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31results about How to "Altered solubility" patented technology
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Diffraction unlimited photolithography
InactiveUS20120092632A1Altered solubilityInhibitionPhotosensitive materialsPhotomechanical exposure apparatusSolubilityWavelength
Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also illuminated with a second optical pattern at a second wavelength of light. The second wavelength of light hinders the ability of the first wavelength of light to alter the solubility of the photoresponsive organic material where the second optical pattern overlaps the first optical pattern. The photoresponsive organic material is then developed.
Owner:UNIV OF COLORADO THE REGENTS OF
Novel phosphorus-containing thyromimetics
InactiveUS20060046980A1Good curative effectDecreasing non-liver toxicityBiocideSenses disorderCoronary heart diseaseProdrug
The present invention relates to compounds of phosphonic acid-containing T3 mimetics and monoesters thereof, stereoisomers, pharmaceutically acceptable salts, co-crystals, and prodrugs thereof and pharmaceutically acceptable salts and co-crystals of the prodrugs, as well as their preparation and uses for preventing and / or treating metabolic diseases such as obesity, NASH, hypercholesterolemia and hyperlipidemia, as well as associated conditions such as atherosclerosis, coronary heart disease, impaired glucose tolerance, metabolic syndrome x and diabetes.
Owner:METABASIS THERAPEUTICS INC
Novel 2'-c-methyl and 4'c-methyl nucleoside derivatives
InactiveUS20090118223A1Improve efficacyImprove securityBiocideSugar derivativesHepatitis c viralPhosphoric acid
Novel 2′-C-methyl nucleoside 5′-monophosphate and 4′-C-methyl nucleoside 5′-monophosphate derivatives, stereoisomers, and pharmaceutically acceptable salts or prodrugs thereof, their preparation, and their uses for the treatment of hepatitis C viral infection are described.
Owner:METABASIS THERAPEUTICS INC +1
Novel 2'-C-methyl nucleoside derivatives
InactiveUS20050182252A1Improve drug efficacyImprove securitySugar derivativesAntiviralsHepatitis c viralStereoisomerism
Compounds of Formula I, stereoisomers, and pharmaceutically acceptable salts or prodrugs thereof, their preparation, and their uses for the treatment of hepatitis C viral infection are described:
Owner:METABASIS THERAPEUTICS INC
Ph-sensitive sacrificial materials for the microfabrication of structures
ActiveUS20130066045A1High removal rateAltered solubilityShellac coatingsPharmaceutical delivery mechanismSolubilityPorosity
Methods for microfabricating composite materials and composite materials prepared there from are described herein. The sacrificial material can be etched or patterned to create a two-dimensional and / or three-dimensional sacrificial material structure. The resulting sacrificial material structure can be embedded in one or more embedding materials. The sacrificial material(s) are materials whose solubility can be altered by application of a stimulus typically pH, and / or temperature, light, pH, pressure, presence of absence of ions, and combinations thereof. The embedding materials can contain one or more additives that modify one or more properties of the embedding materials, such as degradation properties, porosity, mechanical properties, viscosity, conductive properties, and combinations thereof. The composite materials can be used in tissue engineering, drug screening, toxin detection, drug delivery, filtrations, bioseparations, and as microfluidic devices for fluid mixing and structural repair.
Owner:MASSACHUSETTS INST OF TECH +1
Waveguide compositions and waveguides formed therefrom
ActiveUS7072565B2Altered solubilityIncrease flexibilityMaterial nanotechnologyOptical fibre with graded refractive index core/claddingSolubilityVinyl ether
Provided are compositions which include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from epoxides, oxetanes, vinyl ethers and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
Owner:ROHM & HAAS ELECTRONICS MATERIALS LLC
Waveguide compositions and waveguides formed therefrom
ActiveUS20050141839A1Altered solubilityIncrease flexibilityOptical fibre with graded refractive index core/claddingPhotosensitive materialsSolubilityThiol
Provided are compositions suitable for use in forming a flexible optical waveguide. The compositions include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from hydroxy, amino, thiol, sulphonate ester, carboxylate ester, silyl ester, anhydride, aziridine, methylolmethyl, silyl ether, and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
Owner:ROHM & HAAS ELECTRONICS MATERIALS LLC
Novel Phosphorus-Containing Thyromimetics
InactiveUS20100081634A1Optimize allocationIncreasing oral bioavailability and sustained deliveryBiocideSenses disorderDiseaseCoronary heart disease
The present invention relates to compounds of phosphonic acid-containing T3 mimetics and monoesters thereof, stereoisomers, pharmaceutically acceptable salts, co-crystals, and prodrugs thereof and pharmaceutically acceptable salts and co-crystals of the prodrugs, as well as their preparation and uses for preventing and / or treating metabolic diseases such as obesity, NASH, hypercholesterolemia and hyperlipidemia, as well as associated conditions such as atherosclerosis, coronary heart disease, impaired glucose tolerance, metabolic syndrome x and diabetes.
