4305results about "Induction heating apparatus" patented technology

A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.

Certain embodiments provide a heating system configurable to heat a subsurface formation. The system includes an electrical conductor configured to generate an electrically resistive heat output during application of electrical current to the electrical conductor. An electrical insulator at least partially surrounds the electrical conductor. The electrical insulator includes a nitride. A sheath at least partially surrounds the electrical insulator.

In a fixing device, a pressing member rotates in a predetermined direction of rotation. A flexible fixing member is disposed opposite the pressing member to rotate in accordance with rotation of the pressing member. A nip formation member is provided inside a loop formed by the fixing member and pressed against the pressing member via the fixing member to form a nip between the fixing member and the pressing member through which a recording medium bearing a toner image passes. A contact member pressingly contacts an outer circumferential surface of the rotating fixing member at both ends of the fixing member in an axial direction thereof.

Certain embodiments provide a system configured to heat a subsurface formation. The system includes an electrical power supply. A heater section includes one or more electrical conductors electrically coupled to the electrical power supply. At least one of the electrical conductors includes ferromagnetic material. The heater section provides a first heat output when time-varying electrical current is applied to the heater section below a selected temperature, and a second heat output approximately at and above the selected temperature during use. The second heat output is reduced compared to the first heat output. The system is configured to allow heat to transfer from the heater section to a part of the formation. The electrical power supply is configured to provide a relatively constant amount of time-varying electrical current that remains within about 15% of a selected constant current value when a load of the electrical conductors changes.

Certain embodiments provide a method for treating a subsurface formation. The method includes providing one or more explosives into portions of one or more wellbores selected for the explosion in the formation. The wellbores are formed in one or more zones in the formation. The explosives are controllably exploded in one or more of the wellbores such that at least some of the formation surrounding the selected wellbores has an increased permeability. One or more heaters are provided in the one or more wellbores.