106 results about "Merit function" patented technology

Optical properties with high non-linearity such as a modulation transfer function (MTF) are efficiently optimized at high speed compared to conventional methods. An optimal solution of an optical system is obtained in a first optimization unit using a merit function on aberration. Weights or target values of the merit function on aberration is automatically adjusted in a second optimization unit in a manner that an evaluated value of the MTF or the like approaches a desired value. The first optimization unit re-optimizes the optical system using the weights or target values which have been automatically adjusted. Thus, automated is a function equivalent to the operation which has been conducted by a designer such as adjustment to weights or target values.

An optical proximity correction method is provided using a modified merit function based upon yield. Known failure mechanisms related to layout geometries are used to derive yield functions based upon distance values between layout features, such as, edge features. In comparing the edge points on the predicted layout pattern with the corresponding point on the design layout pattern, a yield test is first undertaken before movement of the points on the predicted layout pattern to a position of higher yield. Where yield is acceptable, no further movement is made. Where incremental movement of points results in coming within acceptable proximity before acceptable yield is reached, the point is flagged for further consideration.

Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

A method of designing an aspheric ophthalmic lens with both refractive and diffractive powers that is capable of reducing chromatic aberration and at least one monochromatic aberration of an eye comprises combining aspherical refractive and diffractive surfaces, selecting an appropriate eye model, establishing a design lens having at least one aspheric surface with a capacity to reduce monochromatic aberration in said eye model, establishing a diffractive lens element that corrects for chromatic aberration of the model eye; and adjusting the lens surface design in order to obtain a suitably high polychromatic image quality in a form that is weighted to comply with a spectral merit function.

A method of designing an aspheric ophthalmic lens with both refractive and diffractive powers that is capable of reducing chromatic aberration and at least one monochromatic aberration of an eye comprises combining aspherical refractive and diffractive surfaces, selecting an appropriate eye model, establishing a design lens having at least one aspheric surface with a capacity to reduce monochromatic aberration in said eye model, establishing a diffractive lens element that corrects for chromatic aberration of the model eye; and adjusting the lens surface design in order to obtain a suitably high polychromatic image quality in a form that is weighted to comply with a spectral merit function.

Photomask patterns are represented using contours defined by mask functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks. An accurate, slower merit function may be used to determine adjustment parameters for a faster, approximate merit function. The faster merit function may be used for iteration and adjusted based on the adjustment parameters.

A family of ophthalmic lenses for correcting presbyopia meets constraints for distance vision, near vision, and disparity and may be designed according to a process that incorporates a merit function accounting for binocular visual performance.

A symmetric multiprocessing system includes multiple processing units and corresponding instances of an adaptive partition processing scheduler. Each instance of the adaptive partition processing scheduler selectively allocates the respective processing unit to run process threads of one or more adaptive partitions based on a comparison between merit function values of the one or more adaptive partitions. The merit function for a particular partition of the one or more adaptive partitions may be based on whether the adaptive partition has available budget on the respective processing unit. The merit function for a particular partition associated with an instance of the adaptive partition scheduler also, or in the alternative, may be based on whether the adaptive partition has available global budget on the symmetric multiprocessing system.

The present invention is directed to a system, method and software program product for calculating metrological data (e.g. layer thicknesses and depths of recesses and trenches) on a surface or structure, such as a semiconductor wafer. The present method does not require knowledge of the reflectivity or transmissivity of the surface or structure, but only a quantity related to the reflectivity or transmissivity linear transformation needs to be known. Initially, a simplified optical model for the process is constructed using as many parameters as necessary for calculating the surface reflectivity of the discrete regions on the wafer. Reflectivity data are collected from the surface of a wafer using, for instance, in-situ monitoring, and nominal reflectivity is determined from the ratio of the current spectrum to a reference spectrum. The reference spectrum is taken from a reference wafer consisting entirely of a material in which the reflection properties are well characterized. Both the observed and calculated data are transformed such that their vertical extents and spectrally averaged values coincide. By transforming both the observed data and calculated model such that their vertical extents and spectrally averaged values coincide, large errors in both the data and the model can be tolerated. A merit function is employed which measures the agreement between observed data and the model with a particular choice of parameters. The merit function may be minimized using a standard numerical technique for finding a deep minimum in the merit function at the correct values of the parameters.

A receiver that receives a long pseudonoise (PN) code signal composed of two shorter codes interleaved with one another, includes a correlator unit that correlates the received signal with one or more reference codes corresponding to the two interleaved codes, respectively, and generates correlation signals. The receiver also includes an even code detector coupled to the correlator unit, for detecting from the correlation signals one of the two shorter codes, and an odd code detector coupled to the correlator unit, for detecting from the correlation signals the short code that is not detected by the even detector. A delay unit is coupled to the even and odd code detectors, and delays the even or the odd correlation signals so as to align the correlation signals. The aligned signals are combined and evaluated by a merit function. If the combined signals exceed a threshold value the short codes are determined to be aligned, the phase of each code can be determined, and the phase of the longer code can be determined from the determined phases of the shorter codes. The receiver can detect two short PN codes that have been combined, such as by interleaving the short codes, to create a long PN code. Hence, the receiver can inexpensively detect the two short codes which allows the receiver to detect the long code with high gain.