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47results about How to "Difference in density" patented technology

Solid-state imaging device, method of manufacturing the same, and camera and electronic apparatus using the same

A method of manufacturing a solid-state imaging device is provided. The method includes: forming an insulating layer extending over an effective pixel region where a plurality of pixels each having a photoelectric conversion element is arranged and a peripheral area adjacent to the effective pixel region; forming an opening in the insulating layer located immediately above the photoelectric conversion element on the effective pixel region; forming a dummy opening in the insulating layer on the peripheral region; and forming a buried layer on the insulating layer to fill the opening and the dummy opening formed in the insulating layer.
Owner:SONY CORP

Operating method for starting a once-through steam generator heated using solar thermal energy

An operating method for starting a once-through steam generator heated using solar thermal energy, wherein a flow medium flowing through the once-through steam generator is evaporated and superheated, using a heat carrier medium heated in a solar array, for a steam turbine connected downstream of the once-through steam generator on the flow medium side. In an operating phase under load, a first desired steady pressure value is predetermined, and in a starting phase preceding the operating phase under load, a second desired steady pressure value is predetermined, in which starting phase evaporated flow medium is diverted around the steam turbine via a steam bypass, and controlled by the predetermined second desired steady pressure value.
Owner:SIEMENS AG

Semiconductor device and method for fabricating the same

InactiveUS20060011964A1Reduce film formation variationReduce film formation variation and polishing amount variationTransistorSolid-state devicesDielectricDevice material
In a semiconductor device of the present invention, capacitors are formed on a part of an interlayer dielectric (26) located in a memory cell area, and another interlayer dielectric (39) is formed on a part of still another interlayer dielectric (30) located in a peripheral circuit area AreaB. Furthermore, a dummy electrode is formed at the boundary AreaC between the memory cell area AreaA and the peripheral circuit area AreaB to cover one side of the another interlayer dielectric (30) and the top surface of the interlayer dielectric (26).
Owner:PANASONIC CORP

Hydroelectric device for harnessing the buoyant force of an object in a fluid

The present invention provides, in one embodiment, a device for producing electricity, the device including a housing having a volume of fluid therein, a rotor within the housing, the rotor being in fluid communication with the housing and fixedly attached to a shaft. At least one buoy is sized and shaped to move through the fluid in housing, as well as though an inlet and outlet of the housing. An electrical generator is coupled to the shaft to which the rotor is attached. When a buoy moved into the housing through the inlet, it rises in the fluid and is received by the rotor, causing the rotor to turn as the buoy continues to rise. The turning of the rotor operates the electrical generator.
Owner:COOK LARRY

Thermal printer and control method of controlling cooling fan

A color thermal printer is provided with a cooling fan for cooling a thermal head and a fan rotational speed controller for controlling the rotation speed of the cooling fan, a head temperature sensor for measuring a temperature of the thermal head and an environmental temperature sensor for measuring an environmental temperature around the thermal head. A controller predicts the head temperature in each recording position based on the printing rate (printing density) calculated from the image data, a measured temperature of the thermal head and a measured environmental temperature, and also predicts a delay time of a heat transmitting system and a measuring system based on a fluctuation of the printing rate. The controller controls an air amount of the cooling fan in each recording position based on the predicted temperature and the delay time.
Owner:FUJIFILM CORP +1

Fabrication method for improving surface planarity after tungsten chemical mechanical polishing

ActiveUS20130224949A1Improves planarity of surfaceNot affect performance of deviceSemiconductor/solid-state device detailsSolid-state devicesTungstenPhotolithography
A fabrication method for improving surface planarity after tungsten chemical mechanical polishing (W-CMP) is disclosed. The method forms contact holes and dummy patterns by performing two respective photolithography-and-etching processes to ensure that the dummy patterns have a depth smaller than that of the contact holes. Then the method fills tungsten into the contact holes and dummy patterns and removes the redundant tungsten by a W-CMP process. With such a method, difference of wiring density between areas can be reduced by the dummy patterns, and hence a better surface planarity of the contact hole layer can be achieved. Besides, as the dummy patterns are formed in a pre-metal dielectric layer and their depth is well controlled, tungsten filled in the dummy patterns will not contact with the device area below the pre-metal dielectric layer, and thus will not affect the performance of the device.
Owner:SHANGHAI HUALI MICROELECTRONICS CORP
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