An
exposure apparatus of the present invention contains: a moving stage that includes a
laser length measuring device, the
laser length measuring device is configured to emit and receive a
laser light; an XY[theta] direction moving mechanism configured to move the moving stage within a plane; a Z direction moving mechanism configured to move the moving stage and the XY[theta] direction moving mechanism in a direction perpendicular to the plane; a reflective mirror that is configured to reflect the
laser light, the laser length measuring device is configured to measure a distance between the laser length measuring device and the reflection mirror; and a
control unit configured to control the XY[theta] direction moving mechanism to move the moving stage based on the distance. Since the mirror, which reflects laser from the laser length measuring device provided on the moving stage of the work stage, is integrally fixed to the structural body, which supports the
mask stage for holding a
mask, when the work stage is moved in the Z direction (a direction perpendicular to the workpiece face), even if the moving stage is moved in the XY direction (direction parallel to the workpiece face), and in the [theta] direction (a rotation direction with respect to an axis perpendicular to the workpiece face), the reflective mirror does not shift. Therefore, when the work stage is moved in the Z direction, even if a slider is moved in the XY direction or the e direction, it is possible to detect the amount of movement thereof by the laser length measuring device. For this reason, the moving stage is moved so that the detected amount of movement may be canceled, whereby the workpiece can be returned to the original position (a position where the position of the
mask and that of the workpiece are aligned).