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Cleaning apparatus

A cleaning device and cleaning liquid technology, which are applied in the directions of cleaning flexible objects, cleaning methods and utensils, cleaning methods using liquids, etc., can solve the problems of inability to use semiconductor process lithography technology, etc., to suppress the reduction of precision and avoid cost increase. Great, the effect of suppressing environmental pollution

Active Publication Date: 2006-03-15
SANYO ELECTRIC CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the lithography technology of the semiconductor process cannot be used

Method used

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Embodiment Construction

[0071] Next, a cleaning device according to an embodiment of the present invention will be described. The mask as the object to be cleaned is the same as in the Figure 15 to Figure 17 The same mask 10 used in the conventional evaporation step is shown. That is, the mask is composed of a metal thin film in which holes 11 of approximately several microns in length and width are formed along a predetermined pattern for forming an organic material. The metal thin film is made of, for example, nickel (Ni) and iron (Fe). In addition, a metal frame 12 made of nickel (Ni) and iron (Fe) is fixed to the edge of the mask. The metal frame 12 has a locking portion 13 . Hereinafter, the mask 10 fixed to the metal frame 12 is simply referred to as "mask 10".

[0072] The cleaning device of this embodiment is to remove the mask 10 attached to the metal thin film for vapor deposition in the vapor deposition step of vapor-depositing the organic material for organic EL on the insulating subs...

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Abstract

A cleaning device capable of eliminating the organic material attached to a mask consisting of metallic film is provided with a first rinse bath and a second rinse bath (21, 22), a vacuum still (30), a first cooler (31), a first backflow tube (101), a first wash tank and a second wash tank (51, 52), a non-pressurized distiller (60), a second cooler (61) and a second backflow tube (102), wherein the rinse baths (21, 22) clean the mask (10) by means of preselected rinse solution; the vacuum still (30) completes vacuum distillation of the rinse solution in the rinse baths (21, 22); the first cooler (31) cools down the vacuum-distilled rinse solution to room temperature; the first backflow tube (101) ensures that the rinse solution cooled down by the first cooler (31) flows back to the second rinse bath (22); the wash tanks (51, 52) wash the mask (10) by means of preselected rinse solution; the non-pressurized distiller (60) completes the distillation of the rinse solution in the wash tanks (51, 52) under ordinary pressure; the second cooler (61) cools down the atmospheric-distilled rinse solution to room temperature; moreover, the second backflow tube (102) ensures that the rinse solution cooled down by the second cooler (61) flows back to the second wash tank (52).

Description

technical field [0001] The present invention relates to a cleaning device, and more particularly to a cleaning device for removing organic material adhering to a mask made of a metal thin film in a vapor deposition step of an organic material for organic EL. Background technique [0002] In recent years, organic EL display devices using organic electroluminescent (Electro Luminescence: hereinafter referred to as "organic EL") components have replaced CRT and LCD display devices and have been attracting attention. An organic EL display device of a thin film transistor (Thin Film Transistor: hereinafter referred to as "TFT") of an EL device. [0003] The organic EL components are sequentially stacked to form: the anode formed by transparent electrodes such as ITO (Indium Tin Oxide) and the like; the anode formed by MTDATA (4,4-bis(3-methylphenylaniline) A hole-transporting layer composed of a first hole-transporting layer such as TPD (4,4,4-tris(3-methylphenylanilino)tripheny...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/22C23C14/12
CPCB01D3/10B08B3/08B08B11/02B01D3/00B08B3/06B08B3/14
Inventor 木野村芳孝平冈照雄大川光治郎
Owner SANYO ELECTRIC CO LTD
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