50results about How to "Quick and effective cleaning" patented technology

The invention discloses a hand-washing device used in an operating room. The device comprises a container containing cleaner fluid, a cleaning component arranged in the container and an accommodating cavity arranged in the container for accommodating hands, wherein the cleaning component is composed of a lower cleaning part fixed in the container and used for cleaning one sides of hands, an upper cleaning part connected to the lateral wall of the container in a rotary mode and used for cleaning the other sides of hands, and a middle cleaning part arranged between the upper cleaning part and the lower cleaning part and used for cleaning fingertips. The hand-washing device is specially used in the operating room and can clean hands quickly, effectively and completely.

The invention discloses a cleaning roll for a robot cleaning arm. The problems that the cleaning efficiency is low and the operation is not convenient are solved effectively. The cleaning roll comprises an upper end cover and a lower end cover; the lower end cover is rotatably connected with a transmission shaft; a sun wheel is coaxially fixed to the transmission shaft; a plurality of planet wheels are engaged with the exterior of the sun wheel and are simultaneously engaged with a gear ring fixedly connected with the lower end cover; the planet wheels are coaxially and fixedly connected withrotating shafts; the lower ends of the rotating shafts are rotatably connected with a first planet carrier; the upper ends of the rotating shafts are rotatably connected with a second planet carrier;the upper end cover is rotatably connected with the transmission shaft; a plurality of hair brushes are fixed to each rotating shaft; a hollow pipe is arranged in the transmission shaft; a plurality of water outlet holes connected with the hollow pipe are formed in the outer wall of the transmission shaft; a water tank is fixed to the upper end of the upper end cover; and the lower end of the water tank is rotatably connected with the hollow pipe.

The invention discloses a pot bottom face cleaning device with an efficient cleaning function. The pot bottom face cleaning device comprises an equipment cabinet, a cleaning tank is installed at an opening above the equipment cabinet, the upper-end opening of the cleaning tank is provided with a lap joint slot, and a pot can be placed in the cleaning tank through the lap joint slot; the cleaning tank is internally provided with a divergent steel hair brush, the bottom of the steel hair brush is fixed to a rotating shaft, the bottom end of the rotating shaft penetrates through a sealing bearing on the bottom face of the cleaning tank and is fixedly connected with a motor shaft through a coupler, and the motor shaft is in transmission connection with the output end of a motor. The pot bottom face cleaning device is simple and reasonable in structure and convenient to use and operate, pot bottom ash can be cleaned effectively and rapidly as a whole, therefore efficiency is improved, and the work amount of personnel is lowered.

The invention relates to a cleaning brush, in particular to a cleaning brush for pediatrics. The technical problem is to provide a pediatric cleaning brush which has no need of repeatedly touching water and can replace cleaning tools at any time. The technical scheme of the invention is as follows: the cleaning brush for pediatrics includes a holding rod, a slide rod, a slide sleeve, insertion rods, a clamping block, an elastic frame, cleaning cotton, etc., wherein the right end of the holding rod is connected with the slide rod, the slide sleeve sleeves the slide rod, the insertion rods are connected at the upper and lower sides of the slide rod, the right end of the slide rod is connected with the clamping block, the left side of the top of the clamping block and the right side of the bottom of the clamping block are provided with clamping holes, the elastic frame is placed outside the clamping block, the outer side of the elastic frame is connected with the cleaning cotton, the topleft side and the bottom right side in the elastic frame are connected with press rods, the press rods are matched with the clamping holes, and each press rod is provided with a through hole. The cleaning cotton is in contact with the parts, needing to be cleaned, of the children's buttocks by the nursing staff, the holding rod is moved and rotated to clean the children's buttocks, and the residual stool of the children's buttocks can be removed in time.

The invention discloses a dressing changing assisting device. The device comprises a device body, the bottom of the device body is provided with a collecting bucket, clamping slots are formed in bothsides of the collecting bucket, both sides of the inside are provided with telescopic assemblies, limb fixing grooves are formed in one side of the telescopic assemblies, the other sides are providedwith hydraulic cylinders, the inner wall of the device body is welded with a cleaning liquid tank, and one side of the cleaning liquid tank is provided with a drainage tube. The device fixes limbs ofa patient through the setting of the limb fixing grooves, soft cushions in the grooves bring comfort to the patient, through the arrangement of a rubber head, a drip tube and the cleaning liquid tank,the rubber head can suck cleaning liquid,so that the inside of the rubber head is filled with liquid, the rubber head is squeezed to clean wounds, and the cleaning is quicker and more efficient, anddoes not cause unnecessary waste.

