115 results about "Exposure Location" patented technology

In an image forming apparatus, a support frame configured to support a plurality of cartridges each including a photoconductor is allowed to be pulled out from a casing of the apparatus. A plurality of light-emitting parts configured to expose a corresponding photoconductor to light are arranged in each exposure unit which is movable between an exposure position proximate to the corresponding photoconductor and a retreating position away from the photoconductor. A pair of side plates of the support frame, which extends in a direction perpendicular to a main direction in which the light-emitting parts are arranged, has guide slots formed therein, each of which is configured to guide movement of a corresponding exposure unit between its exposure and retreating positions. Each guide slot includes a positioning portion configured to position the exposure unit in position in a subordinate direction perpendicular to the main direction and to an exposure direction.

In this exposure system, alignment marks on a photosensitive material are photographed with a reading unit. Prior to this photographing, a standard board, having detection marks at positions readable to the reading unit at preset intervals along the movement direction of the reading unit, is provided. At least one of the detection marks is photographed with the reading unit, which is arranged in a position to photograph the alignment marks provided on the photosensitive material. Calibration data is calculated based on data on the camera optical axis deviation obtained by this photographing. Standard position data reflects the calibration data, whereby calibration of the exposure position adjustment function of the exposure device is performed.

An incidence angle of laser light with respect to a photosensitive member in a main-scanning direction is different depending on an exposure position. Hence, the spot shape of the laser light on the photosensitive member is different in the main-scanning direction. A filter coefficient is changed in the main-scanning direction, and image data is corrected with the filter coefficient.

An image forming device includes a first device body, a second device body attached to the first device body, a photoconductive body provided in the first device body, an exposure unit provided to the second device body, the exposure unit having an exposure surface that exposes the photoconductive body and forms a latent image on the photoconductive body, the exposure unit being movable between an exposure position and an evacuation position, and a cleaning unit cleaning the exposure surface of the exposure unit. The cleaning unit includes a cleaning member cleaning the exposure surface, a supporting member supporting the cleaning member, and a guide member movably guiding the supporting member. The exposure unit is disposed such that the exposure surface is cleaned by the cleaning unit when the exposure unit is moved to the evacuation position.

An exposure equipment focal distance monitoring method comprises the following steps: providing a maskplate with a benchmark tag, transferring the benchmark tag onto a substrate by photoetching technique and etching technique to form a benchmark tag pattern on the substrate; providing a maskplate with a test tag; forming a photoetching adhesive layer on the substrate with the benchmark tag pattern, and transferring the test tag onto the photoetching adhesive layer by using the exposure equipment to execute the photoetching technique to form a test tag pattern; measuring offset of the test tag pattern and the benchmark tag pattern; and if the offset is not equal to the target value, judging that the exposure equipment offsets from the optimal exposure position. The method is simple in technique steps and high in measurement efficiency.

A particle beam irradiation system capable of ensuring a more uniform dose distribution at an irradiation object even when a certain time is required from output of a beam extraction stop signal to the time when extraction of a charged particle beam from an accelerator is actually stopped. The particle beam irradiation system comprises a synchrotron, an irradiation device including scanning magnets and outputting an ion beam extracted from the synchrotron, and a control unit. The control unit stops the output of the ion beam from the irradiation device in accordance with the beam extraction stop signal, controls the scanning magnets to change an exposure position in a state in which the output of the ion beam is stopped, and after the change of the exposure position, starts the output of the ion beam from the irradiation device again. The control unit further outputs a next beam extraction stop signal when an increment of dose integrated from the time of a preceding beam extraction stop signal as a start point reaches a setting dose stored in advance.

Provided is a method for controlling a keyword charge in keyword advertising, including the steps of: dividing an exposure location where a search listing abstracted by predetermined keyword search is displayed into at least one unit display zone; receiving bid price data with respect to display of the search listing in the unit display zone from a predetermined advertiser; as the step of associating a predetermined bid field with the unit display zone in response to receiving of the bid price data, recording the received bid price data in the bid field; sorting at least one bid price data recorded in the bid field on the basis of the size of the unit click cost and giving predetermined rankings to the sorted bid price data, respectively; in response to the keyword search, controlling the search listing of the bid price data at the highest ranking to be exposed in the unit display zone; and as the step of controlling a bill to be charged in accordance with a click selection by a predetermined searcher with respect to the exposed search listing, determining a charge amount generated by the click selection; wherein the charge amount is determined by referring to the unit click cost of predetermined bid price data at a lower ranking, except the bid price data at the highest ranking among the sorted bid price data.

