composition which is suitable for depositing at least one first metal on a substrate where the plating rate in the plating composition is very low, where the concentration of the at least one first metal in the plating composition cannot be easily set at a constant level, and where plating-out of the at least one first metal from the plating composition takes place. The method and apparatus for regenerating a plating composition is suitable for depositing at least one first metal on a substrate at a sufficiently high plating rate, while offering the opportunity to easily adjust the concentration of the at least one first metal in the plating composition at a constant level and to provide the plating composition with sufficient stability against decomposition thereof in order to safeguard the regeneration cell from plated-out first metal.
Owner:ATOTECH DEUT GMBH

Plating apparatus

A plating apparatus includes a plating tank for storing a plating liquid, and applies a magnetic alloy plating to a shaft-shaped member immersed in the plating liquid by using the shaft-shaped member as a cathode. The plating apparatus further includes a routable member configured to rotate the shaft-shaped member as a rotary shaft; annular shielding tools mounted on the outer peripheral surface of the shaft-shaped member; a plating liquid discharge nozzle including plating liquid discharge ports which are provided to face the shaft-shaped member so as to avoid the shielding tools; and an anode provided around the shaft-shaped member and the plating liquid discharge nozzle.
Owner:HONDA MOTOR CO LTD

Electroless copper plating compositions and methods for electroless plating copper on substrates

InactiveUS20190382901A1Increased electroless copper plating rateGood through-hole wall coverageLiquid/solution decomposition chemical coatingCopper platingElectroless plating
Stable electroless copper plating baths include pyridinium compounds to improve rate of copper deposition on substrates. The copper from the electroless plating baths can be plated at low temperatures and at high plating rates.
Owner:ROHM & HAAS ELECTRONICS MATERIALS LLC
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