161 results about "Spectral purity" patented technology

A high-intensity light source is formed by a micro array of a semiconductor light source such as a LEDs, laser diodes, or VCSEL placed densely on a liquid or gas cooled thermally conductive substrate. The semiconductor devices are typically attached by a joining process to electrically conductive patterns on the substrate, and driven by a microprocessor controlled power supply. An optic element is placed over the micro array to achieve improved directionality, intensity, and / or spectral purity of the output beam. The light module may be used for such processes as, for example, fluorescence, inspection and measurement, photopolymerzation, ionization, sterilization, debris removal, and other photochemical processes.

An asymmetric-cut multilayer diffracts EUV light. A multilayer cut at an angle has the same properties as a blazed grating, and has been demonstrated to have near-perfect performance. Instead of having to nano-fabricate a grating structure with imperfections no greater than several tens of nanometers, a thick multilayer is grown on a substrate and then cut at an inclined angle using coarse and inexpensive methods. Effective grating periods can be produced this way that are 10 to 100 times smaller than those produced today, and the diffraction efficiency of these asymmetric multilayers is higher than conventional gratings. Besides their ease of manufacture, the use of an asymmetric multilayer as a spectral purity filter does not require that the design of an EUV optical system be modified in any way, unlike the proposed use of blazed gratings for such systems.

A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.

Filters for EUV lithography, methods of manufacture thereof, and methods of filtering in an EUV lithography system are disclosed. The filter comprises a nanotube material layer sandwiched by two thin material layers that are highly transmissive and provide structural support for the nanotube material layer. The filter is supported on at least one side by a patterned structural support. The filter mitigates debris, provides spectral purity filtering, or both.

Shockline-based samplers of a vector-network analyzer (VNA) have enhanced dynamic range by using a dynamic bias network applied to the non-linear transmission lines (NLTLs) or shocklines. The bias voltage applied to the NLTL provides direct control over the falling-edge shockline compression, and thus the insertion loss and overall RF bandwidth of the sampler. Alternating between a forward bias voltage to turn off a shockline sampler when it is not needed and thereby reducing spurious generation and improving isolation can be alternatively applied with a reverse bias voltage to turn on the shockline sampler in a normal operation mode. By measuring the shockline output and providing feedback in the reverse-bias mode, the bias voltage can be dynamically adjusted to significantly increase the performance of the NLTL based sampler. In the presence of a strong positive bias voltage, the incoming LO and its harmonics experience large ohmic losses thus preventing gating pulses from forming in the shockline. The ohmic losses enable strong isolation between the LO sampling channels and will increase spectral purity at the VNA test ports.

Analytical multi-spectral optical detection systems and methods. A light source (1) provides one or multiple lines (e.g., discrete wavelengths) of high spectral purity excitation light that is optically coupled to a sample via delivery fiber optic cables (3) . Emission light is collected and provided to an emission detector, such as a diffraction gradient spectrophotometer emission detector (7) , using collection fiber optic cables (5) bundled with the delivery fiber optic cables in a probe interface (8) positioned proximal a sample holder (4) . The probe interface may be scanned over one or more samples, or one or more samples may be scanned proximal a fixed interface probe. Multiple excitation wavelengths allows for simultaneous excitation and detection of multiple fluorescent dyes in the visible spectrum. This increases sample throughput and reduces signal variations associated with signal acquisition at different times. The optical system provides several advantages over other systems including higher sensitivity, improved compatibility with fluorescent dyes, better signal discrimination, increased system reliability and reduced manufacturing and service costs.

A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.

An extreme ultraviolet (EUV) actinic reticle imaging system suitable for discharge produced plasma (DPP) or laser produced plasma (LPP) reticle imaging systems using a thin film coating spectral purity filter (SPF) positioned on or proximate to the EUV imaging sensor; an EUV imaging sensor carrying this SPF; and methods for making and using the SPF for reticle inspection. The coating may be applied to the imaging sensor in any manner suitable for the particular coating selected. The coating may be composed of a single layer or multiple layers. Typical SPF coating materials include zirconium (Zr) and silicon-zirconium (Si / Zr) in a thickness between 10 nm and 100 nm.

A phase-to-sinusoid-amplitude conversion system and method for use in, for example, direct digital frequency synthesizer applications. The system and method convert phase data to signal amplitude data using an approximation of the first quadrant of a sine function using a plurality of linear line segments of preferably equal length. Each segment is defined with a lower horizontal-axis bound; a lower vertical-axis bound; and a slope represented as a sum of a plurality of slope elements. Based on the approximation and for a given phase angle a set of values are evaluated, for each linear line segment, representing a product of (i) a horizontal displacement representing a difference between the prescribed phase angle and the lower horizontal-axis bound xi of a selected linear line segment where, for example, xi<X<Xi+1 and (ii) each one of the slope elements of the selected linear line segment. The approximation of the sinusoidal amplitude is then obtained by adding one of the sets of values determined above with the lower vertical-axis bound of the selected linear line segment. With appropriate selection of the number of line segments (e.g., integer power of two) and slopes elements (e.g., expressed as a sum of desired powers of two), the operations are computationally efficient and improve spectral purity and reduces implementation costs and power consumption of resulting circuitry.