37results about How to "Reduced dosage requirements" patented technology

Compounds, tautomers and pharmaceutically acceptable salts of the compounds are disclosed, wherein the compounds have the structure of Formula I, as defined in the specification. Corresponding pharmaceutical compositions, methods of treatment, methods of synthesis, and intermediates are also disclosed.

Compounds and pharmaceutically acceptable salts of the compounds are disclosed, wherein the compounds have the structure of Formula (I) as defined in the specification. Corresponding pharmaceutical compositions, methods of treatment methods of synthesis, and intermediates are also disclosed.

Compounds and pharmaceutically acceptable salts of the compounds are disclosed, wherein the compounds have the structure of Formula I;as defined in the specification. Corresponding pharmaceutical compositions, methods of treatment, methods of synthesis, and intermediates are also disclosed.

The invention provides a preparation method of Mn<4+>-activated fluoride fluorescent powder. The preparation method provided by the invention does not need to form a saturated solution of A2MF6, so that the requirement of the use amount of raw materials is greatly reduced; in the preparation process, the target product can be synthesized at room temperature and is convenient to synthesize; a precipitating agent is added, so that the preparation is more convenient, the operation is simpler, the synthetic steps are simplified, and the prepared fluorescent powder has better optical properties; the fluoride fluorescent powder can be well excited by ultraviolet light to blue light, especially the blue light, and has strong red light emission, wherein the red light emission peak is in the wavelength range from 600 to 650 nm; the method has the advantages of a simple preparation process and short consumed time; and the prepared material has a high luminescence quantum yield and is suitable for industrial large-scale preparation.

The invention provides a pervious concrete which comprises the following raw materials in parts by weight: 25-30 parts of gravels being 3-6 mm, 15-25 parts of gravels being 6-10 mm, 20-35 parts of construction wastes, 16.5-20 parts of cement, 1.65-2 parts of silica fume, 1.65-2 parts of a water reducer and 5-6 parts of water, wherein the construction wastes comprise the following components in parts by weight: 5-10 parts of abandoned concrete blocks, 5-10 parts of abandoned bricks and 10-15 parts of abandoned stones. Compared with the pervious concrete using ordinary portland cement as a cementing material, adopting coarse aggregates of single size and using little or none fine aggregates, the invention studies the reasonable collocation of the content of each raw material through a plurality of experiments, thereby enabling the pervious concrete prepared by the invention to have better performances.

The invention discloses a plasma exchanging adsorption filtration purification system provided with a plasma storage bag and an application method of the purification system. The method includes two steps of plasma components separation returning cycle and high-speed plasma purification regeneration cycle. Plasma components are separated by a selective membrane plasma separator; flow speed difference between a plasma separation cycle and a plasma purification circle is set by the specific plasma storage bag; high-speed plasma adsorption filtration purification treatment is performed by a high-throughput filter and an active carbon-resin absorptive device in a purification circle; and plasma subjected to cycle treatment for multiple times can be exchanged back to a human body through the separation returning circle. By the aid of the purification system and the application method thereof, autologous plasma waste generated in a plasma exchanging purification process can be purified continuously and effectively, and plasma consumption is reduced. The high-throughput filter and an adsorption column are connected in series to purify the plasma; load on a subsequent adsorber is reduced; and varied inflammatory factors, macromolecular toxins and the like combined by micromolecules, middle molecules and proteins which are generated from hepatic failure are eliminated as well, so that the purification efficiency of the whole system is greatly improved.

The invention provides an on-line pH measuring device for high-temperature strong scouring neutralizing liquid, comprising: a measuring sampling cylinder, a pH meter, a pneumatic telescopic protective cover for fixing the pH meter, and a cleaning control device; the measuring and sampling cylinder is provided with a water inlet and a water outlet , test hole, cut-off hole, sewage outlet; the pH meter is fixed on the push rod of the pneumatic telescopic protective cover; There is a washing water inlet and a washing water outlet; the washing water inlet is connected to clean water through a water pipe, the washing water inlet is provided with a washing water solenoid valve, and the washing water outlet is connected to the trench through a water pipe; the cleaning control device includes a DCS control system, The DCS control system is equipped with a main control relay and a cleaning relay. The invention realizes on-line measurement of high-temperature strong scouring neutralizing liquid, has simple structure, automatic cleaning, convenient operation, less clogging, long on-line test time, stable operation, accurate measurement results, and provides convenience for environmental protection and sewage discharge.

An embodiment of the present disclosure discloses a method for fabricating a semiconductor device, including: forming a first blind hole in a first wafer; forming a first filling structure in the first blind hole; forming a cover covering the first wafer and a first mask structure of the first filling structure; wherein, the first mask structure includes a mask opening; the first wafer is etched according to the mask opening, to A second blind hole is formed in the circle; wherein, the depth of the second blind hole is different from the depth of the first blind hole; the position of the second blind hole is different from the position of the first blind hole; After the second blind via, the first mask structure and the first filling structure are removed.