The invention relates to a cleaning process after silicon wafer CMP, comprising the following steps: step (1), cleaning: removing the polishing slurry on a silicon wafer; step (2), detection: detecting the pre-cleaned silicon wafer by using a detecting machine, proceeding the step (3) if the pre-cleaned silicon wafer meets the requirements, and otherwise, returning to the step (1) to continue thepre-cleaning; and step (3), final cleaning: removing the particles generated by the silicon wafer in the step (2), and further removing SiO2 contained in the polishing slurry on the silicon wafer. Thecleaning process after silicon wafer CMP provided by the invention adds vibration equipment in the pre-cleaning process for cooperation with ozone water to quickly and effectively remove organic matters, SiO2, particles and the protective layer on the surface of the acidified film and facilitate the subsequent removal of the acidified film by hydrofluoric acid, so as to effectively remove organicmatters, SiO2 and particles, and adds alkaline liquid of high temperature state to rinse the silicon wafer in the final cleaning to effectively remove residual SiO2.

The invention provides a fixing device for metal welding, and relates to the technical field of fixing devices for welding. The fixing device for metal welding comprises a workbench, wherein limitinggrooves are formed in the two ends of the top of the workbench; an impurity storage groove is formed in the position, between the two limiting grooves, of the top of the workbench; rust removal assemblies are fixedly installed at the positions, located at one ends of the two limiting grooves, of the top of the workbench; and fastening devices are fixedly installed at the positions, located at theother ends of the two limiting grooves, of the top of the workbench. According to the fixing device for metal welding provided by the invention, through double position adjustment, fixing is more accurate; meanwhile, buffer springs are arranged, so that the resilience force of the buffer springs effectively counteracts vibration generated in the welding process, and the occurrence of the phenomenon that a traditional circular hoop deviates due to long-term extrusion, and consequently the welding quality is affected by pipe deviation is avoided; and meanwhile, anti-skid strips are arranged on the inner walls of clamping hoops, so that the situation that the pipeline slips during welding can be further prevented, and the welding precision is improved.

The invention discloses a cleaning disk brush comprising a cylindrical part, disk-shaped sponge, cleaning cloth, an outer barrel part, a cover plate and a shaft, wherein the disk-shaped sponge clings to the bottom end surface of the cylindrical part; the cleaning cloth is used for wrapping the disk-shaped sponge and the bottom of the cylindrical part; the outer barrel part is used for sleeving the cylindrical part; the cover plate is fixedly connected with the outer barrel part; and the shaft is fixedly arranged on the cover plate. The cylindrical part comprises a large-diameter section and a small-diameter section of which the external diameter is larger than that of the large-diameter section, the disk-shaped sponge clings to the bottom end surface of the small-diameter section, the disk-shaped sponge and the bottom of the small-diameter section are wrapped by the cleaning cloth, an inwards-protruded annular ring is arranged inside the outer barrel part, and the small-diameter section is inserted into the annular ring. According to the technical scheme, the shaft of the cleaning disk brush is fixedly connected with a rotating device, so that the cleaning cloth for wrapping the disk-shaped sponge in the cleaning disk brush can move on the surface of a tablet personal computer to clean the tablet personal computer through the rotation as well as longitudinal and horizontal movements of the rotating device.

The invention discloses an environment-friendly and energy-saving steam cleaning machine, which relates to the technical field of steam cleaning, and comprises a main machine and a storage device, a water tank is arranged in the main machine, a water pump is arranged at one end in the water tank, an electromagnetic water inlet valve is arranged at the right end outside the water tank, and a metalcasting is arranged at one end outside the electromagnetic water inlet valve; a metal pipe is arranged in the metal casting, an electric heating pipe is installed outside the metal pipe, a pressure sensor is arranged at the end, close to the water tank, of the metal pipe, and a safety pressure valve is installed at the end, away from the water tank, of the metal pipe. During work, the water pump conveys high-pressure water flow to the metal pipe, the electric heating pipe rapidly heats the metal pipe, the water flow is rapidly converted into high-pressure steam in the metal pipe, the high-pressure steam flows to the steam spray gun through the high-pressure steam conveying pipe, and the high-pressure steam can be sprayed out towards a muzzle as long as a worker opens a trigger switch of asteam spray gun, and high-pressure steam flow or high-pressure steam-water mixed jet flow capable of cleaning a vehicle body is generated.

The invention discloses mouth wash. The mouth wash comprises the mixtures composed of the following components in percentage by weight: 2.5% of tea extract, 2% of sorbitol, 2% of xylitol, 0.2% of orange peel powder, 0.15% of ginseng extract, 0.1% of proplis extract, and the balance water. The mouth wash is capable of quickly and effectively cleaning the mouth, enabling fresh breath, effectively inhibiting and removing oral bacteria, and reducing oral diseases.

