The invention discloses a batching system for gas state materials. The batching system comprises a WF6 material feeding device, an HF material feeding device and an N2 material feeding device, which are communicated with a batching tank, wherein the WF6 material feeding device comprises a WF6 material feeding container, a WF6 surge tank, a WF6 mass flowmeter, and the batching tank, which are sequentially communicated through a pipeline and valves; the HF material feeding device comprises an HF material feeding container, an HF surge tank, an HF mass flowmeter, a standard volume tank and the batching tank, which are sequentially communicated through the pipeline and the valves; the N2 material feeding device comprises an N2 material feeding container, an N2 surge tank, an N2 mass flowmeter, a standard volume tank and the batching tank, which are sequentially communicated through the pipeline and the valves. According to the batching system disclosed by the invention, the materials can be quantitatively adjusted and supplied; the material flows fed to the separation unit and the content of the materials can be ensured to be invariable; the flow of the WF6 can be controlled by a mass method, and the flows of the HF and the N2 are controlled by a volumetric method, so that the flow control precision can be improved, and the control difficulty can be reduced; as a valve W7 and a valve N4 are utilized, the batching system can meet the requirement on high leak rate of the material.