The invention discloses a
processing method for an array substrate and a display panel. The method comprises a step of forming a gate
metal layer and a gate insulating layer on a glass substrate, a step of forming a
semiconductor layer on the gate insulating layer and forming an
etching stop layer at a trench position of a
thin film transistor, a step of forming a
metal layer on the
etching stop layer, depositing a
photoresist on the
metal layer, performing a light
mask process on a light
mask and exposing and developing to form a
photoresist layer with a predetermined shape, a step of etchingto obtain a source
electrode and a drain
electrode, a step of performing post-baking on a
photoresist layer remaining on the source
electrode and the drain electrode such that the photoresist layer flows to the trench position, a step of
etching a
semiconductor layer and obtaining a predetermined pattern, a step of stripping the photoresist layer on the source electrode, the drain electrode and the trench position, and a step of forming a
passivation layer and a conductive thin film layer on the source electrode, the drain electrode, and the channel locations. According to the invention, themask process can be reduced, and the production cost is effectively reduced.