The invention discloses a five finger type hand washer for an operating room. The five finger type hand washer comprises a container, a cleaning device, a containing cavity and a vibrating part, wherein the container is used for containing a detergent solution; the cleaning device is arranged in the container; the containing cavity is arranged in the container and used for containing the hands; the vibrating part is fixed to the interior of the cleaning device. The cleaning device is composed of a lower cleaning part, an upper cleaning part and five middle cleaning assemblies, wherein the lower cleaning part is fixed to the interior of the container and used for cleaning one surface of each hand; the upper cleaning part is fixed to the side wall of the container and used for cleaning the other surface of each hand; the five middle cleaning assemblies are arranged between the upper cleaning part and the lower cleaning part and correspond to five finger tips. The five finger type hand washer is specially used for the operating room and can automatically vibrate to move the cleaning assemblies and adapt to fingers of different lengths; besides, the fingernail seams of all the fingers can be cleaned by the hand washer; accordingly, the hand washer can quickly and effectively clean the hands thoroughly.

The invention discloses a hand washing device used in an operating room. The hand washing device comprises a container, a cleaning assembly, a storage cavity and a vibrator, wherein the container is used for containing cleaning agent solutions, the cleaning assembly is disposed in the container, the storage cavity is formed in the container and is used for containing hands, and the vibrator is fixed to the inside of the cleaning assembly. The cleaning assembly comprises a lower cleaning element, an upper cleaning element and a middle cleaning element, wherein the lower cleaning element is fixed into the container and is used for cleaning one side of each hand, the upper cleaning element is fixed to the side wall of the container and is used for cleaning the other side of each hand, and the middle cleaning element is arranged between the upper cleaning element and the lower cleaning element and is used for cleaning fingertips. According to the hand washing device used in the operating room, the cleaning assembly can vibrate and move automatically, and accordingly the hands are quickly, effectively and completely cleaned.

The embodiment of the invention provides a mask and a fabrication method thereof, and relates to the field of an electronic component. By the mask and the fabrication method thereof, the problem thata traditional mask is relatively difficult to clean can be solved. The mask comprises a mask substrate, losable gluing layer and a protection layer, wherein the mask substrate comprises an opening region and a shielding region, the losable gluing layer is arranged on the first surface of the mask substrate and covers the shielding region, and the protection layer is arranged on a surface, far awayfrom the mask substrate, of the losable gluing layer and covers the losable gluing layer. The mask is used for fabricating a film layer.

The invention relates to a method for manufacturing GaN base photoelectric device, provides a low damage ICP etching method for manufacturing GaN base photoelectric device, which etches the p type GaN layer to n type GaN layer by ICP etching technology. The method comprises: first step - main etching: etching from the p type GaN layer to the upper surface of the n type GaN layer by using the mixture of Cl2 and Ar as etching gas; second step - auxiliary etching: etching off a part of n type GaN from the upper surface of the n type GaN layer by using the BCl3 gas as etching gas. The invention can reduce the defect damage or thermal damage on the p type GaN surface and n type GaN surface caused by the ICP etching, simplifies the subsequent process of cleaning surface photoresist, and improves production efficiency and product quality.

The invention discloses an extension cleaning ball valve, and belongs to the field of ball valves. According to the extension cleaning ball valve, by arranging a telescopic expansion rod capable of freely deforming in a valve body, when the inner wall of the extension cleaning ball valve needs to be cleaned, inflation operation can be conducted on the telescopic expansion rod outside under the condition that the extension cleaning ball valve is not disassembled, so that the telescopic expansion rod extends and expands to be in a linear state and penetrate through the two sides of a valve element, and the telescopic expansion rod is pulled by a pull rope to rotate in a single circle along the valve body and the valve element to clean the inner wall of the extension cleaning ball valve; and after cleaning is completed, the telescopic expansion rod is away from the valve element through contraction of the telescopic expansion rod, the rotary flow control process of the valve element is not prone to being hindered, and normal use of the extension cleaning ball valve is realized. Compared with the prior art, unnecessary mounting and dismounting procedures are avoided, and the rapid and effective inner wall cleaning process is achieved.

