33results about How to "High coordinate accuracy" patented technology

A reference signal is transmitted from one of a plurality of robot control devices connected by communication connecting device to the other robot control device. The timing of generation of an operation basic period signal in each of the other robot control devices is synchronized with the timing of generation of an operation basic period signal in the one of the plurality of robot control devices, based on a time interval from generation of the operation basic period signal until transmission of the reference signal in the one of the plurality of robot control devices, a time interval from generation of the operation basic period signal until reception of the reference signal in each of the other robot control devices, and a communication delay time required for communication between the one of the plurality of robot control devices and each of the other robot control devices.

A method for improving coordinate accuracy of a touch panel having sensing lines arranged to form an array includes the steps of: detecting existence of a touch point influencing at least one sensing line; determining existence of an edge sensing line; providing signal strengths to the at least one sensing line and a sensing line immediately adjacent to the at least one sensing line; generating a virtual sensing line extending out the touch panel and immediately adjacent to the at least one sensing line; providing a signal strength to the virtual sensing line; and obtaining actual coordinate of the touch point by weighing coordinates of the at least one sensing line, the sensing line immediately adjacent to the at least one sensing line and the virtual sensing line via system generated coordinates.

The invention provides a collaborative robot hand-eye relation automatic calibration device and method. The calibration device comprises a collaborative robot force control pulling teaching button, acalibration probe, a calibration plate with a marker and a calibration system, wherein the calibration system is mainly used for controlling the robot button to move according to a preset track; target points in the preset track automatically acquire pixel coordinates of the center point of the marker and coordinate dot pairs of a robot; and calibration parameters are calculated according to the obtained multiple dot pairs. The calibration method comprises the steps of placing the calibration plate; pulling the collaborative robot to a teaching point and recording coordinates of the robot; pulling the collaborative robot to an initial photographing point, recording the coordinates of the robot and configuring a matched template; controlling the robot to continuously change the photographing point and acquiring the coordinates of the robot and the pixel coordinate dot pairs of the marker; and calculating the calibration parameters. Through the collaborative robot hand-eye relation automatic calibration device and method, the hand-eye relation of the collaborative robot can be conveniently and quickly calibrated, the calibration precision is high, and the collaborative robot hand-eyerelation automatic calibration device and method have the important significance in industrial grabbing and application of the collaborative robot.

The invention provides a method for manufacturing a photomask, an inspection method and an inspection apparatus, which can improve the coordinate accuracy of a pattern formed on a transferred object.The method for manufacturing a photomask comprises the steps of: preparing pattern design data (A); obtaining transfer surface correction data (D) indicating the amount of deformation of the main surface due to the holding of the photomask to the exposure device and the amount of deformation other than the deadweight deflection component; obtaining drawing height distribution data (E) representingthe height distribution of the main surface in a state where the photomask blank is placed on a workbench of a drawing device; drawing differential data (F) are obtained through the difference between the height distribution data (E) and the transfer surface correction data (D) during drawing; calculating a coordinate deviation amount corresponding to the drawing differential data (F), and obtaining coordinate deviation amount data (G) for drawing; and a drawing step in which drawing is performed on the photomask blank using the coordinate deviation amount data (G) for drawing and the patterndesign data (A).

By providing a method of manufacturing a photomask, a method of manufacturing a display device, and a drawing device, the coordinate accuracy of a pattern formed on a body to be transferred can be improved. The method for producing a photomask of the present invention includes the steps of preparing pattern design data (A) and obtaining a deformation amount of the main surface excluding the self-weight deflection component due to holding the photomask in the exposure apparatus. Transfer surface correction data (D) of the amount of deformation; acquisition of height distribution data (E) showing the height distribution of the main surface in a state where the photomask blank is placed on the stage of the drawing device; The difference between the height distribution data (E) and the transfer surface correction data (D) at the time of drawing is used to obtain drawing difference data (F); and the coordinate deviation amount corresponding to the drawing difference data (F) is calculated, and the coordinate deviation amount data for drawing is obtained ( G).

The invention provides a substrate for a photomask, the photomask, a method for manufacturing the photomask and a method for transfering a pattern, and transferring precision of the pattern is improved in proximity exposure. The photomask is provided with: a transparent substrate; and a transferring pattern formed by composing a shading film formed at the surface of the transparent substrate to be a predetermined transferring pattern, wherein, a worktable using a depicting machine supports the second main surface of the transparent substrate from the lower part; and the transferring pattern is formed, for the flatness of the second main surface of the transparent surface when no supporting part is sued to support the transparent substrate from the lower part, when the height difference between each arbitrary two points, is disposed to be Delta Zb([mu]m), Delta Zb<=(1 / T)*3.0.

