The invention relates to the technical field of
semiconductor manufacturing accessories, and especially relates to a uniformity control device for
wafer production
etching, wherein the device achievesthe convenient clamping, and is easy for the control of the speed and quantity of solution. The device includes a
workbench and a plastic dropper, and also comprises a first support bar, a second support bar, a front limiting plate, a rear limiting plate, a left baffle plate, a right baffle plate, a push rod, a rack, a rear incomplete gear, a front incomplete gear, a rear connecting rod, a frontconnecting rod, a front fixed rod and a rear fixed rod. The device further comprises a third supporting rod, a fourth supporting rod, a first rotating rod, a second rotating rod, a first
threaded rod,an upper gear , a lower gear, a first connecting rod, a second connecting rod, a third connecting rod, a fourth connecting rod, a
lantern ring, a left clamping plate and a right clamping plate, wherein the right side wall of the first supporting rod is provided with a first placement groove and a second placement groove, and the first placement groove and the second placement groove are respectively provided with a first
ball bearing and a second
ball bearing.