Owner:METABASIS THERAPEUTICS INC
Waveguide compositions and waveguides formed therefrom
ActiveUS7072563B2Altered solubilityIncrease flexibilityOptical fibre with graded refractive index core/claddingOptical fibre with multilayer core/claddingSolubilitySilylene
Owner:ROHM & HAAS ELECTRONICS MATERIALS LLC
Treatment of Metakaolin
InactiveUS20080264295A1High whitenessReduce the impactPigmenting treatmentPaper coatingMedicineMetakaolin
A method for increasing the brightness of metakaolins comprises calcining a metakaolin under reducing conditions. The calcined metakaolins are suitable for use in a variety of applications including in polymer products and paints.
Owner:IMERYS MINERALS
Delivery of nucleic acid
Disclosed are various compositions for use in the delivery of nucleic acid to a target cell including: a composition comprising a calcium salt in particulate form, the nucleic acid to be delivered, and one or more further components to enhance the efficiency of delivery of the nucleic acid to a target cell, the nucleic acid and the one or more further components being complexed with the particulate calcium salt; and methods of delivering a nucleic acid to a target cell.
Owner:MAYO FOUND FOR MEDICAL EDUCATION & RES
Waveguide compositions and waveguides formed therefrom
ActiveUS20050244124A1Improve flexibilityAlter solubilityMaterial nanotechnologyOptical fibre with graded refractive index core/claddingChemistryEpoxide
Provided are compositions which include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from epoxides, oxetanes, vinyl ethers and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
Owner:ROHM & HAAS ELECTRONICS MATERIALS LLC
Modified proteins of the TGF-β superfamily, including morphogenic proteins
InactiveUS6846906B1Improve biological activityAltered biological activityPeptide/protein ingredientsAntibody mimetics/scaffoldsADAMTS ProteinsMorphogenesis
Owner:MARIEL THERAPEUTICS
Ph-sensitive sacrificial materials for the microfabrication of structures
ActiveUS9458357B2High removal rateAltered solubilityShellac coatingsPharmaceutical delivery mechanismSolubilityPorosity
Methods for microfabricating composite materials and composite materials prepared there from are described herein. The sacrificial material can be etched or patterned to create a two-dimensional and / or three-dimensional sacrificial material structure. The resulting sacrificial material structure can be embedded in one or more embedding materials. The sacrificial material(s) are materials whose solubility can be altered by application of a stimulus typically pH, and / or temperature, light, pH, pressure, presence of absence of ions, and combinations thereof. The embedding materials can contain one or more additives that modify one or more properties of the embedding materials, such as degradation properties, porosity, mechanical properties, viscosity, conductive properties, and combinations thereof. The composite materials can be used in tissue engineering, drug screening, toxin detection, drug delivery, filtrations, bioseparations, and as microfluidic devices for fluid mixing and structural repair.
Owner:MASSACHUSETTS INST OF TECH +1
Novel 2'-C-methyl nucleoside derivatives
ActiveUS20070042989A1Improve efficacyImprove securityBiocideSugar derivativesHepatitis c viralStereoisomerism
Compounds of Formula I, stereoisomers, and pharmaceutically acceptable salts or prodrugs thereof, their preparation, and their uses for the treatment of hepatitis C viral infection are described:
Owner:METABASIS THERAPEUTICS INC
Optical disk
InactiveUS20060046009A1Excellent recording characteristicAltered solubilityLayered productsRecord information storageLow speedSolvent
An optical disk having excellent recording characteristics at both low speed and high speed is provided by modifying a cyanine dye serving as a material of a recording layer such that the cyanine dye does not excessively remain in a groove in an optically transparent substrate. The optical disc comprises the recording layer on a surface of the optically transparent substrate, a reflective layer on the recording layer, and a protective layer on the reflective layer, wherein the recording layer contains at least one cyanine dye expressed by the following chemical formula I: wherein, R1, R2 R3, R4, R5, and R6 are hydrocarbon groups, and A and B are independently a fused benzene ring or a fused naphthalene ring optionally having a substituent, and wherein the recording layer is formed by applying the at least one cyanine dye in a fluoroalcohol solvent to the optically transparent substrate.
