The invention discloses a magnetron
sputtering preparation process of folding-resistant high-barrier composite packaging films. The magnetron
sputtering preparation process is characterized by comprising the following steps that (1) a base material is prepared; (2) the base material is conveyed into a pre-
sputtering vacuum tank for pre-sputtering cleaning, specifically, pre-sputtering gas is argonwith the purity being 99.95%-99.99%, the pre-sputtering power increase rate is 0.1-6 W per hour per
square centimeter, and the sputtering time is 30-500 seconds; and (3) a
radio frequency power supply is started, multiple targets are deposited on a pre-sputtering matrix at the same time, and accordingly the high-barrier
composite film is obtained, specifically, the pre-sputtered base material iswound on the surface of a roller to be fixed, the vacuum degree of a
vacuum chamber is controlled to be 0.1-10*10<-5> Pa,
argon or
argon-
oxygen mixed gas serves as working gas, the purity of the argonis 99.95%-99.99%, the
airflow volume is 10-450 sccm, the
oxygen purity is 99.95%-99.999%, the
airflow volume is 0.5-100 sccm, the working air pressure is controlled to be 0.2-2 Pa, the target-substrate distance is 4-16 cm, the rotating speed of the roller is controlled to be 0.5-10 m / min, and the sputtering time is 5-300 minutes.