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55results about How to "Reduce opening width" patented technology

Air conditioner

Provided is an air conditioner, which is constituted such that a plurality of left and right blades disposed at the blowout ports of an indoor equipment can be controlled independently for a plurality of blocks, and such that the area to be air-conditioned is divided into a plurality of areas by a plurality of human body sensors, and which is equipped with a control device for controlling the left and right blades independently for the individual blocks in accordance with the reaction results of the human body sensors. On the basis of at least one of the area characteristics indicating the frequency, which is decided by accumulating the reaction results of the human body sensors a predetermined number of times and which indicates the presence of a person in each of the areas, the personalactivity in the personal presence area, and the adjacency of the personal absence area to the personal presence area, the control device can control the left and right blades thereby to change the opening ratio of the blowout ports to the plural areas.
Owner:PANASONIC CORP

Method for manufacturing liquid discharge head substrate

To provide a manufacturing method, for a liquid discharge head substrate that includes a silicon substrate in which a liquid supply port is formed, includes the steps of: preparing the silicon substrate, on one face of which a mask layer, in which an opening has been formed, is deposited; forming a first recessed portion in the silicon substrate, so that the recessed portion is extended through the opening from the one face of the silicon substrate to the other, reverse face of the silicon substrate; forming a second recessed portion by performing wet etching for the substrate, via the first recessed portion, using the mask layer; and performing dry etching for the silicon substrate in a direction from the second recessed portion to the other face.
Owner:CANON KK

Compound semiconductor device and method of manufacturing the same

There are provided a compound semiconductor device having a semiconductor multilayered structure, and a method of manufacturing the same. The semiconductor multilayered structure consists of a first recess etching stopper formed on a conductive layer of a compound semiconductor, a first semiconductor layer formed on the first recess etching stopper layer, a second recess etching stopper layer formed on the first semiconductor layer, and a second semiconductor layer formed on the second recess etching stopper layer.
Owner:NEC CORP

Substrate processing method

A substrate processing method that forms an opening, which has a size that fills the need for downsizing a semiconductor device and is to be transferred to an amorphous carbon film, in a photoresist film of a substrate to be processed. Deposit is accumulated on a side wall surface of the opening in the photoresist film using plasma produced from a deposition gas having a gas attachment coefficient S of 0.1 to 1.0 so as to reduce the opening width of the opening.
Owner:TOKYO ELECTRON LTD

Lateral magnetic flux motor

The invention provides a lateral magnetic flux motor, and the motor comprises a stator, a first rotor and a second rotor, wherein the stator comprises a stator yoke, a plurality of first stator teethand a plurality of second stator teeth. The stator yoke is formed by the axial stacking of a plurality of stator yoke punching sheets, and each of the first stator teeth and each of the second statorteeth are each composed of a plurality of identically-shaped stator tooth punching sheets which are stacked in a radial direction. The first stator teeth and the first stator teeth are fixed at two sides of the stator yoke in the axial direction. The first rotor and the second rotor are respectively disposed at two sides of the stator in the axial direction, and the first rotor includes a first back iron and a plurality of first permanent magnets that are magnetized in the axial direction. The second rotor includes a second back iron and a plurality of second permanent magnets that are magnetized in the axial direction. The first permanent magnet and the second permanent magnet are in mirror symmetry. The magnetic flux motor provided by the invention not only simplifies the production process, but also improves the power density of the motor; by designing a lateral magnetic circuit structure, the motor achieves the electrical and magnetic decoupling, and the groove area is no longer restricted by a magnetic load.
Owner:HUAIAN WELLING MOTOR MFG +1

Power conversion device

Flux concentration cores that encircle bus bars are arranged at different heights. When viewed from an extending direction (a Z-direction) of the bus bars, the first flux concentration core and the second flux concentration core that are adjacent to one another partially overlap each other, and the second flux concentration core and the third flux concentration core that are adjacent to each other partially overlap each other. Therefore, the flux concentration cores are able to be arranged around the bus bars even when the spaces between the bus bars are narrow.
Owner:TOYOTA JIDOSHA KK +1

