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32results about How to "Property variation" patented technology

Semiconductor device and method for manufacturing the same

A semiconductor device which does not reduce writing property of a memory element and a method for manufacturing the same are proposed even in the case of forming a silicon film at a step portion formed by a surface of a substrate and a wiring formed over the substrate. The semiconductor device includes a plurality of the memory elements comprising a first electrode formed over a substrate having an insulating surface, sidewall insulating layer formed on side surface of the first electrode, a silicon film formed to cover the first electrode and the sidewall insulating layer, and a second electrode formed over the silicon film, and at least one of the first electrode and the second electrode is formed with a material being capable of being alloyed with the silicon film.
Owner:SEMICON ENERGY LAB CO LTD

Light-emitting element and display device having the light-emitting element

Disclosed is a light-emitting element including a reflective electrode, a light-transmitting electrode over the reflective electrode, a partition wall over the light-transmitting electrode, the partition wall having a first opening and a second opening which overlap with the light-transmitting electrode, an electroluminescence layer over the first opening and the second opening, and an opposing electrode over the electroluminescence layer. A thickness of the light-transmitting electrode in a region overlapping with the first opening is smaller than a thickness of the light-transmitting electrode in a region overlapping with the second region.
Owner:JAPAN DISPLAY INC
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