A technique which, in forming a resist pattern on a wafer, can achieve high resolution and high in-plane uniformity of pattern line width. After forming a resist film on a wafer W and subsequently performing pattern exposure by means of a pattern exposure apparatus, the entire pattern exposure area is exposed by using a flood exposure apparatus. During the flood exposure, the exposure amount is adjusted depending on the exposure position on the wafer based on information on the in-plane distribution of the line width of a resist pattern, previously obtained from an inspection apparatus. Methods for adjusting the exposure amount include a method which adjusts the exposure amount while moving a strip-shaped irradiation area corresponding to the diameter of the wafer, a method which involves intermittently moving an irradiation area, corresponding to a shot area in the preceding pattern exposure, to adjust the exposure amount for each chip.

A length L of the test pattern string is determined so as to satisfy a condition L≦{P−(Q1+Q2)}×V, where a time Q is a total time of a time Q1 for which the test pattern string is transferred from an exposure position of the test pattern string to a sensor and a time Q2 from when the test pattern is detected by the sensor until a color misregistration correction value calculated on the basis of a result of detecting is reflected in image formation; a time P is a time from a timing of starting to write the test pattern string to a timing of starting to write an image in which the correction value should be reflected; and a driving speed of a second image carrier is V.

An image forming device includes a first device body, a second device body having a first side end and a second side end opposite to the first side end, the first side end being rotatably joined with the first device body, the second side end turning around the first side end between an opened state and a closed state, a photoconductive body provided in the first device body, an exposure unit provided to the second device body, the exposure unit having an exposure surface exposing the photoconductive body and form a latent image on the photoconductive body, and an exposure unit turning mechanism that turns the exposure unit between an exposure position where the exposure surface is directed to the photoconductive body in the closed state and an evacuation position where the exposure surface is directed to the first side end in the opened state.

An image forming apparatus capable of preventing the image formation unit from being attached to a guide member for the image formation unit mistakenly, including an apparatus body; an image carrier including a rotary shaft; an exposure device configured to form a latent image through exposure of a surface of the image carrier and retractable from an exposure position; an image formation unit disposed detachably from the apparatus body; and a guide member to guide the exposure device to the exposure position. In the optimal apparatus, the guide member is used both to guide the image formation unit to the apparatus body and to guide the exposure device to the exposure position.

The invention relates to a double-faced exposure architecture and a double-faced exposure method of a printed circuit board. The double-faced exposure architecture at least comprises an exposure frame, an aligning lens, an upper photographic plate, a lower photographic plate, a rigid clapboard and an aligning device, and the upper photographic plate and the lower photographic plate are separated by the rigid clapboard, thus avoiding scratching, and the lower photographic plate is aligned with a previously arranged exposure location of the upper photographic plate through the aligning lens, thus achieving the goal of double-faced exposure aligning of the printed circuit board.

The invention discloses a two-beam interference photoetching method and a two-beam interference photoetching system. The method comprises the following step of: realizing N times of interference exposure of two paths of beams on the surface of a processed workpiece, wherein the staggering value between two adjacent exposure positions is dI / N; N is more than or equal to 2; dI is the period of exposed light strength distribution; and the light field complex amplitude distribution after interference of the two paths of beams is a cosine function. According to the two-beam interference photoetching method disclosed by the invention, a big-width precision multi-step structure can be directly prepared on a photoresist, and the processing efficiency is high; and moreover, an adopted device is easy to obtain, and is low in cost.

An image recording device comprises a housing, a sheet cassette, a recording unit, and a convey path defining member. The housing has an opening. The sheet cassette is configured to hold therein sheets and configured to be inserted into and removed from the housing through the opening. The recording unit is configured to record an image on a sheet conveyed from the sheet cassette along a convey path. The convey path defining member is configured to pivot, about a pivot shaft supported by the housing, between a guiding position for forming a guide surface that defines a part of the convey path, and an exposing position for exposing the part of the convey path to the opening. The convey path defining member is configured to pivot in response to insertion and removal of the sheet cassette.

