Substrate for photomask, photomask, method for manufacturing photomask and method for transfering pattern
A manufacturing method and pattern transfer technology, which are used in microlithography exposure equipment, semiconductor/solid-state device manufacturing, optics, etc., can solve problems such as deterioration, color turbidity, and poor liquid crystal display devices, and achieve improved transfer accuracy. The effect of improving coordinate accuracy
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[0050] An embodiment of the present invention will be described below.
[0051] (1) Manufacturing process of color filter
[0052] First, refer to Figure 1 ~ Figure 3 The manufacturing process of a color filter used in a liquid crystal display device etc. is demonstrated. figure 1 It is a flowchart illustrating the outline of the manufacturing process of the color filter of this embodiment. figure 2 (a) is a side view exemplifying a case where proximity exposure is performed in the manufacturing process of the color filter of this embodiment. figure 2 (b) is its top view. image 3 (a) is a plan view illustrating the planar structure of the photomask of this embodiment, image 3 (b) is a plan view illustrating a modification example thereof.
[0053] Such as figure 1 As shown, the color filter 10 for a liquid crystal display device is manufactured by sequentially performing the following steps: a black matrix layer 12p (which constitutes a color boundary portion) is formed on one m...
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