124results about How to "Reduce polydispersity" patented technology

The present invention provides inventive conjugated polyethyleneimine (PEI) polymers and conjugated aza-macrocycles (collectively referred to herein as “conjugated lipomers” or “lipomers”) containing one or more groups of the formula (iii):wherein R3 and R4 are as defined herein. Also provided are compositions comprising the inventive conjugated lipomers, and methods of preparation and use.

The invention discloses a preparation method of hydrogenated butadiene special rubber, which comprises the following steps: subjecting butadiene rubber to a degradation reaction and a hydrogenation reaction under an action of a Zhan Catalyst as showed in the general formula I to obtain hydrogenated butadiene special rubber. The invention also provides a degradation reaction of the butadiene rubber, which is also under the action of a Zhan Catalyst as showed in the general formula I. The preparation method provided by the invention overcomes the shortcomings that the existing various types of catalysts can not be applicable to the preparation of low Mooney viscosity and high Mooney viscosity hydrogenated butadiene special rubber at the same time, so as to provide a preparation method of high-performance hydrogenated butadiene special rubber with a wide controllable Mooney viscosity range of 5-130. The catalyst used in the invention is the catalyst for both rubber degradation and hydrogenation reduction, so as to avoid a process requiring addition of the catalysts with different catalytic activities in two times respectively in the prior art. The method is simple, and easy to operate.

This invention relates to compositions for delivering one or more active ingredients, and more particularly to compositions, e.g. beads, comprising a matrix material which matrix material comprises a microorganism. In particular, the invention relates to compositions comprising a microorganism selected from live, killed, attenuated and inactivated microorganisms. The matrix material may also comprise a surfactant and may further comprise an adjuvant. The invention further relates to the manufacture and use of such compositions, and to other subject matter.

Methods for surface-initiated atom transfer radical polymerization, which can utilize a catecholic alkyl halide initiator.

The present invention relates to amphipathic copolymeric binder particles that incorporate polymerizable crystallizable compounds chemically incorporated into a dispersible (D) portion and / or solvatable (S) portion of the copolymer. The invention also pertains to dry particulate electrophotographic toners incorporating an amphipathic copolymer comprising one or more polymerizable crystallizable compounds. Methods of making these dry electrophotographic toner particles, and methods of electrophotographically forming an image on a substrate using these toners, are also described.

A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl(CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl(CH3), trifluoromethyl(CF3), difluoromethyl(CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl(CF3), difluoromethyl(CHF2), fluoromethyl(CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.

The present invention provides inventive conjugated polyethyleneimine (PEI) polymers and conjugated aza-macrocycles (collectively referred to herein as “conjugated lipomers” or “lipomers”) containing one or more groups of the formula (iii):wherein R3 and R4 are as defined herein. Also provided are compositions comprising the inventive conjugated lipomers, and methods of preparation and use.

A continuous micro-reaction device for preparing meta-aramid resin comprises a prepolymerization system, a polycondensation system, an after-treatment system and a heat exchange system, wherein the prepolymerization system, the polycondensation system and the after-treatment system are connected in sequence, and the heat exchange system is connected with the prepolymerization system and the polycondensation system to control temperatures of the prepolymerization system and the polycondensation system. The continuous micro-reaction device is characterized in that the prepolymerisation system comprises a raw material storage device, a micro-mixer and a micro-reactor which are connected in sequence; the polycondensation system comprises a multistage micro-screw device, and the micro-reactor is connected with multistage micro-screw device. The continuous micro-reaction device for preparing the meta-aramid resin improves the heat transfer effect at the polycondensation stage and the mass transfer effect at the polycondensation stage during preparation of the meta-aramid resin, and achieves the purpose of improving the performance of a meta-aramid resin product. The invention further provides a continuous micro-reaction method for preparing the meta-aramid resin and the product.

Polymerization of fluoroolefin monomers proceeds in a supercritical carbon dioxide solvent at high monomer loading levels to provide a high molecular weight polymer with low polydispersity and / or a unimodal molecular weight distribution.

A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula:where R1 represents hydrogen (H), a linear, branched or cyclo alkyl group of 1 to 20 carbons, a semi- or perfluorinated linear, branched or cyclo alkyl group of 1 to 20 carbons or CN; R2 represents an alicyclic group of 5 or more carbon atoms; X represents a methylene, ether, ester, amide or carbonate linkage; R3 represents a linear or branched alkylene group or semi- or perfluorinated linear or branched alkylene group with 1 or more carbon atoms; R4 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perflourinated aliphatic group; R5 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group; n represents an integer of 1 or more; and OR12 represents OH or at least one acid labile group selected from a tertiary alkyl carbonate, a tertiary alkyl ester, a tertiary alkyl ether, an acetal and a ketal. A method of patterning a substrate is also disclosed, wherein the method includes: applying the photoresist composition mentioned above to the substrate to form a film; patternwise exposing the film to an imaging radiation source; and developing areas of the film to form a patterned substrate.

Methods, compounds, and medicinal formulations utilizing biocompatible polymers for delivery of a drug, particularly for solubilizing, stabilizing and / or providing sustained release of drug from topical, implantable, and inhalation systems. Many of the methods, compounds, and medicinal formulations are particularly suitable for oral and / or nasal inhalation and use polymers of the formula —[X—R1—C(O)]— wherein each R1 is an independently selected organic group that links the —X— group to the carbonyl group, and each X is independently oxygen, sulfur, or catenary nitrogen.

Poly (ethylene-co-C4-C20-alkene) copolymers or segments with polydispersities less than 1.3 and / or predominantly enchainment in a cis-1,2 fashion and / or poly(ethylene-co-C4-C20 monocyclic alkene) copolymers or segments provide in some cases substitutes for ultra high molecular weight polyethylenes and in some cases substitutes for polypropylenes and in some cases utility as gas barrier coatings.

Methods of reducing the amount of undesirable by-products in the production of polymers are disclosed. The resulting polyetherimides have lower polydispersivity and enhanced thermomechanical properties. In some embodiments, cyclic and low molecular weight linear oligomers are also obtained.

A photoresist composition is provided that includes a polymer having at least one acrylate or methacrylate monomer having a formula where R1 represents hydrogen (H), a linear or branched alkyl group of 1 to 20 carbons, or a semi- or perfluorinated linear or branched alkyl group of 1 to 20 carbons; and where R2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF3) group attached to each carbon of the substituted aliphatic group, or a substituted or unsubstituted aromatic group; and where R3 represents hydrogen (H), methyl (CH3), trifluoromethyl (CF3), difluoromethyl(CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated aliphatic chain; and where R4 represents trifluoromethyl (CF3), difluoromethyl (CHF2), fluoromethyl (CH2F), or a semi- or perfluorinated substituted or unsubstituted aliphatic group. A method of patterning a substrate using the photoresist composition is also provided herein.