The present invention belongs to the integration circuit technology field, and provides an integration solenoid double-layer magnetic film
inductor and a preparation method thereof. The objective of the invention is to further improve
inductor inductance value density and reduce substrate loss. The present invention comprises a
silicon substrate, a lower layer of
magnetic core film, a deeply buried layer, a lower layer of coils, an
insulation layer, an upper layer of
magnetic core film, an
insulation layer and an upper layer of coils; the lower layer of
magnetic core film is arranged on the
silicon substrate, the
silicon substrate is covered with the deeply buried layer, the deeply buried layer is configured to deeply bury the lower layer of magnetic core film, the upper surface of the deeply buried layer is provided with a groove of the lower layer of coils, the lower layer of coils is correspondingly arranged in the groove of the lower layer of coils; and the upper layer of magnetic core film is located on the deeply buried layer, the upper layer of coils is located on the upper layer of magnetic core film, the installation
layers are respectively arranged between the lower layer of coils and the upper layer of magnetic core film and between the upper layer of coils and the upper layer of magnetic core film for isolation, and the upper layer of coils and the lower layer of coils are conducted through a through hole. The integration solenoid double-layer magnetic film
inductor and the preparation method thereof employ a double-layer magnetic core
film structure so as to improve the
inductance value density of the inductor and reduce loss of parasitic capacitors between coils, and the preparation technology is simple, the preparation cost is low so as to facilitate industrialization production.