The invention provides a nano vacuum
triode with a planar emitting
cathode and a manufacturing method of the nano vacuum
triode with the planar emitting
cathode. The method comprises the steps that a substrate, a back
electrode, the planar
cold cathode, a first
insulation layer, a grid layer, a second
insulation layer, a small cylindrical hole, a grid layer step and an
anode layer are included; the back
electrode is manufactured on the back face of the substrate; the planar
cold cathode is manufactured on the front face of the substrate; the first
insulation layer is manufactured on the planer
cold cathode; the grid layer is manufactured on the first insulation layer; the second insulation layer is manufactured on the
indium tin oxide thin film grid layer; the small cylindrical hole penetrates through the first insulation layer, the grid layer and the second insulation layer; the grid layer step is formed by
etching the second insulation layer to the grid layer; the
anode layer is manufactured on the second insulation layer; the
total thickness of the first insulation layer, the
indium tin oxide thin film grid layer and the second insulation layer ranges from 10 nanometers to 100 manometers. The defect that the
electron emitting density of a tip structure is uneven, and a tip is prone to being damaged is overcome, and meanwhile the defect that the planar
cathode needs higher threshold
electric field intensity is overcome through the negative
electron affinity characteristic of aluminum
nitride materials.