Disclosed herein are an anisotropically conductive connector, by which positioning, and holding and fixing to a
wafer can be conducted with ease even when the
wafer has a large area of 8 inches or greater in
diameter, and the
pitch of electrodes to be inspected is small, and good
conductivity is retained even upon repeated use, and applications thereof. The anisotropically conductive connector has a frame plate, in which a plurality of anisotropically conductive film-arranging holes have been formed correspondingly to
electrode regions in all or part of integrated circuits on a
wafer, and a plurality of elastic anisotropically conductive films arranged in the respective anisotropically conductive film-arranging holes. The elastic anisotropically conductive films each have a plurality of conductive parts for connection extending in a thickness-wise direction thereof and containing conductive particles, and an insulating part mutually insulating them. The conductive particles are obtained by
coating core particles exhibiting
magnetism with a high-conductive
metal, a proportion of the high-conductive
metal to the core particles is at least 15% by
mass, and the following t is at least 50 nm: t=[1 / (Sw·ρ)]×[N / (1−N)], wherein Sw is a BET specific surface area (m2 / kg) of the core particles, ρ is a
specific gravity (kg / m3) of the high-conductive
metal, and N is (
mass of the high-conductive metal / total
mass of the conductive particles).