200results about "Screening processes" patented technology

A method of generating patterns of a pair of photomasks from a data set defining a circuit layout to be provided on a substrate includes identifying critical segments of the circuit layout to be provided on the substrate. Block mask patterns are generated and then legalized based on the identified critical segments. Thereafter, phase mask patterns are generated, legalized and colored. The legalized block mask patterns and the legalized phase mask patterns that have been colored define features of a block mask and an alternating phase shift mask, respectively, for use in a dual exposure method for patterning features in a resist layer of a substrate.

An improved relief printing plate and method for producing said plate is disclosed. Substantially all sizes of relief features resolve a fixed pattern which improves print quality. The pattern is applied to image areas in halftone data used to produce an image mask that is subsequently used to convert a plate precursor into a relief plate. The accuracy, ink density and tonal response of printed images corresponding to relief features that include the pattern are comparable or better than relief features produced without the pattern.

The present invention relates to a wavefront sensor using a pair of screens, each having a two-dimensional array of circular apertures, to achieve Moiré effects, and its use to measure the slope of a wavefront.

A reflector comprises a core and a first dielectric mirror formed over at least a portion of the core to reflect light having a preselected wavelength. The reflector may comprise a plurality of dielectric mirrors formed concentrically over the first dielectric mirror to reflect light having the preselected wavelength. The multiple dielectric mirrors may have different diffraction indices. A layer of such reflectors deposited onto the reflective surface of a projection screen may enhance the reflective selectivity of the screen to the preselected wavelength. Reflectors formed to reflect different wavelengths may be deposited onto the reflective surface to enhance selectivity to the different wavelengths and minimize reflection of ambient light.

An angular selective light control sheeting and a method of making the same are disclosed. The light control sheeting includes a layer of an optically clear elastic material which has a series of parallel slits formed by means of surface slitting with a sharp object such as a razor or blade. Each slit is filled with an opaque material which prevents light transmission through the slit walls. The method includes a step of slitting of an elastic, optically transmissive plastic sheet with a blade and forming at least one array of substantially parallel linear slits in a surface of the sheet, a step of stretching the sheet in a direction perpendicular to the linear slits, and a step of introducing an opaque material into the interior of the slits.

The invention discloses a method for manufacturing a precise photoconductive film cavity of backlight modules, which is characterized in that: an ultraviolet laser beam is reflected on a digital micro mirror after being expanded and collimated, the digital micro mirror is controlled according to the shape of a light guide network to be produced, and reflected light etches the light guide network on the surface of an ultraviolet photoresist dry plate via a projection optical system with 4F light paths; the relative positions of the reflected light and the photoresist dry plate are changed in turn to complete the etching of each needed light guide network; and the etched photoresist dry plate is electroformed after the process of surface metallization, so as to obtain the needed light guide film cavity. By inputting the shape of the light guide network via the digital micro mirror and etching the light guide network on the photoresist dry plate directly via the ultraviolet laser, the invention can evaluate the network design and provide sample products in a rapid manner, and improve the manufacturing quality of the cavity; at the same time, the invention is propitious to the manufacture of large-sized light guide plates.

The present invention discloses a method for making a thin film transistor. The method is applied to a display panel copper process. The method comprises a step of forming a first metal layer on a substrate and patterning the first metal layer to form a gate electrode of the thin film transistor, a step of forming a gate insulating layer on the gate, a step of orderly forming a semiconductor layer and a second metal layer on the gate insulating layer, a step of coating the second metal layer with a photoresist, a step of etching the second metal layer and the semiconductor layer to form a border region of the thin film transistor, a step of etching the second metal layer again to form a source electrode, a drain electrode and a back channel region of the thin film transistor, a step of using ashing process to peeling remaining photoresist, and a step of etching the semiconductor layer again to form a conductive channel of the thin film transistor. According to the method, an electric leakage problem of the thin film transistor caused by factors of the diffusion of copper, the pollution of an organic stripping solution and the like is improved.

A parallax barrier is manufactured by forming a light-blocking layer by patterning a metal layer or a resin layer on a barrier glass in a photolithography step. On a mask used in the photolithography step, some pitches between slits are different, the slits corresponding to portions whereupon the light-blocking layers are to be formed. In addition, on the mask, first pitches (for instance, 100) and second pitches (for instance 99.5), which can be actually formed with accuracy, are formed in a cycle, and the average of such pitches can be accord with a theoretical pitch distance (for instance, 99.99). Thus, in the parallax barrier to be used for a multiple display device, visibility of the entire screen can be improved, and the parallax barrier which can be manufactured by using the mask lithography technology having a limited accuracy, and a method for manufacturing such parallax barrier are provided.

An improved relief printing plate and method for producing said plate is disclosed. Substantially all sizes of relief features resolve a fixed pattern which improves print quality. The pattern is applied to image areas in halftone data used to produce an image mask that is subsequently used to convert a plate precursor into a relief plate. The accuracy, ink density and tonal response of printed images corresponding to relief features that include the pattern are comparable or better than relief features produced without the pattern.

In a vehicle display device having displays fitted in a grained panel of an instrument panel of a vehicle and serving to emit a display light to an outside during lighting, a front face of each of the displays is covered with a screen having a grained pattern which is provided with a large number of minute holes capable of transmitting the display light. Consequently, a screen can be seen through the minute holes of the screen when the display is turned on, while the display is hidden by the grained screen when the display is turned off. Therefore, the whole portion including the part having the display fitted therein is unified to be grained.

A device substrate and a fabricating method thereof are provided. The device substrate includes a substrate and a patterned light-shielding layer. The patterned light-shielding layer having a plurality of pixel openings and a plurality of first exposure openings is disposed on the substrate, and an area and / or shape of one of the first exposure openings is different from an area and / or shape of one of the pixel openings.

The invention provides a charged particle ray irradiation unit for confirming the irradiation position of desired site. An irradiation room (103) comprises a charged particle ray irradiation part (1) rotating around the irradiated object (51), a detection part (30) for detecting the silent gamma ray generated by the irradiated object (51) which can move along the extending direction of the pivot point X of the charged particle ray irradiation part (1). Thus, the detection part moves along the direction of the X axle to prevent the detection part (30) interfering the rotation of the charged particle ray irradiation part (1). Moreover, when the irradiated object moves into and out the irradiation room (103), the detection part (30) is out of the way. And, the position confirmation of the desired site can be performed. The detection part (30) moves upwards along the direction of axle X and cooperates with the size of the irradiation object, thus the detection range of the detection part (30) can be enlarged.