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30results about "Gas-gas reaction as plasma state" patented technology

Apparatus for plasma-chemical production of nitrogen monoxide

A method and an apparatus for plasma-chemical production of nitrogen monoxide is used to produce inhalation gas enriched with nitrogen monoxide for medical purposes. The nitrogen-monoxide production is achieved through the use of a dielectric barrier discharge created in a process gas containing nitrogen and oxygen.
Owner:MAQUET CRITICAL CARE

Plasma whirl reactor apparatus and methods of use

A plasma system includes a plasma arc torch, a cylindrical tube and an eductor. The plasma arc torch includes a cylindrical vessel having a first end and a second end, a first tangential inlet / outlet connected to or proximate to the first end, a second tangential inlet / outlet connected to or proximate to the second end, an electrode housing connected to the first end such that a first electrode is (a) aligned with a longitudinal axis of the cylindrical vessel, and (b) extends into the cylindrical vessel, and a hollow electrode nozzle connected to the second end of the cylindrical vessel. The cylindrical tube is attached to the hollow electrode nozzle and aligned with the longitudinal axis, the cylindrical tube having a side inlet and a radio frequency coil disposed around or embedded within the cylindrical tube. The eductor is attached to the cylindrical tube and aligned with the longitudinal axis.
Owner:FORET PLASMA LABS

Inductively coupled plasma source with multiple dielectric windows and window-supporting structure

A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.
Owner:APPLIED MATERIALS INC

Inductively coupled plasma source with plural top coils over a ceiling and an independent side coil

A plasma reactor for processing a workplace includes a reactor chamber having a ceiling and a sidewali and a workplace support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.
Owner:APPLIED MATERIALS INC

Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting Structure

A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.
Owner:APPLIED MATERIALS INC
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