Device and method for
wavefront measurement of an
optical imaging system by means of phase-shifting
interferometry, having a
mask structure (6a) to be arranged on the object side, and / or a
grating structure (7a) to be arranged on the image side. The object-side
mask structure includes one or more one-dimensional
mask structure patterns, and the image-side
grating structure includes one or more two-dimensional
grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a
pupil position offset caused by a lateral relative movement of the mask structure and
detector element can be taken into account by back calculating the interferogram, respectively recorded by the
detector element, using an associated phase-shift characteristic, or by a computational correction of
wavefront derivatives, obtained from the recorded interferograms, in the direction of
lateral movement. The method and / or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography
exposure machines using shearing or point
interferometry.