55results about How to "Save layout area and" patented technology

The present invention provides an electromagnetic component formed from adjacent conducting layers of a multi-layer PCB and two additional conducting layers in contact with the PCB. The inventive component includes one or more winding turns formed by connecting the multiple layers of the multi-layer PCB with conductive vias and by connecting the additional conducting layers to respective top and bottom surfaces of the PCB. In one embodiment, one of the conducting layers is soldered to a top conducting layer of the PCB and the other of the conductive layers is soldered to a bottom conducting layer of the PCB, effectively increasing the cross-sectional area of the top and bottom winding layers. In another embodiment, the additional conducting layers are separated from the adjacent conducting PCB layers by a layer of insulation, permitting the additional conducting layers to form separate winding turns. The inventive winding stack can be surface mounted to a PCB, and can be used as an inductor, or in other electromagnetic devices. The winding thus constructed is capable of accepting larger currents with lower resulting temperature increases than windings formed only from PCBs, and are less expensive to manufacture than PCB-only windings.

A multi-domain ESD protection circuit structure is described. The preferred embodiment of the present invention selects power lines of an internal circuit as ESD buses. The power lines of the remaining internal circuits are coupled with the ESD buses through the ESD connection cells. In another embodiment of the preferred invention, the VDD power line from one internal circuit and the VSS power line from another circuit are selected as ESD buses. In yet another embodiment, either a VDD power line or a VSS power line of an internal circuit is selected as an ESD bus.

A reference voltage generator including a reference voltage generating unit is provided. The reference voltage generating unit receives a first bias voltage current and a first mirror current and generates a reference voltage. The reference voltage generating unit includes a first metal-oxide-semiconductor (MOS) transistor, a second MOS transistor, a first impedance providing element and a second impedance providing element. The first and the second MOS transistors operate in a sub-threshold region so as to generate a first gate-source voltage and a second gate-source voltage having a negative temperature coefficient. The first impedance providing element is configured to generate a first current having a positive temperature coefficient. The second impedance providing element is configured to generate a first voltage having a negative temperature coefficient at its first terminal. The reference voltage is equal to a sum of the second gate-source voltage and the first voltage.

Several 2D and 3D HiNAND flash memory arrays with 1-level or 2-level broken BL-hierarchical structures are provided for Multiple Whole-WL and All-BL simultaneous operations in Dispersed Blocks. The global bit line (GBL) is divided to multiple 1(top)-level broken metal2 GBLs plus optional lower-level broken metal1 local bit lines (LBLs). A preferred Vinhibit supply higher than Vdd can be selectively supplied via horizontal metal0 power line LBLps to charge selected broken GBLs / LBLs which can also be selectively discharged via a String source line. Charge-sharing technique for precharging and discharging of broken GBL / LBL capacitors for NAND cell data sensing is used in Read and Verify operations with reduced power consumption and latency. Recall technique to restore the desired Program Data stored in the broken GBL / LBL capacitors is used for Multiple-WL and All-BL Program and Program-Verify operation with reduced program current for highest program yield superior P / E cycles.

Dual port memory blocks that have a reduced layout area are provided. The write drivers and sense amplifiers are shared between the dual ports to reduce the number of write drivers and sense amplifiers to save layout area. The write drivers for the two ports are used to write into all of the first port's bitlines. The sense amplifiers for the two ports are used to read from all of the second port's bitlines. A memory block can to support true dual port (TDP) and simple dual port (SDP) operation using substantially less write drivers and sense amplifiers.

A phase detector, including a sampling device, a comparing device, and an output device, is provided. The sampling device samples a data signal according to a plurality of clock signals, so as to provide a plurality of corresponding sampling values. The clock signals have the same frequency and different phases. The comparing device is coupled to the sampling device, and provides a plurality of corresponding comparison values according to comparison results of each of the sampling values comparing with the next sampling value. The output device is coupled to the comparing device, and outputs two of the comparison values in response to edges of the clock signals. The two outputted comparison values serve as a first instruction signal and a second instruction signal respectively. The first and the second instruction signals are referred to in controlling the frequency and the phase of the foregoing clock signals.

A device for electrostatic discharge (ESD) protection is disclosed. The device for electrostatic discharge protection includes a lateral bipolar transistor and a diode. The semiconductor transistor has an emitter, a base and a collector electrically connected to a first power line (such as Vdd), a second power line (such as Vss) and a bond pad of an integrated circuit respectively. The diode has an n electrode and a p electrode electrically connected to the first power line and the bond pad respectively.

An IO cell with multiple IO ports and related techniques are provided. The IO cell has a plurality of IO ports for transmitting signal of a same IO pin, and each IO port corresponds to a predetermined region for containing an IO pad, wherein at least one of the plural predetermined regions of the plural IO ports partially overlaps with active circuit layout region of the IO cell. In a chip, if a given IO cell has a predetermined region of an IO port overlapping an IO pad location of another adjacent IO cell, then a predetermined region of another IO port is selected for implementing an IO pad of the given IO cell, such that the IO cells can be arranged more compactly for chip layout area saving.

Several 2D and 3D HiNAND flash memory arrays with 1-level or 2-level broken BL-hierarchical structures are provided for Multiple Whole-WL and All-BL simultaneous operations in Dispersed Blocks. The global bit line (GBL) is divided to multiple 1 (top)-level broken metal2 GBLs plus optional lower-level broken metal1 local bit lines (LBLs). A preferred Vinhibit supply higher than Vdd can be selectively supplied via horizontal metal0 power line LBLps to charge selected broken GBLs / LBLs which can also be selectively discharged via a String source line. Charge-sharing technique for precharging and discharging of broken GBL / LBL capacitors for NAND cell data sensing is used in Read and Verify operations with reduced power consumption and latency. Recall technique to restore the desired Program Data stored in the broken GBL / LBL capacitors is used for Multiple-WL and All-BL Program and Program-Verify operation with reduced program current for highest program yield superior P / E cycles.

Electrostatic discharge (ESD) protection is provided for an integrated circuit. Snap back from a lower initial critical voltage and critical current is provided, as compared to contemporary designs. A dynamic region having doped regions is formed on a substrate, interconnects contacting the dynamic region. The dynamic region includes an Nwell region, a Pwell region and shallow diffusions, defining a PNP region, an NPN region and a voltage Breakdown region. In an aspect, the Nwell region includes a first N+ contact, a first P+ contact and an N+ doped enhancement, while the Pwell region includes a second N+ contact, a second P+ contact and a P+ doped enhancement. The N+ doped enhancement contacts the P+ doped enhancement forming the breakdown voltage region therebetween, in one case forming a buried breakdown voltage junction. Independent control is provided over breakdown voltage, NPN critical voltage, NPN critical current and PNP critical current, by varying doping levels, widths and positioning of various doping regions.

The present invention provides an ESD protection circuit electrically connected between a high voltage power line and a low voltage power line, and the ESD protection circuit includes a bipolar junction transistor (BJT) and a trigger source. A collector of the BJT is electrically connected to the high voltage power line, and an emitter and a base of the BJT are electrically connected to the low voltage power line. The trigger source is electrically connected between the base of the BJT and the high voltage power line.