2322 results about "Pulsed power" patented technology

A data-modulated ultra wideband transmitter that modulates the phase, frequency, bandwidth, amplitude and / or attenuation of ultra-wideband (UWB) pulses. The transmitter confines or band-limits UWB signals within spectral limits for use in communication, positioning, and / or radar applications. One embodiment comprises a low-level UWB source (e.g., an impulse generator or time-gated oscillator (fixed or voltage-controlled)), a waveform adapter (e.g., digital or analog filter, pulse shaper, and / or voltage variable attenuator), a power amplifier, and an antenna to radiate a band-limited and / or modulated UWB or wideband signals. In a special case where the oscillator has zero frequency and outputs a DC bias, a low-level impulse generator impulse-excites a bandpass filter to produce an UWB signal having an adjustable center frequency and desired bandwidth based on a characteristic of the filter. In another embodiment, a low-level impulse signal is approximated by a time-gated continuous-wave oscillator to produce an extremely wide bandwidth pulse with deterministic center frequency and bandwidth characteristics. The UWB signal may be modulated to carry multi-megabit per second digital data, or may be used in object detection or for ranging applications. Activation of the power amplifier may be time-gated in cadence with the UWB source thereby to reduce inter-pulse power consumption. The UWB transmitter is capable of extremely high pulse repetition frequencies (PRFs) and data rates in the hundreds of megabits per second or more, frequency agility on a pulse-to-pulse basis allowing frequency hopping if desired, and extensibility from below HF to millimeter wave frequencies.

The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

Systems and methods for generating a high voltage pulse. A series of voltage cells are connected such that charging capacitors can be charged in parallel and discharged in series. Each cell includes a main switch and a return switch. When the main switches are turned on, the capacitors in the cells are in series and discharge. When the main switches are turned off and the return switches are turned on, the capacitors charge in parallel. One or more of the cells can be inactive without preventing a pulse from being generated. The amplitude, duration, rise time, and fall time can be controlled with the voltage cells. Each voltage cell also includes a balance network to match the stray capacitance seen by each voltage cell.

The invention relates to pulse oximeters used to measure blood oxygenation. The current trend towards lower power consumption has brought a problem of erroneous readings caused by intrachannel crosstalk, i.e. errors due to the coupling of undesired capacitive, inductive, or conductive (resistive) pulse power from the emitting side of the pulse oximeter directly to the detecting side of the oximeter. The pulse oximeter of the invention is therefore provided with means for detecting whether intrachannel crosstalk is present and whether it will cause erroneous results in the oxygenation measurements. The pulse oximeter is preferably further provided with means for eliminating intrachannel crosstalk which are adapted to control the measurement so that measurement signals can be obtained which are substantially void of crosstalk components.

Apparatus and method for driving laser diodes with electrical power in pulsed operation. Pulsed power, for example using pulse-width modulation, is applied through an inductor in one or more parallel regulator circuits having little or no output capacitance to provide a high-efficiency laser-diode-driver power supply. Some embodiments that use two or more parallel regulator circuits in the laser-diode driver, drive each from a different phase of a clock signal. Some embodiments provide a first DC-to-DC converter has a relatively high-voltage input (e.g., about 275 volts, 0.75 amps) and an intermediate output of e.g., 11 to 15 volts, 15 to 11 amps used to charge a storage capacitor, and a second DC-to-DC converter diode driver having one or more parallel circuits (each having, e.g., a PWM switching-mode controller and its respective switch, inductor, and diode) to turn on, regulate, and turn off a constant laser-diode current through one or more laser diodes.

A method and apparatus for operating a matching network within a plasma enhanced semiconductor wafer processing system that uses pulsed power to facilitate plasma processing.

A laser pulse with a specially tailored temporal power profile, instead of a conventional temporal shape or substantially square shape, severs an IC link. The specially tailored laser pulse preferably has either an overshoot at the beginning of the laser pulse or a spike peak within the duration of the laser pulse. The timing of the spike peak is preferably set ahead of the time when the link is mostly removed. A specially tailored laser pulse power profile allows the use of a wider laser pulse energy range and shorter laser wavelengths, such as the green and UV, to sever the links without appreciable damage to the substrate and passivation structure material located on either side of and underlying the links.

