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34results about How to "Characteristic is impaired" patented technology

Frame structure

The invention relates to frame structures, particularly to mobile stations and other small-sized portable devices operating at high frequencies. The frame structure according to the invention is formed by extrusion, whereby the fixing means required for fastening components are formed into it during the extrusion. Such fixing means are preferably pin-like projections which can be compressed to a rivet fixing the component. Such fixing means can also be strip-like fixing edges which are bent over the component edges. With such fixing means it is possible to form at the same time both a mechanical fixing and a good electrical contact between the component and the frame structure. During the extrusion it is also possible to fasten to the frame structure parts made of other materials, such as fixing means of other types or other components, such as antennas.
Owner:PULSE FINLAND

Complex of bi-specific antibody and digoxigenin conjugated to a therapeutic or diagnostic agent

The present invention relates to complexes of a) bi-specific antibodies and antibody fragments against a target protein and b) a digoxigenin conjugated to a therapeutic or diagnostic agent, methods for their production, their use as a delivery platform for therapeutic or diagnostic agents, pharmaceutical compositions containing said antibodies, and uses thereof.
Owner:F HOFFMANN LA ROCHE & CO AG

Field electron emission apparatus and method for manufacturing the same

To provide a method for manufacturing a high-performance field electron emission apparatus, wherein occurrence of damage to a CNT during a manufacturing step is prevented, and thereby, the CNT can adequately keep an inherent electron emission characteristic of exhibiting a large current density with a low threshold value. This method for manufacturing a field electron emission apparatus is related to the manufacture of a field electron emission apparatus using the CNT as an electron source. In the method, a protective film formation step is performed in order to form an aluminum film 4 as the protective film on the surface of the CNT film 2 during a manufacturing process of at least a part of the apparatus. The CNT surface structure is protected with this conductive protective film (aluminum film 4, 40), while the structure significantly affects the electron emission characteristic. Consequently, the electron emission characteristic inherent in the CNT can be adequately ensured and be exhibited.
Owner:NEC CORP

Drag washer of reel for fishing and reel for washing using the same

A mixture comprising 40-80 mass % of expanded graphite, 5-25 mass % of heat-resistant reinforcing fiber and 10-40 mass % of heat-resistant binder is formed into a sheet form and then cured to form a sheet. The sheet is formed into a drag washer by punching, for application to a fishing reel's drag washer.
Owner:SHIMANO INC +1

Battery module and battery pack

A battery module includes a first heat transfer component and a first thermal expansion material member that are disposed between the battery cells adjacent to each other. The first thermal expansion material member has a thermal conductivity lower than a thermal conductivity of the first heat transfer component and expands at a first predetermined temperature or higher, in which when temperature of the first thermal expansion material member is less than the first predetermined temperature, the adjacent battery cells are connected to each other via a high thermal conductive route including the first heat transfer component and having a first thermal conductivity, and in which when the temperature of the first thermal expansion material member reaches the first predetermined temperature or higher, the adjacent battery cells are connected to each other via a low thermal conductive route having a second thermal conductivity lower than the first thermal conductivity.
Owner:PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD

Semiconductor device

A semiconductor device having: a semiconductor layer; an interlayer dielectric formed on the semiconductor layer; a buffer layer formed on the interlayer dielectric; and an electrode pad formed on the interlayer dielectric, the buffer layer being formed to be covered by an edge portion of at least part of the electrode pad when viewed from a top side.
Owner:SEIKO EPSON CORP

Semiconductor device

A semiconductor device, including: a semiconductor layer having an active region; a first conductive layer formed above the semiconductor layer and having a first width; a second conductive layer connected to the first conductive layer and having a second width smaller than the first width; an interlayer dielectric formed above the semiconductor layer; an electrode pad formed above the interlayer dielectric and covering the active region when viewed from a top side; and a forbidden region provided in the semiconductor layer in a specific range positioned outward from a line extending vertically downward from an edge of at least part of the electrode pad. A connection section at which the first conductive layer and the second conductive layer are connected is not provided in the forbidden region.
Owner:SEIKO EPSON CORP
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