Driving belt and manufacturing method thereof

A driving belt in which elements may be engaged easily with a hoop, and a manufacturing method thereof. Element includes a first element as a standard element and a second element to be inserted between the adjacent first elements in a final phase of assemble. The second element includes a second saddle surface, and pillars erected on each width end of the second saddle surface. An opening width between the pillars is wider than the width of the hoop. The second element is provided with at least one of a second boss fitted into the first dimple of the first element, and a second dimple fitted onto the first boss of the first element.
Owner:TOYOTA JIDOSHA KK

Substrate processing method

A substrate processing method performs a processing on a wafer W having an amorphous carbon film 51, a SiON film 52, a BARC film 53 and a photoresist film 54 formed on top of each other in sequence. In the substrate processing method, a shrinking-etching process and a non-uniformity-suppressing process are performed as a single process. The shrinking-etching process etches the SiON film 52 on bottom portions of openings 55 of the photoresist film 54 while reducing CD values of the openings 55 by plasma generated from a gaseous mixture of a CHF3 gas, a CF3I gas, a H2 gas and a N2 gas. The non-uniformity-suppressing process suppresses non-uniformity in the CD values by facilitating deposition of deposits on sidewall surfaces of the openings 55.
Owner:TOKYO ELECTRON LTD

Cargo ship

A cargo ship wherein a second deck 3 divides upper holds 2 and lower holds 1, openings of the second deck 3 are provided with pontoon hatch covers, and the upper holds 2 are provided with hatches 6. Hold-providing decks 14 are installed above the second deck 3 on the right and left sides of the upper holds 2 to provide two-storied deck holds 20, or first deck holds 21 and second deck holds 22. Each hold-providing deck 14 is supported by pillars 13 which are installed, on side walls of the deck holds provided by said hold-providing deck, at intervals in a longitudinal direction of the cargo ship, said side walls of said deck holds being those not along the ship's side, but along the upper holds 2. The pillars 13 are of fixed and movable types.
Owner:SHIN KURUSHIMA DOCKYARD CO LTD +1

Book block clamp

The invention relates to a book block clamp (1) for clamping and transporting book blocks (2) in book block processing machines, comprising an inner clamping jaw (5) and comprising an outer clamping jaw (6) which is arranged parallel to, and movable in relation to, said inner clamping jaw (5). A support element (20) is associated with the outer clamping jaw (6), which support element (20) can be moved into a position that is spaced apart in parallel in relation to the outer clamping jaw (6), as a result of which the opening width of the book block clamp (1) is reduced, while the distance between the inner and the outer clamping jaw (5, 6) remains unchanged. By separately controlling the opening width, reliable and impeccable guidance, in particular of unstable layers and / or folded sections of unbound book blocks (2), becomes possible, while the opening- and / or closing movement of the outer clamping jaw (6) continues to be controlled by way of a fixed greater actuating stroke, and is thus free of any jerking or jolting.
Owner:KOLBUS

Fertilizer bucket of fertilizer applicator and fertilizer applicator

The invention relates to a fertilizer bucket of a fertilizer applicator, a fertilizer application amount control device is arranged at a feed opening of the fertilizer bucket, the fertilizer application amount control device comprises a fertilizer application amount adjusting plate and an adjusting plate base, the adjusting plate base is mounted at a side edge of the feed opening and is parallel with an opening end face of the feed opening, the fertilizer application amount adjusting plate area is no less than the opening area of the feed opening, and the fertilizer application amount adjusting plate is arranged on the adjusting plate base and can slide along the adjusting plate base to the feed opening. The beneficial effects of the fertilizer bucket are that: the fertilizer application amount adjusting plate is arranged on the adjusting plate base and can slide along the adjusting plate base to the feed opening, so that the opening width of the feed opening is narrowed, or even the feed opening is shut down, and different fertilizer application amounts can be to controlled through control of the section of the feed opening.
Owner:张培坤