The invention discloses a multi-brush-head cleaning brush with a composite working mode. The cleaning brush comprises a rotating mechanism, a universal rotating shaft II and a control handle with a power supply; the tail end of the rotating mechanism is connected with the steering end of the universal shaft II; the fixed end of the universal shaft II is connected with the head end of the control handle; the cleaning brush further comprises a plurality of vibration cleaning mechanisms; each vibration cleaning mechanism comprises a vibration brush head, a connecting rod I, a lockable hinge, a connecting rod II, a universal rotating shaft I and a connecting rod III; the vibration brush heads are detachably connected with the head ends of the connecting rods I in a sealing mode; the tail endsof the connecting rods I are fixedly connected with the head ends of the lockable hinges; the tail ends of the lockable hinges are fixedly connected with the head ends of the connecting rods II; the tail ends of the connecting rods II are detachably connected with the steering ends of the universal rotating shafts I; the fixed ends of the universal rotating shafts I are connected with the head ends of the connecting rods III; and the tail ends of the connecting rods III are detachably connected with the head end of the rotating mechanism. The cleaning brush has the advantages of being adjustable in multi-stage angle, high in cleaning force, low in cost and energy consumption and suitable for multiple scenes.

The invention relates to a method for cleaning an electrode (1) used in resistance point welding, particular a cap (2) which can be placed on the electrode. According to the invention, the electrode (1) and / or the cap (2) are impinged upon with a cold medium. The temperature difference between the cold medium and the functional parts to be cleaned is greater than 80 Kelvin and the temperature of the functional parts is above room temperature. The invention also relates to an electrode (1) for resistance point welding, in addition to a cap (2) which can be placed on the electrode (1) . According to the invention, the electrode (1) and / or the cap (2) has a feed direction for supplying the cold medium.

The invention belongs to the technical field of preparation of a cleaning agent for a fine metal mask (FMM), and particularly relates to a cleaning agent for an OLED mask and a cleaning process thereof. The cleaning agent comprises the following components, in percentage by mass, 20%-50% of alcohol ether solvent, 20%-50% of polar non-proton solvent, 1%-10% of a fluorine-containing nonionic surfactant, and 10%-30% deionized water; the fluorine-containing nonionic surfactant has a structural formula seen in the specification, and n is a natural number between 8 and 14; and the cleaning solutionprovided by the invention can quickly and effectively clean and remove RGB photochromic dye attached to the FMM in the vapor deposition process, is easy to clean, does not remain, and effectively improves the cleaning efficiency of the FMM.

The invention provides a green soybean cleaning system. The green soybean cleaning system comprises a rack and a cleaning frame arranged on the rack, wherein the cleaning frame is connected with the rack through an elastic piece; two symmetrically arranged vibration motors are fixed at the bottom of the cleaning frame and drive the cleaning frame to perform linear reciprocating motion in the horizontal direction; a sieve plate is arranged at the lower part in the cleaning frame and is horizontally arranged; a flushing nozzle is arranged at the upper part of the cleaning frame and faces the inside of the cleaning frame; a water inlet is formed in the top of the cleaning frame; and a water outlet is formed in the lower part or the bottom of the cleaning frame. The green soybean cleaning system is unique in structure, high in automation degree, short in green soybean cleaning time, high in cleaning degree, low in damage degree and high in practicability.

The invention discloses a footbath device for pets. The footbath device comprises a liquid storage box, a cleaning cup and a drive device, wherein at least one cleaning cup is arranged in the liquid storage box, and the drive device can drive the cleaning cup to rotate. When the footbath device for pets, disclosed by the invention, is in use, firstly water or a blended cleaning liquid can be poured into the liquid storage box, and then claws of the pets can be stretched into the cleaning cup, and finally the claws of the pets can be cleaned by the cleaning cup which are driven to rotate by use of the drive device. After being cleaned, the claws of the pets only require to be dried. Compared with a traditional cleaning method, the footbath device provided by the invention has the following advantages: the steps of wetting, plastering a detergent, even re-washing and the like can be integrated, so that steps required for cleaning the claws of the pets can be simplified, and limitation of the pet activity time can be reduced, the claws of the pets can be carefully cleaned up by a pet owner, and further the purpose of conveniently, fast and effectively cleaning up the claws of the pets can be achieved.

The invention discloses a dynamic membrane based on a nuclear track membrane and a preparation method and application of the dynamic membrane. The dynamic membrane comprises the nuclear track membraneand a base material; the base material is located below the nuclear track membrane. Channels are uniformly distributed in the nuclear track membrane; for the nuclear track membrane, the thickness is5-150 micrometer, the pore diameter is 0.01-40 micrometer, and the hole density ranges from 1*104 holes / square centimeter to 5*109 holes / square centimeter; for the base material, the thickness is 5-150 micrometer, the pore diameter is 0.1-40 micrometer, and the porosity is 30-60%; the dynamic membrane further comprises a mud cake layer which is located on the upper portion of the nuclear track membrane. According to the dynamic membrane, the advantage that the nuclear track membrane pore diameter is controllable is fully played, the coating time is short, and the filter efficiency is high; themembrane can be cleaned repeatedly and is resistant to high temperature. The dynamic membrane can be applied to the filter film industry fields of waste water treatment, oil-water separation, food and medicine, biochemical engineering and the like.

