78results about How to "Reduce redeposition" patented technology

Novel methods for reliably and reproducibly forming magnetic tunnel junctions in integrated circuits are described. In accordance with aspects of the invention, sidewall spacer features are utilized during the processing of the film stack. Advantageously, these sidewall spacer features create a tapered masking feature which helps to avoid byproduct redeposition during the etching of the MTJ film stack, thereby improving process yield. Moreover, the sidewall spacer features may be used as encapsulating layers during subsequent processing steps and as vertical contacts to higher levels of metallization.

A detergent composition comprising:from 0.01% to 90% by weight of a surfactant system,one or more detergency builder(s), comprising a phosphate builder, and the phosphate builder containing pyrophosphate,wherein the composition comprises at most 12% by weight of phosphate builder(s) and the phosphate builder(s) comprise(s) at least 40% by weight of pyrophosphate(s).

The present invention relates to polypeptides, nucleotides encoding the polypeptide, as well as methods of producing the polypeptides. The present invention also relates to detergent composition comprising polypeptides, a laundering method and the use of polypeptides.

The present invention concerns a detergent comprising a polypeptide having galactanase activity. It further concerns a laundering method and the use of galactanases. The present invention further relates to polypeptides having galactanase activity, nucleotides encoding the polypeptide, as well as methods of producing the polypeptides.

The present invention discloses a magnetic head, including a first and a second magnetic pole, and a write gap layer placed between the two poles. In the first embodiment, the write gap layer includes a non-magnetic, non-conductive first layer, which is preferably composed of Ta or Ti, and deposites on the first pole as the role of a bonding layer. The write gap layer further includes a second layer layer, which is formed by a non-magnetic, non-conductive material, preferably composed of Rh or Ru. The P2 pole sharp is plated on the second layer, in which the conductive second layer is used to conduct the plating current. In another embodiment, the write gap layer includes a third layer, which can be etched in an active ion etching (RIE) process, and is formed between the first layer and the second layer. The third layer is preferably composed of Ta or Ti.

A magnetic head including first and a second magnetic poles with a write gap layer disposed therebetween. In a first embodiment the write gap layer includes a non-magnetic, non-conductive first sublayer which is preferably comprised of Ta or Ti which is deposited upon the first magnetic pole to act as an adhesion layer. The write gap layer then includes a second sublayer which is formed of a non-magnetic, electrically conductive material which is preferably comprised of Rh or Ru. A P2 pole tip is electroplated upon the second sublayer, where the electrically conductive second sublayer is utilized to conduct electroplating current. In an alternative embodiment the write gap layer includes a third sublayer that is etchable in a reactive ion etch (RIE) process, and formed between the first and second sublayers. The third sublayer is preferably comprised of Ta or Ti.

Washing is carried out using a detergent composition having main detergency obtained through an alkaline inorganic salt and further including at least an anti-soil redeposition agent. There is provided a clothes washing method, and a detergent composition for the same, that uses a detergent having detergency equivalent to or greater than that of synthetic detergents containing a surface active agent as the main detergency ingredient and also has excellent anti-soil redeposition efficiency wherein main detergency is obtained by an alkaline inorganic salt.

The present invention relates to compositions, methods and use of a mixture of enzymes having DNase activity and an enzyme having hexosaminidase activity.

The invention discloses a spraying liquid beam electrolytic-laser compound manufacturing method and device, which comprises the following steps: utilizing layer generating device to produce laser beam on the working piece, manufacturing hole, seam and groove, generating high-speed spraying liquid removing material with the same shaft of laser beam through spraying liquid beam device. The device contains layer, working piece assembling chuck, power and spraying liquid beam device, wherein the spraying liquid beam device concludes assembling seat of spraying device, insulating switching seat, cathode, focal lens, protective lens, insulating sleeve and sprayer.

The present invention relates to the cloning and high level expression of novel cellulase proteins or derivatives thereof in the in a host cell. Further aspects of the present invention relate to transformants that express the novel cellulases, and expression vectors comprising the DNA gene fragments or variants thereof that code for the novel cellulases derived from Actinomycete using genetic engineering techniques. The present invention is also directed to novel cellulase compositions and methods of use therefore in industrial processes. In particular, the present invention is related to treating textiles with a novel cellulase derived from Actinomycete spp. The present invention also relates to the use of cellulase derived from Actinomycete spp. to enhance the digestibility of animal feed, in detergents, in the treatment of pulp and paper and in the production of starch and treatment of by-products thereof.