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80results about How to "Favorably corrected" patented technology

Image capturing device, correction device, mobile phone, and correcting method

An image capturing device is adapted to capture an object image and to generate an image data. Each of a plurality of image capturers is adapted to perform an image capturing of a part of the object image and to generate a partial image data which constitutes a part of the image data based on the part of the object image. Each of the image capturers has an optical axis. A detector is operable to detect movement of each of the image capturers in a direction perpendicular to the optical axis during the image capturing and to generate movement data based on the detected movement, for each of the image capturers. A processor is operable to correct the partial image data so as to compensate the movement during the image capturing based on the movement data.
Owner:ADVANCED INTERCONNECT SYST LTD

Variable power optical system, imaging device, and digital device

A variable power optical system (1) comprises a first lens group (11) having a negative optical power, a second lens group (12) having a positive optical power, and a third lens group (13). The first to third lens groups are arranged in order from the object side to the image side. The first lens group (11) is composed of one negative lens (111) and is fixed in variable power. The third lens group (13) includes at least one aspherical surface. When the third lens group is divided into a front group and a rear group with the largest air space in the third group, the front group has a negative optical power, and the rear group has a positive optical power.
Owner:KONICA MINOLTA OPTO

Radiation correction method for electron beam lithography

InactiveUS6872507B2Readily commercially implementedOptimal correction for proximity effectsElectric discharge tubesRadiation applicationsResistLight beam
A method for forming a patterned microelectronics layer employing electron beam lithography in a sensitive material upon a substrate with optimal correction for proximity effects resulting from electron back scattering into the resist material. There is provided a substrate having formed thereon a layer of resist material sensitive to electron beam exposure. There is then exposed the sensitive layer to a vector scan shaped electron beam to write a primary pattern with dose correction of the beam dose for proximity effects due to electron scattering at each point in the primary pattern. There is then written a secondary pattern which is a negative reversed image of the primary pattern in a secondary exposure employing a vector scan shaped focused electron beam at an exposure dose substantially below the primary beam dose, there being provided a gap between the primary pattern and the secondary pattern. There is then developed the primary pattern in the sensitive resist layer to form the final corrected pattern on the substrate. The patterned layer of resist material may be employed directly on the substrate on which it is formed, or alternatively the patterned resist layer may be employed formed over an opaque layer upon the transparent substrate and subsequently the pattern etched into the opaque layer to form a photomask.
Owner:TAIWAN SEMICON MFG CO LTD

Retrofocus, wide-angle lens

A retrofocus, wide-angle lens includes a first lens group of negative refractive power, a stop, and a second lens group of positive refractive power. The first lens group includes, in order from the object side, a meniscus lens elements having positive refractive power, two meniscus lens elements having negative refractive power, and a thick lens element. The second lens group includes a cemented lens component that includes a lens element having negative refractive power and a biconvex lens element that is on the object side of a meniscus lens element having negative refractive power with its concave surface on the object side. The second lens group may include a meniscus lens component having positive refractive power on the object side of the biconvex lens element and a meniscus lens component having positive refractive power on the image side of the meniscus lens element having negative refractive power.
Owner:FUJI PHOTO OPTICAL CO LTD
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