Apparatuses and processes for maskless deposition of electronic and
biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a
millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent
processing may be carried out under ambient conditions, eliminating the need for a vacuum
atmosphere. The process may also be performed in an
inert gas environment. Deposition of and subsequent
laser post
processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus
nozzle has a large working distance-the orifice to substrate distance may be several millimeters-and direct write onto non-planar surfaces is possible. This invention is also of combinations of precision spray processes with in-flight
laser treatment in order to produce direct write electronic components, and additionally lines of conductive, inductive, and resistive materials. This development has the potential to change the approach to
electronics packaging in that components can be directly produced on small structures, thus removing the need for printed circuit boards.