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69results about "Non-electron-emitting control electrodes" patented technology

Information storage

To greatly increase the storage density of a storage apparatus, an electron beam E emitted from a cold cathode 101 is accelerated by an accelerating electrode 102, caused to converge by a convergence electrode 103, deflected by a deflection electrode 104 and applied to a minute region of a storage film 105. The storage film 105 includes, for example, a phase change film 105a. The film is rapidly heated and cooled to change into an amorphous state upon irradiation with an electron beam E with high energy, while being gradually cooled to change into a crystallized state upon irradiation with an electron beam E with approximately intermediate energy, thereby storing data. Upon irradiation with an electron beam E with low energy, the potential difference between a detection electrode 105b and an anode 105c is detected depending on the state, i.e., the amorphous or crystallized state, thereby reading stored data.
Owner:PANASONIC CORP

Semiconductor device and related manufacturing method

A semiconductor device may include the following elements: a semiconductor substrate, an insulator positioned on the substrate, a source electrode positioned on the insulator, a drain electrode positioned on the insulator, a gate electrode positioned between the source electrode and the drain electrode, a hallow channel surrounded by the gate electrode and positioned between the source electrode and the drain electrode, a dielectric member positioned between the hollow channel and the gate electrode, a first insulating member positioned between the gate electrode and the source electrode, and a second insulating member positioned between the gate electrode and the drain electrode.
Owner:SEMICON MFG INT (SHANGHAI) CORP

Chopper for a particle beam

A chopper for a particle beam comprises an annular guiding element and an element for controlling the intensity of the particle beam. The control element is supported on the guiding element so that at least one point under consideration on the control element can revolve along the circumference of the guiding element. Mounting along a circumference allows for accommodation of considerably higher disturbance torque than mounting on a rotational axle, using the same bearing force. Furthermore, it is possible to dispense with the entire rotational axle, and the control element can be designed, for example, as a ring. This brings about considerable weight savings as compared to chopper wheels according to the prior art, which accordingly enables higher circumferential speeds and therefore higher modulation frequencies for the particle beam, while at the same time increasing operational safety.
Owner:FORSCHUNGSZENTRUM JULICH GMBH

Charged particle beam extraction and formation apparatus

A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.
Owner:VEECO INSTR
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