The invention relates to the field of sewage disposal equipment, in particular to a sewage disposal device. The sewage disposal device comprises a supporting rod, a spray head, a pressure pipeline anda pressure gas cylinder, wherein the supporting rod is formed by sequentially connecting a plurality of supporting pipes in the axial direction, one end of the supporting rod is an operation end, andthe other end of the supporting rod is a working end; the spray head is detachably connected to the supporting pipe at the working end of the supporting rod; and the pressure pipeline is arranged inthe supporting rod composed of the supporting pipes in a penetrating mode, one end of the pressure pipeline communicates with the spray head, and the other end of the pressure pipeline penetrates outof the supporting rod to be connected to the pressure gas cylinder. The sewage disposal device is rapid, simple and convenient to install, so that the sewage disposal device can rapidly and effectively carry out sewage disposal on electric equipment, and circuit fault opening is prevented; meanwhile, different gases are loaded in the detachable spray head and the pressure gas cylinder to realize the sewage disposal or fire extinguishing function, so that the sewage disposal or fire extinguishing requirements are met; and the sewage disposal device is simple to operate, high in efficiency, suitable for various circuit places and capable of effectively solving the problem of circuit faults or accidents with different natures.

The invention discloses a 3D printing mechanical arm post-processing device and a using method thereof. The 3D printing mechanical arm post-processing device comprises an outer box body, the front side of the outer box body is of an opening structure, a guide rail is fixedly installed in the outer box body, a movable seat is slidably installed on the guide rail, a mechanical arm is rotatably installed at the bottom of the movable seat, a printing spray gun is fixedly installed at the end, away from the movable base, of the mechanical arm, a controller is fixedly installed on the inner wall of the top of the outer box, and an isolation hood is fixedly installed on the inner wall of the bottom of the outer box. The 3D printing mechanical arm post-processing device provided by the invention is reasonable in design and good in practicability, cleaning, drying and curing integrated post-treatment work can be carried out on printed products, manual cleaning and drying are not needed, the working efficiency is improved, operation is convenient, time and labor are saved, the product cleaning, drying and curing effects are good, cleaning liquid can be recycled after being filtered and purified, and the waste condition of the cleaning liquid is greatly reduced, and the energy-saving effect is achieved.

The invention belongs to the technical field of exhaust fans, specifically a self-cleaning exhaust fan for textile mills, comprising a casing, exhaust fan blades, driving components, dust-proof parts, extrusion cleaning components and cotton wool filter components; cotton wool filter components in the present invention The component can filter the air before entering the exhaust fan, and then remove the lint in the air, thereby preventing the lint from adhering to the dust-proof parts, and further improving the air outlet efficiency of the exhaust fan; Press the cleaning parts to squeeze the dust-proof parts, and pass water into the dust-proof parts through the water storage cavity set above the dust-proof parts, so that the criss-cross and fluffy wire mesh is continuously squeezed during the flushing process. Press and beat, so that the dust-proof parts made of silk screen can be quickly and effectively washed, and then quickly restore the exhaust effect of the exhaust fan, and the process does not require manual cleaning, which saves manpower and facilitates large-scale textile mills. use and management.

The invention relates to a cleaning process after silicon wafer CMP, comprising the following steps: step (1), cleaning: removing the polishing slurry on a silicon wafer; step (2), detection: detecting the pre-cleaned silicon wafer by using a detecting machine, proceeding the step (3) if the pre-cleaned silicon wafer meets the requirements, and otherwise, returning to the step (1) to continue thepre-cleaning; and step (3), final cleaning: removing the particles generated by the silicon wafer in the step (2), and further removing SiO2 contained in the polishing slurry on the silicon wafer. Thecleaning process after silicon wafer CMP provided by the invention adds vibration equipment in the pre-cleaning process for cooperation with ozone water to quickly and effectively remove organic matters, SiO2, particles and the protective layer on the surface of the acidified film and facilitate the subsequent removal of the acidified film by hydrofluoric acid, so as to effectively remove organicmatters, SiO2 and particles, and adds alkaline liquid of high temperature state to rinse the silicon wafer in the final cleaning to effectively remove residual SiO2.