50results about How to "Quick and effective cleaning" patented technology

The invention relates to a stopper device (1) comprising an outer cap (10) which can be removably attached to the outer surface (3A) of a neck (2) of a container, and an inner insert (20) capable of closing off the opening of the neck, the insert being adapted to be positioned on the neck separately from the cap and before the positioning of the cap on the neck, and the cap being adapted such that, when the cap positioned on the neck, the same can be permanently secured to the insert. In order to limit the risk of the biological contamination of the neck, particularly during the filling of the container, the insert includes means (22, 23) for retaining same on the neck, said means being adapted such that, before the cap is positioned on the neck, the means mechanically couple the insert to the neck, while sealing at least the outer peripheral surface (3A1) of the free end (4) of the neck from a cleaning liquid applied onto the outside of the neck.

The invention discloses a cleaning roll for a robot cleaning arm. The problems that the cleaning efficiency is low and the operation is not convenient are solved effectively. The cleaning roll comprises an upper end cover and a lower end cover; the lower end cover is rotatably connected with a transmission shaft; a sun wheel is coaxially fixed to the transmission shaft; a plurality of planet wheels are engaged with the exterior of the sun wheel and are simultaneously engaged with a gear ring fixedly connected with the lower end cover; the planet wheels are coaxially and fixedly connected withrotating shafts; the lower ends of the rotating shafts are rotatably connected with a first planet carrier; the upper ends of the rotating shafts are rotatably connected with a second planet carrier;the upper end cover is rotatably connected with the transmission shaft; a plurality of hair brushes are fixed to each rotating shaft; a hollow pipe is arranged in the transmission shaft; a plurality of water outlet holes connected with the hollow pipe are formed in the outer wall of the transmission shaft; a water tank is fixed to the upper end of the upper end cover; and the lower end of the water tank is rotatably connected with the hollow pipe.

The invention provides a washing device for masks. The washing device for the masks comprises a fixing seat, wherein a washing groove is fixedly formed in the fixing seat, a washing frame is arrangedin the washing groove, a plurality of sets of inserting grooves are formed in the washing frame and used for inserting the masks, and the bottom of the washing frame is clamped and fixed to the washing groove through a fixing support seat; a frame cover is detachably arranged and fixed on the washing frame, a connecting shaft is fixedly connected to the center of the frame cover, a top plate is rotationally connected to the top of the connecting shaft through a bearing, and a power device for driving the connecting shaft to rotate is arranged on the top plate; and a lifting device is further fixedly arranged on the fixing seat, and the top plate is clamped to the top of the lifting device. The washing device is used for washing the masks, the operation is simple, and washing is thorough.

The invention discloses an automatic hand-washing device used in an operating room. The device comprises a container containing cleaner fluid, a cleaning component arranged in the container, an accommodating cavity arranged in the container for accommodating hands, and a moving component which is connected with the cleaning component and enables the cleaning component to move horizontally or vertically, wherein the cleaning component is composed of a lower cleaning part fixed in the container and used for cleaning one sides of hands, an upper cleaning part connected to the lateral wall of the container in a rotary mode and used for cleaning the other sides of hands, and a middle cleaning part arranged between the upper cleaning part and the lower cleaning part and used for cleaning fingertips. The hand-washing device is specially used in the operating room, the cleaning component can be automatically moved horizontally or vertically, and then hands can be cleaned quickly, effectively and completely.

The invention belongs to the technical field of preparation of a cleaning agent for a fine metal mask (FMM), and particularly relates to a cleaning agent for an OLED mask and a cleaning process thereof. The cleaning agent comprises the following components, in percentage by mass, 20%-50% of alcohol ether solvent, 20%-50% of polar non-proton solvent, 1%-10% of a fluorine-containing nonionic surfactant, and 10%-30% deionized water; the fluorine-containing nonionic surfactant has a structural formula seen in the specification, and n is a natural number between 8 and 14; and the cleaning solutionprovided by the invention can quickly and effectively clean and remove RGB photochromic dye attached to the FMM in the vapor deposition process, is easy to clean, does not remain, and effectively improves the cleaning efficiency of the FMM.

The invention discloses a yacht underwater cleaning equipment, which includes a river bank, a sea area is arranged inside the river bank, sea water is stored inside the sea area, a yacht is floating on the upper side of the sea water, and a drainage mechanism is arranged inside the sea area. The drainage mechanism includes a cleaning box, the left and right ends of the cleaning box are respectively fixed with a lifting plate, and the lifting plate is fixedly connected with the lifting hydraulic rod. The present invention realizes the underwater cleaning of the yacht through mechanical cooperation. The fast cleaning effect of the yacht is relatively remarkable. The invention is provided with a drainage mechanism, which can be used to drain the cleaning tank, a support mechanism, which can be used to alternately support the yacht, and a cleaning mechanism, which can be used to clean the yacht. The overall design of the invention has low cost, simple structure and high degree of automation, and is suitable for large-scale popularization.