The invention relates to a novel CNC wire cutting machine which can effectively improve the coordinate accuracy of a horizontal plate and a longitudinal plate. The novel CNC wire cutting machine comprises a machine tool body, a workbench, a wire walking mechanism, a high-frequency pulse power supply, a liquid supply system and an electrode wire. The workbench comprises a horizontal plate, a longitudinal plate and a displacement device. The horizontal plate is arranged on the top face of the machine tool body through the displacement device. The longitudinal plate is arranged on the top of the horizontal plate through the displacement device. The displacement device comprises a bottom plate and a top plate. A thread rod is fixed at the end of the top plate in a parallel mode. A middle rotating shaft is vertically arranged on the bottom plate. A worm wheel is arranged on the middle rotating shaft through a bearing. The worm wheel is meshed with a thread face of the thread rod. A motor box is arranged on the bottom plate. The motor box comprises a speed reducing motor, a worm and a worm adjusting sleeve. One end of the worm is arranged at the output end of the speed reducing motor. Spiral-shaped gear teeth meshed with the worm wheel are arranged on the worm. The thickness of the gear teeth are gradually increased from one end to the other end in the axial direction. The other end of the worm moves relatively in the axial direction in a worm adjusting sleeve.

The invention relates to a dual-linear data coordinate method, which comprises: 1, based on the material relation diagram of mechanical factory, generating dual-linear data coordinate mode; 2, using variable eliminate method to decompose and normalize the coordinate mode; 3, based on decomposed and normalized mode, using micro particle group algorism, to obtain accurate material and component data. In said the invention, the priority value can be fixed easily, to treat the non-watched material speed and component variable easily, with high coordinate accuracy. And since the coordinate process is decomposed and normalized, and the search space of micro particle group algorism has reduced dimensions, the invention has high coordinate efficiency. And it uses the upper and lower limits of component variables, to confirm reliable coordinate result. The invention can be integrated with other systems.

The invention discloses a detector signal readout circuit, a detector and a signal processing method. Cathode signal output ends of each row of SiPM (Silicon Photomultipliers) pixels of an SiPM arrayare connected to form M row common connection ends, anode signal output ends of each column of the SiPM pixels are connected to form N column common connection ends, each row common connection end andeach column common connection end are connected with a signal readout circuit, in the case that the SiPM array is in a Geiger mode, the signal readout circuit can filter out alternating current signals of each row and each column, the M-row signal readout circuit can carry out weighted summation on the M-row cathode alternating current signals to obtain two row signals, the N-column signal readout circuit can carry out weighted summation on the N-column anode alternating current signals to obtain two column signals. According to the circuit, the detector and the method in the invention, setting of weight coefficients of the sub-circuits in the rows and columns enables the coordinate precision of the position of a scintillation crystal obtained through a gravity center method based on therow and column signals higher, also, large numbers of shunting resistors and analog amplifiers are not needed, so that the electronics complexity of the circuit and the area of the readout board are reduced.

The invention discloses a robot obstacle avoidance algorithm based on topological relationship, including defining the interval occupied by the robot itself as A region; determining an obstacle as B region; defining N obstacles as N regions; establishing A region and B region The topological relationship between the area and N areas; the topological relationship set can be obtained through the topological relationship and the obstacle avoidance route of the robot can be improved. Accuracy, to avoid external factors from affecting the ranging effect, improve the accuracy of topology calculation probability, and calculate the relationship between the robot and B area or N areas through the topological relationship between the A area, B area, and N areas. The collision probability between the obstacles and the simulated robot collision situation are fed back to the operator, which can improve the robot obstacle avoidance plan and reduce the probability of robot collision damage.

An alignment method of mask patterns includes forming a first layer by transferring a first mask pattern onto a wafer, forming a second layer by transferring a second mask pattern onto the first layer, and particularly a first alignment step, forming the first layer, which performs alignment for minimizing offset between a center position of the wafer and a center position of the first mask pattern and a residual rotation error between the wafer and the first mask pattern and additional alignment for compensating an amount of possible deviation of superposition of the second layer pattern on the first layer pattern, and a second alignment step, forming the second layer, which performs only alignment for minimizing offset between a center position of the first layer pattern and a center position of the second mask pattern and a residual rotation error between the first layer pattern and the second mask pattern.