160 results about "Spectral purity" patented technology

A high-intensity light source is formed by a micro array of a semiconductor light source such as a LEDs, laser diodes, or VCSEL placed densely on a liquid or gas cooled thermally conductive substrate. The semiconductor devices are typically attached by a joining process to electrically conductive patterns on the substrate, and driven by a microprocessor controlled power supply. An optic element is placed over the micro array to achieve improved directionality, intensity, and / or spectral purity of the output beam. The light module may be used for such processes as, for example, fluorescence, inspection and measurement, photopolymerzation, ionization, sterilization, debris removal, and other photochemical processes.

A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

A reflective filter serving as a multi-bandpass filter for a light source configured to emit light in a plurality of color primary wavelengths to improve color purity. The addition of a reflective / recirculation assembly reinforces and recirculates light not passed by the multi-bandpass filter back into a desired spectrum, which is subsequently passed by the multi-bandpass filter, or converts light not passed by the multi-bandpass into electrical energy for use by the system. The reflective filter, solely or along with the recirculation assembly, can be placed adjacent a conventional light source. Alternatively the multi-bandpass filter and the recirculation assembly can be placed in a modified light source, or placed in an optical stack along the path of light emission. Collimating structures that enforce the light into desired incident angle of attack onto the reflective filter can be included to enhance the efficiency of the reflective elements in the assembly.

An asymmetric-cut multilayer diffracts EUV light. A multilayer cut at an angle has the same properties as a blazed grating, and has been demonstrated to have near-perfect performance. Instead of having to nano-fabricate a grating structure with imperfections no greater than several tens of nanometers, a thick multilayer is grown on a substrate and then cut at an inclined angle using coarse and inexpensive methods. Effective grating periods can be produced this way that are 10 to 100 times smaller than those produced today, and the diffraction efficiency of these asymmetric multilayers is higher than conventional gratings. Besides their ease of manufacture, the use of an asymmetric multilayer as a spectral purity filter does not require that the design of an EUV optical system be modified in any way, unlike the proposed use of blazed gratings for such systems.

A frequency synthesis circuit is disclosed. The circuit includes a phase-locked loop and multi-phase oscillator such as a rotary traveling wave oscillator (RTWO). The oscillator provides a plurality of phases that are applied to a selection circuit. The selection circuit, in response to the output of a delta-sigma modulator, selects one of the phases of the multi-phase oscillator to minimize phase shift noise when the divider ratio in the loop changes, thereby eliminating a source of noise that contaminates the synthesized frequency. This permits the use of the frequency synthesis in applications requiring a high degree of spectral purity.

A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.

A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source.

Filters for EUV lithography, methods of manufacture thereof, and methods of filtering in an EUV lithography system are disclosed. The filter comprises a nanotube material layer sandwiched by two thin material layers that are highly transmissive and provide structural support for the nanotube material layer. The filter is supported on at least one side by a patterned structural support. The filter mitigates debris, provides spectral purity filtering, or both.

In a line-narrowed gas laser system such as a line-narrowed molecular fluorine laser system, ASE is cut off to obtain a spectral linewidth of 0.2 pm or lower and a spectral purity of 0.5 pm or lower. The laser system comprises a laser chamber filled with an F2-containing laser gas, discharge electrodes located in the laser chamber, a laser resonator and a line-narrowing module located in the laser resonator with a wavelength selection element, so that a line-narrowed laser beam emerges from the laser resonator. To cut off ASE from the laser beam emerging from the laser resonator, the duration from laser emission by discharge to generation of a laser beam is preset. Rise of the sidelight is made so gentle that the starting point of a laser pulse can exist after the time of the first sidelight peak.

Disclosed is a device with precise channel spacing and multiple wavelength light source with high flatness and a method, belonging to the technical field of the optical communication, comprising an adjustable seed light source, a radio frequency signal source, a single arm mach tsend modulator, a double parallel mach tsend modulator, a power spliter, three electrical amplifiers and two electrical phase shifters. The method comprises: cascading the single arm mach tsend modulator and the double parallel mach tsend modulator, respectively driven by a low speed radio frequency signal, through selecting the bias points of the two modulators respectively as the highest point and the lowest point of the transmission curve, and simply control the amplitude and the phase of the radio frequency signal of the modulator, obtaining the wavelength light source including nine wavelengthes with the frequency interval equal to the frequency of the radio frequency signal. The wavelength light source of the invention has good spectral purity and phase coherence, high flatness, without expensive high power high frequency amplifier, thereby greatly reducing the arrangement cost.

