A cleaning device capable of eliminating the organic material attached to a
mask consisting of metallic film is provided with a first rinse bath and a second rinse bath (21, 22), a vacuum still (30), a first cooler (31), a first
backflow tube (101), a first wash tank and a second wash tank (51, 52), a non-pressurized distiller (60), a second cooler (61) and a second
backflow tube (102), wherein the rinse baths (21, 22) clean the
mask (10) by means of preselected rinse solution; the vacuum still (30) completes
vacuum distillation of the rinse solution in the rinse baths (21, 22); the first cooler (31) cools down the vacuum-distilled rinse solution to
room temperature; the first
backflow tube (101) ensures that the rinse solution cooled down by the first cooler (31) flows back to the second rinse bath (22); the wash tanks (51, 52) wash the
mask (10) by means of preselected rinse solution; the non-pressurized distiller (60) completes the
distillation of the rinse solution in the wash tanks (51, 52) under ordinary pressure; the second cooler (61) cools down the atmospheric-distilled rinse solution to
room temperature; moreover, the second backflow tube (102) ensures that the rinse solution cooled down by the second cooler (61) flows back to the second wash tank (52).