Integration solenoid double-layer magnetic film inductor and preparation method thereof

Abstract

The present invention belongs to the integration circuit technology field, and provides an integration solenoid double-layer magnetic film inductor and a preparation method thereof. The objective of the invention is to further improve inductor inductance value density and reduce substrate loss. The present invention comprises a silicon substrate, a lower layer of magnetic core film, a deeply buried layer, a lower layer of coils, an insulation layer, an upper layer of magnetic core film, an insulation layer and an upper layer of coils; the lower layer of magnetic core film is arranged on the silicon substrate, the silicon substrate is covered with the deeply buried layer, the deeply buried layer is configured to deeply bury the lower layer of magnetic core film, the upper surface of the deeply buried layer is provided with a groove of the lower layer of coils, the lower layer of coils is correspondingly arranged in the groove of the lower layer of coils; and the upper layer of magnetic core film is located on the deeply buried layer, the upper layer of coils is located on the upper layer of magnetic core film, the installation layers are respectively arranged between the lower layer of coils and the upper layer of magnetic core film and between the upper layer of coils and the upper layer of magnetic core film for isolation, and the upper layer of coils and the lower layer of coils are conducted through a through hole. The integration solenoid double-layer magnetic film inductor and the preparation method thereof employ a double-layer magnetic core film structure so as to improve the inductance value density of the inductor and reduce loss of parasitic capacitors between coils, and the preparation technology is simple, the preparation cost is low so as to facilitate industrialization production.

Description

Technical field [0001] The invention belongs to the field of integrated circuit technology, and specifically relates to an integrated solenoid type double-layer magnetic film inductor and a preparation method thereof, which are used for improving the inductance density and quality factors. Background technique [0002] Inductance is one of the three major passive devices (inductance, resistance, and capacitance), and has an important position in RFIC circuits, but its integration has become a bottleneck restricting RFIC integration. At present, many well-known international companies and scientific research institutions such as Intel, IBM, Tyndall National Laboratory of Ireland, Ferric Company of the United States, Stanford University, etc. have introduced magnetic core films into inductors to increase the inductance density. The high-frequency performance of the magnetic cores is directly Determine the performance of the inductor. [0003] From the current research situation, the...

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Problems solved by technology

The defects in this structure are as follows: first, the lower layer coil is too close to the silicon substrate, and due to the high dielectric loss of semiconductor silicon, parasitic capacitance is formed in the high frequency band, resulting in a large substrate loss; second, in the preparation process , the polishing process is too close to the surface of the lower coil, which is very easy to cause damage to the lower coil; third, the structure uses a single-layer magnetic core film, and the increase in inductance density is still limited

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