Shockline-based samplers of a vector-network analyzer (VNA) have enhanced dynamic range by using a dynamic bias network applied to the non-linear transmission lines (NLTLs) or shocklines. The bias voltage applied to the NLTL provides direct control over the falling-edge shockline compression, and thus the insertion loss and overall RF bandwidth of the sampler. Alternating between a forward bias voltage to turn off a shockline sampler when it is not needed and thereby reducing spurious generation and improving isolation can be alternatively applied with a reverse bias voltage to turn on the shockline sampler in a normal operation mode. By measuring the shockline output and providing feedback in the reverse-bias mode, the bias voltage can be dynamically adjusted to significantly increase the performance of the NLTL based sampler. In the presence of a strong positive bias voltage, the incoming LO and its harmonics experience large ohmic losses thus preventing gating pulses from forming in the shockline. The ohmic losses enable strong isolation between the LO sampling channels and will increase spectral purity at the VNA test ports.

Analytical multi-spectral optical detection systems and methods. A light source (1) provides one or multiple lines (e.g., discrete wavelengths) of high spectral purity excitation light that is optically coupled to a sample via delivery fiber optic cables (3) . Emission light is collected and provided to an emission detector, such as a diffraction gradient spectrophotometer emission detector (7) , using collection fiber optic cables (5) bundled with the delivery fiber optic cables in a probe interface (8) positioned proximal a sample holder (4) . The probe interface may be scanned over one or more samples, or one or more samples may be scanned proximal a fixed interface probe. Multiple excitation wavelengths allows for simultaneous excitation and detection of multiple fluorescent dyes in the visible spectrum. This increases sample throughput and reduces signal variations associated with signal acquisition at different times. The optical system provides several advantages over other systems including higher sensitivity, improved compatibility with fluorescent dyes, better signal discrimination, increased system reliability and reduced manufacturing and service costs.

A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.

An extreme ultraviolet (EUV) actinic reticle imaging system suitable for discharge produced plasma (DPP) or laser produced plasma (LPP) reticle imaging systems using a thin film coating spectral purity filter (SPF) positioned on or proximate to the EUV imaging sensor; an EUV imaging sensor carrying this SPF; and methods for making and using the SPF for reticle inspection. The coating may be applied to the imaging sensor in any manner suitable for the particular coating selected. The coating may be composed of a single layer or multiple layers. Typical SPF coating materials include zirconium (Zr) and silicon-zirconium (Si / Zr) in a thickness between 10 nm and 100 nm.

An apparatus is provided that is capable of interleaving detection of fluorescence and luminescence signals emitted from a plurality of samples. The apparatus is suitable for analysis of samples containing single cells or tissues up to and including living organisms. It contains an optical assembly or “sandwich” for producing a spectrally pure and spatially dispersed light source for illuminating the sample. The invention also provides a plurality of optical sandwiches that can be variously geometrically arranged and their intensities programmed to create spatially uniform illumination over a large sample. The invention further provides an apparatus having at least one of the optical sandwich and a detector system capable of interleaving detection of fluorescent and luminescent signals when a suitable sample is illuminated by the light source of the optical sandwich. Methods for preparing samples and using the sandwiches, arrays and apparatus, are further provided by this invention. A method for interleaving detection of fluorescent and luminescent signals emitted from a plurality of samples is disclosed.

A phase-to-sinusoid-amplitude conversion system and method for use in, for example, direct digital frequency synthesizer applications. The system and method convert phase data to signal amplitude data using an approximation of the first quadrant of a sine function using a plurality of linear line segments of preferably equal length. Each segment is defined with a lower horizontal-axis bound; a lower vertical-axis bound; and a slope represented as a sum of a plurality of slope elements. Based on the approximation and for a given phase angle a set of values are evaluated, for each linear line segment, representing a product of (i) a horizontal displacement representing a difference between the prescribed phase angle and the lower horizontal-axis bound xi of a selected linear line segment where, for example, xi<X<Xi+1 and (ii) each one of the slope elements of the selected linear line segment. The approximation of the sinusoidal amplitude is then obtained by adding one of the sets of values determined above with the lower vertical-axis bound of the selected linear line segment. With appropriate selection of the number of line segments (e.g., integer power of two) and slopes elements (e.g., expressed as a sum of desired powers of two), the operations are computationally efficient and improve spectral purity and reduces implementation costs and power consumption of resulting circuitry.