A system, method, and computer-readable medium having instructions stored thereon to implement a method for risk exposure management allowing an exposure record to influence one or more risk exposures. In an embodiment, an exposure record is received, at least one data element of the received exposure record being mapped to one or more subexposures. At least one of the one or more subexposures are mapped to one of one or more exposure positions, wherein each exposure position corresponds to exactly one of the one or more risk exposures.

The length of an abutting pin of an optical print head is decided such that the upper end of the abutting pin when at a cleaning position is on the opposite side of a movement path of a cleaning member, from the upper end of another abutting pin of the optical print head when in an exposure position.

An image forming apparatus includes a rotatable image bearing member; charging means for electrically charging the image bearing member; exposure means for exposing the image bearing member charged by the charging means to light at an exposure position to form an electrostatic latent image; pre-exposure potential detecting means for detecting a potential on the image bearing member before exposure to the light, the pre-exposure potential detecting means being disposed at a position downstream of the charging means and upstream of the exposure position with respect to a rotational direction of the image bearing member; and potential adjusting means for adjusting the potential on the image bearing member before the exposure on the basis of an output of the potential detecting means, the potential adjusting means being disposed downstream of the pre-exposure potential detecting means and upstream of the exposure position with respect to the rotational direction of the image bearing member.

The invention provides an exposure frame data generation method used for dot-matrix maskless photoetching, belongs to the technical field of photoetching and aims at providing an exposure frame data generation method used for dot-matrix maskless photoetching. According to the technical scheme adopted by the invention, the method comprises the following steps: performing graphic processing and data storage; performing time value setting and row vector extraction; performing row vector processing so as to obtain the exposure frame data, wherein the three steps are carried out under the control of the whole exposure frame data generation program flow. According to the method, by virtue of reasonably dividing exposure positions and unifying the exposure positions with exposure time, primary graphs and the divided exposure position are compared, all the exposure positions are assigned as '0' or '1', two-page three-dimensional array storage time value and comparison assigned values are used for extracting the comparison assigned values of all focus points on the exposure positions at the same time so as to constitute one frame, along with the increase of the extraction time value, the exposure position of which the front section is subjected to time value extraction is removed, and the frame data generation velocity is effectively improved.

In order to provide an exposure device by which aligning of an exposure pattern is realized when manufacturing a build up wiring board or the like, an exposure device which exposes a photosensitive material with a light beam modulated in accordance with image information comprising a reading section which reads a radioscopic image of a specific pattern provided on an inner layer of a laminated structure, and an aligning section which aligns an exposure position of the photosensitive material laminated on a surface of an outer layer of the laminated structure on the basis of the position information of the read radioscopic image of the specific pattern, is provided.

An exposure apparatus includes a light-emitting portion arranged so as to be opposite to a photosensitive member at a position for exposure. A part of the light-emitting portion is smaller in width than a wavelength of light from the light-emitting portion.

Exposure equipment (1) is provided with an exposure optical system (2) for irradiating a color filter board (6) with exposure light from a light source (7), and a transfer means (4), on which the color filter board (6) arranged to face the exposure optical system (2) is placed to be transferred at a fixed speed. The exposure equipment exposes an image on an opening part (10a) of a mask (10) arranged on an optical path of the exposure optical system (2). The exposure equipment is provided with an image pickup means (3), which performs image pickup of a black matrix (11) previously formed on the color filter board (6), having the front side of an exposure position of the exposure optical system (2) in a shifting direction of the transfer means (4) as an image pickup apposition. The equipment is also provided with a control means (5), which detects a previously set reference position in the black matrix (11) of which image has been picked up by the image picked up means (3), controls irradiation timing of the exposure light of the exposure optical system (2) with the reference position as the standard, and exposes the image of the opening part (10a) of the mask (10) at a prescribed position on the color filter board (6). Thus, the exposure equipment which performs efficient exposure to a large exposure area by using the small mask is provided.

In an image forming apparatus, in the case where a time necessary for a developer bearing member to rotate from a measurement position where an attracting unit attracts the toner on the developer bearing member to a developing position at which an electrostatic latent image on the photosensitive member is developed by a toner on the developer bearing member is represented by a time Tqcm, a time necessary for the photosensitive member to rotate from an exposure position at which an exposure unit exposes the photosensitive member to the developing position is represented by a time Tetd, and a time necessary for a control unit to control an exposing condition based on a charge amount measured by a measuring unit is represented by a time Tp, the attracting unit is disposed so that Tqcm≧Tedt+Tp holds true.