The invention discloses a footbath device for pets. The footbath device comprises a liquid storage box, a cleaning cup and a drive device, wherein at least one cleaning cup is arranged in the liquid storage box, and the drive device can drive the cleaning cup to rotate. When the footbath device for pets, disclosed by the invention, is in use, firstly water or a blended cleaning liquid can be poured into the liquid storage box, and then claws of the pets can be stretched into the cleaning cup, and finally the claws of the pets can be cleaned by the cleaning cup which are driven to rotate by use of the drive device. After being cleaned, the claws of the pets only require to be dried. Compared with a traditional cleaning method, the footbath device provided by the invention has the following advantages: the steps of wetting, plastering a detergent, even re-washing and the like can be integrated, so that steps required for cleaning the claws of the pets can be simplified, and limitation of the pet activity time can be reduced, the claws of the pets can be carefully cleaned up by a pet owner, and further the purpose of conveniently, fast and effectively cleaning up the claws of the pets can be achieved.

The invention relates to the field of sewage disposal equipment, in particular to a sewage disposal device. The sewage disposal device comprises a supporting rod, a spray head, a pressure pipeline anda pressure gas cylinder, wherein the supporting rod is formed by sequentially connecting a plurality of supporting pipes in the axial direction, one end of the supporting rod is an operation end, andthe other end of the supporting rod is a working end; the spray head is detachably connected to the supporting pipe at the working end of the supporting rod; and the pressure pipeline is arranged inthe supporting rod composed of the supporting pipes in a penetrating mode, one end of the pressure pipeline communicates with the spray head, and the other end of the pressure pipeline penetrates outof the supporting rod to be connected to the pressure gas cylinder. The sewage disposal device is rapid, simple and convenient to install, so that the sewage disposal device can rapidly and effectively carry out sewage disposal on electric equipment, and circuit fault opening is prevented; meanwhile, different gases are loaded in the detachable spray head and the pressure gas cylinder to realize the sewage disposal or fire extinguishing function, so that the sewage disposal or fire extinguishing requirements are met; and the sewage disposal device is simple to operate, high in efficiency, suitable for various circuit places and capable of effectively solving the problem of circuit faults or accidents with different natures.

The invention belongs to the technical field of exhaust fans, specifically a self-cleaning exhaust fan for textile mills, comprising a casing, exhaust fan blades, driving components, dust-proof parts, extrusion cleaning components and cotton wool filter components; cotton wool filter components in the present invention The component can filter the air before entering the exhaust fan, and then remove the lint in the air, thereby preventing the lint from adhering to the dust-proof parts, and further improving the air outlet efficiency of the exhaust fan; Press the cleaning parts to squeeze the dust-proof parts, and pass water into the dust-proof parts through the water storage cavity set above the dust-proof parts, so that the criss-cross and fluffy wire mesh is continuously squeezed during the flushing process. Press and beat, so that the dust-proof parts made of silk screen can be quickly and effectively washed, and then quickly restore the exhaust effect of the exhaust fan, and the process does not require manual cleaning, which saves manpower and facilitates large-scale textile mills. use and management.

The invention relates to a device and a method for cleaning a missing forme, which is suitable for a printing procedure of manufacturing a plasma display screen. In order to solve the problem of pollution of the missing forme, the device for cleaning the missing forme comprises a cleaning roller, a mechanism for driving and adjusting the cleaning roller, a release roller, a reclaiming roller, a drive motor for driving the reclaiming roller, a viscous belt and a force balancing mechanism; the viscous belt is wound on the release roller, starts from the release roller, rounds the cleaning roller and is finally connected with the reclaiming roller; the mechanism for driving and adjusting the cleaning roller can drive and adjust the cleaning roller so that the cleaning roller drives the viscous belt to be continuously stuck on the lower surface of the missing forme; and the force balancing mechanism on the upper surface of the missing forme and the viscous belt advance together to provideequilibrant for the viscous belt, that is in the advancing process, dirt on the missing forme is stuck on the viscous belt; and the reclaiming roller is driven by the drive motor so as to reclaim theviscous belt stuck with the dirt, thereby realizing continuous and effective cleaning.

The invention relates to a cleaning process after silicon wafer CMP, comprising the following steps: step (1), cleaning: removing the polishing slurry on a silicon wafer; step (2), detection: detecting the pre-cleaned silicon wafer by using a detecting machine, proceeding the step (3) if the pre-cleaned silicon wafer meets the requirements, and otherwise, returning to the step (1) to continue thepre-cleaning; and step (3), final cleaning: removing the particles generated by the silicon wafer in the step (2), and further removing SiO2 contained in the polishing slurry on the silicon wafer. Thecleaning process after silicon wafer CMP provided by the invention adds vibration equipment in the pre-cleaning process for cooperation with ozone water to quickly and effectively remove organic matters, SiO2, particles and the protective layer on the surface of the acidified film and facilitate the subsequent removal of the acidified film by hydrofluoric acid, so as to effectively remove organicmatters, SiO2 and particles, and adds alkaline liquid of high temperature state to rinse the silicon wafer in the final cleaning to effectively remove residual SiO2.