Display device

The embodiment of the invention discloses a display device, which comprises a flexible display panel, a first supporting film, a second supporting film and a buffer layer, and is characterized in thatthe first supporting film and the second supporting film are arranged in a direction perpendicular to a plane where a first area is located, and the distance between the end, close to the third area,of the first supporting film and the end, close to a third area, of the second supporting film is not larger than the sum of the thickness of the first supporting film, the thickness of the second supporting film and the thickness of the buffer layer, that is to say, the distance between the end, close to the third area, of the first supporting film and the end, close to the third area, of the second supporting film is smaller than or equal to the sum of the thickness of the first supporting film, the thickness of the second supporting film and the thickness of the buffer layer, so that whileit is guaranteed that bending damage does not occur to the bending area, by reducing the curvature radius of the bending area, the opening width of the display device is reduced, and then the displaydevice has a small frame area.
Owner:XIAMEN TIANMA MICRO ELECTRONICS

Grommet

A grommet includes a wire passage supporting a wire harness, a pinch-grip, and a connector. The pinch-grip is fixable to a vehicle body panel by pinching a peripheral edge of the panel surrounding a through-hole. The connector has an annular shape having a curved portion recessed to an inner periphery, the recessed portion extending in a peripheral direction. One end of the connector is joined to the wire passage and the other end is joined to the pinch-grip.
Owner:SUMITOMO WIRING SYST LTD

Device and method for taking over flexible, flat objects

A device and a method for taking over flexible, two-dimensional objects (100), in particular printed products, at a take-over location (S1). The objects (100) are received by receiver units (10, 12). Controllable narrowing elements (20) are present, in order to prevent a squashing and rebounding of the objects (100) on or from an abutment of the receiver unit (10, 12), with which narrowing elements, in an active condition, the opening width (W2) of the receiver unit (10, 12) in a middle region between an entry opening (16) of the receiver unit (10, 12) and the abutment (15), may be reduced compared to an inactive condition. These are controlled with a control device (30). A more reliable positioning of the objects (100) in the receiver unit (10, 12), in particular at high feed speeds and with thin, elastically deformable objects (100), may be achieved.
Owner:FERAG AG

Door panel structure and method of producing the same

ActiveUS20080073932A1Reducing opening width can be eliminatedLow production costVehicle sealing arrangementsMonocoque constructionsFace sheetFlange
A door panel structure including a door panel and a door waist reinforcement connected to the door panel. The door waist reinforcement includes an inner reinforcement and an outer reinforcement. The door panel and the door waist reinforcement have respective upper end portions which form a waist flange to which a weather strip is fitted. The waist flange includes a plurality of connecting portions at which the upper end portion of the door panel and the upper end portion of the door waist reinforcement are connected to each other, and at least one spaced portion at which the upper end portion of the door panel and the upper end portion of the door waist reinforcement are spaced from each other.
Owner:NISSAN MOTOR CO LTD

Method of manufacturing substrate for liquid discharge head

Provided is a method of manufacturing a substrate for a liquid discharge head including a first face, energy generating elements which generate the energy to be used to discharge a liquid to a second face opposite to the first face, and liquid supply ports for supplying the liquid to the energy generating elements. The method includes preparing a silicon substrate having, at the first face, an etching mask layer having an opening corresponding to a portion where the liquid supply ports are to be formed, and having first recesses provided within the opening, and second recesses provided in the region of the second face where the liquid supply ports are to be formed, the first recesses and the second recesses being separated from each other by a portion of the substrate; and etching the silicon substrate by crystal anisotropic etching from the opening of the first face to form the liquid supply ports.
Owner:CANON KK

Substrate etching method and corresponding processing device

The invention provides a substrate etching method. The method is performed in a plasma processing device. A substrate etched by the substrate etching method comprises a photoresist mask layer, a dielectric anti-reflection layer, a carbon hard mask layer, and a silicon oxide layer, wherein the carbon hard mask layer below the dielectric anti-reflection layer is etched with a patterned dielectric anti-reflection layer as a mask so as to form a patterned carbon hard mask layer, the plasma processing device comprises an RF source power source and an RF bias power source, the RF bias power source outputs an RF signal with frequency greater than 2MHZ when the dielectric anti-reflection layer is etched, so as to monitor etching process, when etching of the dielectric anti-reflection layer is completed, an output frequency of the RF bias power source is switched to less than 2MHZ, so as to realize etching of the carbon hard mask layer. The method has the advantages of ensuring that an etchinghole wall of the carbon mask layer is vertical and lowering opening width of an etching hole.
Owner:ADVANCED MICRO FAB EQUIP INC CHINA
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