Owner:TDK CORPARATION
Novel Phosphorus-Containing Thyromimetics
ActiveUS20090118236A1Optimize allocationImprove bioavailabilityBiocideSenses disorderDiseaseIGT - Impaired glucose tolerance
Owner:METABASIS THERAPEUTICS INC
Novel Thiazole Inhibitors of Fructose 1,6-Bishosphatase
InactiveUS20070225259A1Disease reliefPrevent diseaseBiocideOrganic active ingredientsThiazoleEnzyme inhibitor
Owner:METABASIS THERAPEUTICS INC
Underlayer Material for Photoresist
ActiveUS20200333710A1Light reflectivity is minimizedImprove etch selectivitySemiconductor/solid-state device manufacturingPhotomechanical coating apparatusPhotoresistHard mask
A method includes providing a layered structure on a substrate, the layered structure including a bottom layer formed over the substrate, a hard mask layer formed over the bottom layer, a material layer formed over the hard mask layer, and a photoresist layer formed over the material layer, exposing the photoresist layer to a radiation source, developing the photoresist layer, where the developing removes portions of the photoresist layer and the material layer in a single step without substantially removing portions of the hard mask layer, and etching the hard mask layer using the photoresist layer as an etch mask. The material layer may include acidic moieties and / or acid-generating molecules. The material layer may also include photo-sensitive moieties and crosslinking agents.
Owner:TAIWAN SEMICON MFG CO LTD
Functional hydrogen silsesquioxane resins and the use thereof
PendingUS20220162391A1Improve solubilityAltered solubilitySemiconductor/solid-state device manufacturingNon-conductive material with dispersed conductive materialOptical radiationSilsesquioxane
Carbon-carbon unsaturated bond containing, halogen containing, and solubility-enhancer containing coatings on semiconductor substrates for forming patterns thereon. The present coatings can be produced by coating of semiconductor substrates with carbon-carbon unsaturated bond-containing, halogen-containing, and solubility-enhancer containing polyhydrogensilsesquioxane resin solutions. Provided herein is also a method for patterning substrate coating of a polyhydrogensilsesquioxane containing a carbon-carbon unsaturated bond, halogen, and solubility-enhancer with radiation of light, the method comprising the steps of irradiating a coated substrate along a selected pattern to form an irradiated structure with a region of irradiated coating and a region with un-irradiated coating and selectively developing the irradiated structure to remove a substantial portion of the un-irradiated coating to form a patterned substrate.
Owner:PIBOND OY
Underlayer material for photoresist
ActiveUS11269256B2Light reflectivity is minimizedImprove etch selectivitySemiconductor/solid-state device manufacturingPhotomechanical coating apparatusPhotoresistMaterials science
A method includes providing a layered structure on a substrate, the layered structure including a bottom layer formed over the substrate, a hard mask layer formed over the bottom layer, a material layer formed over the hard mask layer, and a photoresist layer formed over the material layer, exposing the photoresist layer to a radiation source, developing the photoresist layer, where the developing removes portions of the photoresist layer and the material layer in a single step without substantially removing portions of the hard mask layer, and etching the hard mask layer using the photoresist layer as an etch mask. The material layer may include acidic moieties and / or acid-generating molecules. The material layer may also include photo-sensitive moieties and crosslinking agents.
Owner:TAIWAN SEMICON MFG CO LTD
Peptide analogues with branched amino acid probe(s)
ActiveUS20190030115A1Add featureImprove propertiesAntibacterial agentsNervous disorderAmino acidPeptide
The present invention relates to peptide analogues comprising one or more branched amino acid probes and a peptide, native or variants thereof.
Owner:TXP PHARMA
Negative photoresist composition for KrF laser for forming semiconductor patterns
ActiveUS10162261B2High transparencyEnhance the imagePhotosensitive materials for photomechanical apparatusResistImage resolution
Owner:YCCHEM CO LTD
Negative photoresist composition for krf laser for forming semiconductor patterns
ActiveUS20180203351A1High transparencyEnhance the imagePhotosensitive materials for photomechanical apparatusResistImage resolution
Provided is a negative photoresist composition for a KrF laser for semiconductor pattern formation, which includes a predetermined compound in order to improve the properties of a conventional negative photoresist, thereby realizing high transparency, high resolution and an excellent profile, even in the presence of an exposure source having a short wavelength compared to the conventional negative photoresist, and is thus suitable for use in semiconductor processing.
