63 results about "Instrument error" patented technology

A method is described for improving the prediction accuracy and generalization performance of artificial neural network models in presence of input-output example data containing instrumental noise and / or measurement errors, the presence of noise and / or errors in the input-output example data used for training the network models create difficulties in learning accurately the nonlinear relationships existing between the inputs and the outputs, to effectively learn the noisy relationships, the methodology envisages creation of a large-sized noise-superimposed sample input-output dataset using computer simulations, here, a specific amount of Gaussian noise is added to each input / output variable in the example set and the enlarged sample data set created thereby is used as the training set for constructing the artificial neural network model, the amount of noise to be added is specific to an input / output variable and its optimal value is determined using a stochastic search and optimization technique, namely, genetic algorithms, the network trained on the noise-superimposed enlarged training set shows significant improvements in its prediction accuracy and generalization performance, the invented methodology is illustrated by its successful application to the example data comprising instrumental errors and / or measurement noise from an industrial polymerization reactor and a continuous stirred tank reactor (CSTR).

The invention addresses the lack of comprehensive and quantitative methods for measurements of unwanted visual “mura” effects in displays and image sensors. Mura is generated by errors that are significantly smaller than what is needed for the function of the device, and sometimes smaller than the random variations in the patterns or structures. Capturing essentially all mura defects in a workpiece in a short time requires a daunting combination of sensitivity, statistical data reduction and speed. The invention devices an inspection method, e.g. optical, which maximizes the sensitivity to mura effects and suppresses artifacts from the mura inspection hardware itself and from noise. It does so by scanning the sensor, e.g. a high-resolution camera, creating a region of high internal accuracy across the mura effects. One important example is for mura related to placement errors, where a stage with better than 10 nanometer precision within a 100 mm range is created. A sampling scheme reduces the data volume and separates between instrument errors and real defects based on their different geometrical signatures. The high-resolution camera scans sparse lines at an angle to the dominating directions of expected mura defects, creating extended sensor fields with high internal precision, and quantifying edge placements in small windows in said extended fields. The mura is classified and presented as type, location and severity.

The invention belongs to the field of instrument error calibration in nuclear power plants, and specifically relates to a portable calibration platform for steam turbine differential expansion and axial displacement instruments that improves the calibration accuracy and reliability of steam turbine differential expansion and axial displacement instruments; it includes a magnetic base, 3 Locking switch, guide rail, fixed arm of dial indicator, translation stage, translation knob, connecting frame between translation stage and rotation stage, rotation stage lock nut, rotation stage, rotation stage fixing frame, translation stage, displacement lock nut, screw gauge Micro-knob, instrument fixing module connection bracket, differential expansion instrument fixing module, shaft displacement instrument fixing module, dial indicator, differential expansion instrument, front-end device, cam and shaft displacement meter; the beneficial effects of the present invention are: fast and accurate adjustment The gap between the instrument and the large shaft of the steam turbine, the error accuracy is less than 0.1mm; the stroke of the instrument can be accurately controlled and the full stroke can be completed quickly; the displacement of at least three axes can be verified online at the same time, which greatly improves the work efficiency.

Setting a polishing rate and a polishing time in chemical mechanical polishing can be performed with high accuracy by considering a product wafer of an object to be polished, and an instrumental error between apparatuses to be used, etc. By using, as a calculating formula, a formula well approximating a portion of a curve representing a state of chemical mechanical polishing on a side showing a target polishing amount, the polishing rate and the polishing time can be set with high accuracy according to a state of chemical mechanical polishing for actually polishing a product wafer. In the calculating formula, a parameter “A” relating to a film property of a film of an object to be polished, a parameter “B” relating to a roughness state of a film surface, and a parameter “C” relating to an instrumental error differential between apparatuses of a chemical mechanical polishing apparatus are joined by operators.