A series of radio frequency identification (RFID) systems are delineated. One such RFID system comprises an RFID signpost, and a plurality of infrared transmitters, wherein each infrared transmitter of the plurality of infrared transmitters is arranged to cover, when transmitting, a distinct sector relative to the RFID signpost. Another RFID system comprises an RFID signpost having a transmitter for transmitting signals of a predefined type, and a receiver for receiving signals of the predefined type, wherein the transmitter for transmitting signals of the predefined type cannot transmit until a determination is made that the predefined type of signal is not present at the receiver. Still another RFID system comprises an RFID signpost including a transmitter having a continuous power dissipation rating, and a processor for controlling the transmitter such that peak pulse power of a transmission from the transmitter multiplied by its duty cycle does not exceed the continuous power dissipation rating for the transmitter.

The invention discloses a high-power seeker tile type active phased array antenna, and aims at providing an active phased array antenna which is small in size and low in weight and can reliably work with no requirement for temperature compensation. The high-power seeker tile type active phased array antenna is realized by the following scheme that E-type patches act as radiation array elements of a microstrip antenna array which can be extended according to integral multiples of 4x4 array scale, rectangular grid arrays are distributed on an antenna dielectric substrate, and a tile type TR component is closely connected with a heat exchanger integrally; and the microstrip antenna array is connected with the high-power transmit-receive chips of the tile type TR component to form transmit-receive channels through integration, every four high-power transmit-receive chips are connected with one TR multifunctional chip simultaneously, four TR multifunctional chips form one 4x4 subarray circuit module together, and then subsequent connection with a power distribution synthesis network is performed. Power supply, high-power pulse power modulation and amplitude-phase code control of a DC power supply and wave beam control signals are realized via a power supply modulation distributor so that directional diagram scanning of the high-power tile type active phased array antenna can be realized.

A high performance field reversed configuration (FRC) system includes a central confinement vessel, two diametrically opposed reversed-field-theta-pinch formation sections coupled to the vessel, and two divertor chambers coupled to the formation sections. A magnetic system includes quasi-dc coils axially positioned along the FRC system components, quasi-dc mirror coils between the confinement chamber and the formation sections, and mirror plugs between the formation sections and the divertors. The formation sections include modular pulsed power formation systems enabling static and dynamic formation and acceleration of the FRCs. The FRC system further includes neutral atom beam injectors, pellet or CT injectors, gettering systems, axial plasma guns and flux surface biasing electrodes. The beam injectors are preferably angled toward the midplane of the chamber. In operation, FRC plasma parameters including plasma thermal energy, total particle numbers, radius and trapped magnetic flux, are sustainable at or about a constant value without decay during neutral beam injection.

Disclosed is a Co-base magnetic alloy excellent in high-frequency magnetic properties, of which chemical composition is represented by the following general formula, by atomic %, (Co1-aFea)100-y-cM'yX'c, where M' is at least one element selected from the group consisting of V, Ti, Zr, Nb, Mo, Hf, Sc, Ta and W; X' is at least one element selected from the group consisting of Si and B; and a, y and c are defined by the formulas of a<0.35, 1.5<=y<=15, and 4<=c<=30, respectively. At least a part of the alloy structure of the alloy consists of crystal grains having an average grain size of not more than 50 nm. The alloy has a relative initial permeability of not more than 2000. It is suitably used for members of countermeasure against noise such as zero phase reactors for large current and electromagnetic shielding materials, inverter transformers, choke coils for active filters, antennas, smoothing choke coils, power supplies for lasers, pulse power magnetic members for accelerators.

A plasma doping apparatus includes a pulsed power supply that generates a pulsed waveform having a first period with a first power level and a second period with a second power level. A plasma source generates a pulsed plasma with the first power level during the first period and with the second power level during the second period. A bias voltage power supply generates a bias voltage waveform at an output that is electrically connected to a platen which supports a substrate. The bias voltage waveform having a first voltage during a first period and second voltage with a negative potential that attract ions in the plasma to the substrate for plasma doping during a second period. At least one of the first and second power levels of the RF waveform is chosen to at least partially neutralize charge accumulating on the substrate.

The present invention provides a pulse power generator using a semiconductor switch, which enables its lifespan to be significantly improved, allows for its miniaturization, and makes it possible to diversely control a high-voltage pulse output finally. According to the pulse power generator, it is possible to address and solve a difficulty in driving the semiconductor switch in series, i.e., the problems related to synchronization and insulation of a driving power supply, and to include a circuit which can cope with the generation of arc and short circuit to thereby significantly improve device protecting performance and stability of the pulse power generator.