Owner:YCCHEM CO LTD
Novel Thiazole Inhibitors of Fructose 1,6-bisphosphatase
InactiveUS20080070868A1Increasing gluconeogenesisHigh outputBiocideOrganic active ingredientsThiazoleProdrug
Owner:METABASIS THERAPEUTICS INC
Biomimetic Coating Method
InactiveUS20100316787A1Altered solubilitySufficient timeStentsPharmaceutical containersModified methodSolvent
A modified method of preparing and applying a biomimetic coating to a medical device substrate surface is described. The modified biomimetic coating method utilizes a solvent mixture of water and an organic water miscible solvent that results in a more efficient coating process, reducing the time required to apply a sufficiently adherent biomimetic coating.
Owner:WILSON GREATBATCH LTD
Process sequence for reducing pattern roughness and deformity
ActiveUS9097977B2Reduce defectsReduce deformityPhotoprinting processesSemiconductor/solid-state device manufacturingChemical treatmentSolubility
A method for patterning a substrate with reduced defectivity is described. Once a pattern is formed in a layer of radiation-sensitive material using lithographic techniques, the pattern formed on the substrate is post-treated. The post-treating of the pattern in the layer of radiation-sensitive material is performed to reduce a roughness of the pattern. The post-treating includes performing a treatment process on the pattern to alter a solubility of an exposed surface of the pattern, wherein the treatment process involves performing a first chemical treatment of the pattern using a liquid-phase chemical solution containing a first surfactant, or exposing said pattern to second EM radiation different than said first EM radiation. Following the treatment process, the post-treating includes hard baking the pattern, and performing a second chemical treatment of the pattern using a vapor-phase chemical solution to reduce the roughness.
Owner:TOKYO ELECTRON LTD
Process sequence for reducing pattern roughness and deformity
ActiveUS20130309615A1Reduce defectivityReduce pattern collapse and pattern deformityPhotoprinting processesSemiconductor/solid-state device manufacturingSolubilityVapor phase
A method for patterning a substrate with reduced defectivity is described. Once a pattern is formed in a layer of radiation-sensitive material using lithographic techniques, the pattern formed on the substrate is post-treated. The post-treating of the pattern in the layer of radiation-sensitive material is performed to reduce a roughness of the pattern. The post-treating includes performing a treatment process on the pattern to alter a solubility of an exposed surface of the pattern, wherein the treatment process involves performing a first chemical treatment of the pattern using a liquid-phase chemical solution containing a first surfactant, or exposing said pattern to second EM radiation different than said first EM radiation. Following the treatment process, the post-treating includes hard baking the pattern, and performing a second chemical treatment of the pattern using a vapor-phase chemical solution to reduce the roughness.
Owner:TOKYO ELECTRON LTD
Negative photoresist composition for KRF laser, having high resolution and high aspect ratio
ActiveUS10775699B2High strengthHigh resolutionPhotosensitive material processingPhotosensitive materials for photomechanical apparatusImage resolutionPhysical chemistry
Owner:YCCHEM CO LTD
Chemically amplified positive photoresist composition for improving pattern profile
PendingUS20210216013A1Increase process marginHigh sensitivityPhotosensitive materials for photomechanical apparatusPolymer sciencePolymer resin
Proposed is a photoresist composition for a KrF light source, which exhibits a vertical profile compared to conventional KrF positive photoresists by adding a resin capable of increasing transmittance in order to form a semiconductor pattern, particularly a chemically amplified positive photoresist composition for improving a pattern profile, which includes, based on the total weight of the composition, 5 to 60 wt % of a polymer resin, 0.1 to 10 wt % of a transmittance-increasing resin additive represented by Chemical Formula 1, 0.05 to 10 wt % of a photoacid generator, 0.01 to 5 wt % of an acid diffusion inhibitor, and the remainder of a solvent, thus making it possible to provide a composition exhibiting a vertical profile, enhanced sensitivity and a superior processing margin compared to conventional positive photoresists.
Owner:YOUNG CHANG CHEM
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